FIG. 6.
The HAADF image of high-temperature vacuum annealed VO2/NiO/c-sapphire thin-film heterostructures. The formation of a double stacking fault in the vicinity of the step is illustrated at the interface of VO2/NiO.
The HAADF image of high-temperature vacuum annealed VO2/NiO/c-sapphire thin-film heterostructures. The formation of a double stacking fault in the vicinity of the step is illustrated at the interface of VO2/NiO.
