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Youichi Akasaka
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Journal Articles

Electrically pumped efficient broadband CW frequency conversion in diode lasers using bulk χ 2

Meng Lon Iu, Nima Zareian, Dongpeng Kang, Eric Chen, Paul Charles, Bilal Janjua, Youichi Akasaka, Tadashi Ikeuchi, Amr S. Helmy
Journal: APL Photonics
APL Photonics 5, 011301 (2020)
https://doi.org/10.1063/1.5122968
Published: January 2020
View article titled, Electrically pumped efficient broadband CW frequency conversion in diode lasers using bulk χ 2
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Includes: Supplementary data
Journal Articles

Dynamic behaviors of pulsed‐laser annealing in ion‐implanted silicon studied by measuring the optical reflectance

Kouichi Murakami, Kenji Gamo, Susumu Namba, Mitsuo Kawabe, Yoshinobu Aoyagi, Youichi Akasaka
Journal: AIP Conference Proceedings
AIP Conf. Proc. 50, 61–66 (1979)
https://doi.org/10.1063/1.31727
Published: April 1979
View article titled, Dynamic behaviors of pulsed‐laser annealing in ion‐implanted silicon studied by measuring the optical reflectance
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Journal Articles

Arsenic implantation into polycrystalline silicon and diffusion to silicon substrate

Katsuhiro Tsukamoto, Youichi Akasaka, Kazuo Horie
Journal: Journal of Applied Physics
J. Appl. Phys. 48, 1815–1821 (1977)
https://doi.org/10.1063/1.323933
Published: May 1977
View article titled, Arsenic implantation into polycrystalline silicon and diffusion to silicon substrate
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Journal Articles

Precipitation of boron atoms implanted in silicon as detected by channeling analysis

Youichi Akasaka, Kazuo Horie
Journal: Journal of Applied Physics
J. Appl. Phys. 44, 3372–3374 (1973)
https://doi.org/10.1063/1.1662769
Published: July 1973
View article titled, Precipitation of boron atoms implanted in silicon as detected by channeling analysis
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Journal Articles

Depth distributions of defects and impurities in 100‐keV B+ ion implanted silicon

Youichi Akasaka, Kazuo Horie, Kiyoshi Yoneda, Teruo Sakurai, Hidetoshi Nishi, Shoji Kawabe, Atsutomo Tohi
Journal: Journal of Applied Physics
J. Appl. Phys. 44, 220–224 (1973)
https://doi.org/10.1063/1.1661865
Published: January 1973
View article titled, Depth distributions of defects and impurities in 100‐keV B<sup>+</sup> ion implanted silicon
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Journal Articles

Lateral spread of boron ions implanted in silicon

Youichi Akasaka, Kazuo Horie, Satoru Kawazu
Journal: Applied Physics Letters
Appl. Phys. Lett. 21, 128–129 (1972)
https://doi.org/10.1063/1.1654311
Published: August 1972
View article titled, Lateral spread of boron ions implanted in silicon
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