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Journal Articles

The surface silylating process using chemical amplification resist for electron beam lithography

T. Fujino, S. Takeuchi, H. Morimoto, Y. Watakabe, H. Abe, M. Koshiba, M. Murata, S. Kawamura
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 8, 1808–1813 (1990)
https://doi.org/10.1116/1.585164
Published: November 1990
View article titled, The surface silylating process using chemical amplification resist for electron beam lithography
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Journal Articles

Sub‐0.2‐μm lithography by using a variable‐shaped electron beam assisted by a focused ion beam process

K. Hosono, H. Minami, H. Kusunose, T. Fujino, K. Nagahama, H. Morimoto, Y. Watakabe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 2044–2047 (1989)
https://doi.org/10.1116/1.584645
Published: November 1989
View article titled, Sub‐0.2‐μm lithography by using a variable‐shaped electron beam assisted by a focused ion beam process
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Journal Articles

A study of electron beam metrology using computer simulation

S. Takeuchi, H. Nakamura, Y. Watakabe, R. Mimura, R. Aihara, W. B. Thompson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 73–78 (1989)
https://doi.org/10.1116/1.584698
Published: January 1989
View article titled, A study of electron beam metrology using computer simulation
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Journal Articles

Hybrid lithography of a focused ion beam and an electron beam for the fabrication of a GaAs field effect transistor with a mushroom gate

K. Hosono, T. Fujino, S. Matsuda, K. Nagahama, Y. Sasaki, H. Morimoto, Y. Watakabe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 6, 1828–1831 (1988)
https://doi.org/10.1116/1.584162
Published: November 1988
View article titled, Hybrid lithography of a focused ion beam and an electron beam for the fabrication of a GaAs field effect transistor with a mushroom gate
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Journal Articles

Practical results of photomask repair using focused ion beam technology

K. Saitoh, H. Onoda, H. Morimoto, T. Katayama, Y. Watakabe, T. Kato
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 6, 1032–1034 (1988)
https://doi.org/10.1116/1.584343
Published: May 1988
View article titled, Practical results of photomask repair using focused ion beam technology
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Journal Articles

High performance very large scale integrated photomask with a silicide film

Y. Watakabe, S. Matsuda, A. Shigetomi, M. Hirosue, T. Kato, H. Nakata
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 4, 841–844 (1986)
https://doi.org/10.1116/1.583523
Published: July 1986
View article titled, High performance very large scale integrated photomask with a silicide film
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Journal Articles

Electron beam pattern inspection system using digital image processing

K. Saitoh, S. Takeuchi, K. Moriizumi, Y. Watakabe, T. Kato
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 4, 686–691 (1986)
https://doi.org/10.1116/1.583597
Published: May 1986
View article titled, Electron beam pattern inspection system using digital image processing
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Journal Articles

Characteristics of submicron patterns fabricated by gallium focused‐ion‐beam sputtering

H. Morimoto, Y. Sasaki, Y. Watakabe, T. Kato
Journal: Journal of Applied Physics
J. Appl. Phys. 57, 159–160 (1985)
https://doi.org/10.1063/1.335387
Published: January 1985
View article titled, Characteristics of submicron patterns fabricated by gallium focused‐ion‐beam sputtering
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Journal Articles

Evaluation of single crystal LaB6 cathodes

T. Kato, A. Shigetomi, Y. Watakabe, H. Hagiwara, H. Hiraoka
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 1, 100–106 (1983)
https://doi.org/10.1116/1.582529
Published: January 1983
View article titled, Evaluation of single crystal LaB<sub>6</sub> cathodes
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Journal Articles

Mask fabrication for VLSI using an electron beam exposure system

Y. Watakabe, T. Kato, A. Shigetomi, H. Morimoto
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 1005–1011 (1982)
https://doi.org/10.1116/1.571852
Published: November 1982
View article titled, Mask fabrication for VLSI using an electron beam exposure system
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Journal Articles

Proximity effect correction in electron‐beam lithography

T. Kato, Y. Watakabe, H. Nakata
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1279–1285 (1981)
https://doi.org/10.1116/1.571260
Published: November 1981
View article titled, Proximity effect correction in electron‐beam lithography
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