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Vincent M. Donnelly
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Journal Articles

Reactor wall effects in Si–Cl2–Ar atomic layer etching

Joseph R. Vella, Mahmoud A. I. Elgarhy, Qinzhen Hao, Vincent M. Donnelly, David B. Graves
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 042604 (2024)
https://doi.org/10.1116/6.0003651
Published: June 2024
View article titled, Reactor wall effects in Si–Cl<sub>2</sub>–Ar atomic layer etching
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Journal Articles

Future of plasma etching for microelectronics: Challenges and opportunities

Featured
Gottlieb S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce, Jane P. Chang, Jessica C. DeMott, Vincent M. Donnelly, Rémi Dussart, Andreas Fischer, Richard A. Gottscho, Satoshi Hamaguchi, Masanobu Honda, Masaru Hori, Kenji Ishikawa, Steven G. Jaloviar, Keren J. Kanarik, Kazuhiro Karahashi, Akiteru Ko, Hiten Kothari, Nobuyuki Kuboi, Mark J. Kushner, Thorsten Lill, Pingshan Luan, Ali Mesbah, Eric Miller, Shoubhanik Nath, Yoshinobu Ohya, Mitsuhiro Omura, Chanhoon Park, John Poulose, Shahid Rauf, Makoto Sekine, Taylor G. Smith, Nathan Stafford, Theo Standaert, Peter L. G. Ventzek
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 041501 (2024)
https://doi.org/10.1116/6.0003579
Published: June 2024
View article titled, Future of plasma etching for microelectronics: Challenges and opportunities
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Journal Articles

Science challenges and research opportunities for plasma applications in microelectronics

FeaturedScilight
David B. Graves, Catherine B. Labelle, Mark J. Kushner, Eray S. Aydil, Vincent M. Donnelly, Jane P. Chang, Peter Mayer, Lawrence Overzet, Steven Shannon, Shahid Rauf, David N. Ruzic
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 042202 (2024)
https://doi.org/10.1116/6.0003531
Published: June 2024
View article titled, Science challenges and research opportunities for plasma applications in microelectronics
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Journal Articles

Atomic layer etching in HBr/He/Ar/O2 plasmas

Qinzhen Hao, Mahmoud A. I. Elgarhy, Pilbum Kim, Sang Ki Nam, Song-Yun Kang, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 042601 (2024)
https://doi.org/10.1116/6.0003593
Published: May 2024
View article titled, Atomic layer etching in HBr/He/Ar/O<sub>2</sub> plasmas
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Journal Articles

Dynamics of plasma atomic layer etching: Molecular dynamics simulations and optical emission spectroscopy

Joseph R. Vella, Qinzhen Hao, Vincent M. Donnelly, David B. Graves
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062602 (2023)
https://doi.org/10.1116/6.0003011
Published: November 2023
View article titled, Dynamics of plasma atomic layer etching: Molecular dynamics simulations and optical emission spectroscopy
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Includes: Supplementary data
Journal Articles

Real-time monitoring of atomic layer etching in Cl2/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy

Qinzhen Hao, Pilbum Kim, Sang Ki Nam, Song-Yun Kang, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032605 (2023)
https://doi.org/10.1116/6.0002482
Published: April 2023
View article titled, Real-time monitoring of atomic layer etching in Cl<sub>2</sub>/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy
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Journal Articles

Effects of N2 and O2 plasma treatments of quartz surfaces exposed to H2 plasmas

Yingliang Zhou, Hanyang Li, Ji-Eun Jung, Sang Ki Nam, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053002 (2022)
https://doi.org/10.1116/6.0001896
Published: July 2022
View article titled, Effects of N<sub>2</sub> and O<sub>2</sub> plasma treatments of quartz surfaces exposed to H<sub>2</sub> plasmas
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Journal Articles

Absolute measurement of vacuum ultraviolet photon flux in an inductively coupled plasma using a Au thin film

Linfeng Du, Paul Ruchhoeft, Demetre J. Economou, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022206 (2022)
https://doi.org/10.1116/6.0001709
Published: February 2022
View article titled, Absolute measurement of vacuum ultraviolet photon flux in an inductively coupled plasma using a Au thin film
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Journal Articles

In-plasma photo-assisted etching of Si with chlorine aided by an external vacuum ultraviolet source

Editor’s Pick
Linfeng Du, Demetre J. Economou, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022207 (2022)
https://doi.org/10.1116/6.0001710
Published: February 2022
View article titled, In-plasma photo-assisted etching of Si with chlorine aided by an external vacuum ultraviolet source
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Journal Articles

Glow discharge-optical emission spectroscopy for in situ analysis of surfaces in plasmas

Priyanka Arora, Junghyun Cho, Rafael Cervantes, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 063004 (2020)
https://doi.org/10.1116/6.0000373
Published: October 2020
View article titled, Glow discharge-optical emission spectroscopy for <em>in situ</em> analysis of surfaces in plasmas
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Journal Articles

Effects of O2 addition on in-plasma photo-assisted etching of Si with chlorine

Linfeng Du, Emilia W. Hirsch, Demetre J. Economou, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 053003 (2020)
https://doi.org/10.1116/6.0000338
Published: July 2020
View article titled, Effects of O<sub>2</sub> addition on in-plasma photo-assisted etching of Si with chlorine
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Journal Articles

Optical and mass spectrometric measurements of dissociation in low frequency, high density, remote source O2/Ar and NF3/Ar plasmas

Hanyang Li, Yingliang Zhou, Vincent. M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 023011 (2020)
https://doi.org/10.1116/1.5126429
Published: February 2020
View article titled, Optical and mass spectrometric measurements of dissociation in low frequency, high density, remote source O<sub>2</sub>/Ar and NF<sub>3</sub>/Ar plasmas
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Journal Articles

Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma

Editor’s Pick
Emilia W. Hirsch, Linfeng Du, Demetre J. Economou, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 023009 (2020)
https://doi.org/10.1116/1.5138189
Published: January 2020
View article titled, Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma
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Journal Articles

Role of sulfur in catalyzing fluorine atom fast etching of silicon with smooth surface morphology

Priyanka Arora, Tam Nguyen, Aseem Chawla, Sang-Ki Nam, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 061303 (2019)
https://doi.org/10.1116/1.5125266
Published: November 2019
View article titled, Role of sulfur in catalyzing fluorine atom fast etching of silicon with smooth surface morphology
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Journal Articles

Recombination coefficients for Cl on plasma-conditioned yttrium oxide chamber wall surfaces

Tianyu Ma, Tyler List, Priyanka Arora, Vincent M. Donnelly
Journal: Journal of Applied Physics
J. Appl. Phys. 125, 023301 (2019)
https://doi.org/10.1063/1.5045483
Published: January 2019
View article titled, Recombination coefficients for Cl on plasma-conditioned yttrium oxide chamber wall surfaces
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Journal Articles

Excitation mechanisms in a nonequilibrium helium plasma jet emerging in ambient air at 1 atm

Tam Nguyen, Eduardo Hernandez, Vincent M. Donnelly, Demetre J. Economou
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 04F406 (2018)
https://doi.org/10.1116/1.5023693
Published: June 2018
View article titled, Excitation mechanisms in a nonequilibrium helium plasma jet emerging in ambient air at 1 atm
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Journal Articles

Comparisons of NF3 plasma-cleaned Y2O3, YOF, and YF3 chamber coatings during silicon etching in Cl2 plasmas

Editor’s Pick
Tianyu Ma, Tyler List, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031305 (2018)
https://doi.org/10.1116/1.5026777
Published: April 2018
View article titled, Comparisons of NF<sub>3</sub> plasma-cleaned Y<sub>2</sub>O<sub>3</sub>, YOF, and YF<sub>3</sub> chamber coatings during silicon etching in Cl<sub>2</sub> plasmas
Open the PDF for Comparisons of NF<sub>3</sub> plasma-cleaned Y<sub>2</sub>O<sub>3</sub>, YOF, and YF<sub>3</sub> chamber coatings during silicon etching in Cl<sub>2</sub> plasmas in another window
Journal Articles

Review Article: Reactions of fluorine atoms with silicon, revisited, again

Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C202 (2017)
https://doi.org/10.1116/1.4983922
Published: May 2017
View article titled, Review Article: Reactions of fluorine atoms with silicon, revisited, again
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Journal Articles

Y2O3 wall interactions in Cl2 etching and NF3 cleaning plasmas

Editor’s Pick
Tianyu Ma, Tyler List, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 031303 (2017)
https://doi.org/10.1116/1.4978552
Published: March 2017
View article titled, Y<sub>2</sub>O<sub>3</sub> wall interactions in Cl<sub>2</sub> etching and NF<sub>3</sub> cleaning plasmas
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Journal Articles

Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy

Shyam Sridhar, Lei Liu, Emilia W. Hirsch, Vincent M. Donnelly, Demetre J. Economou
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061303 (2016)
https://doi.org/10.1116/1.4964641
Published: October 2016
View article titled, Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy
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