1-20 of 62
Thomas Mikolajick
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Roadmap to neuromorphic computing with emerging technologies

Editor’s PickOpen Access
Adnan Mehonic, Daniele Ielmini, Kaushik Roy, Onur Mutlu, Shahar Kvatinsky, Teresa Serrano-Gotarredona, Bernabe Linares-Barranco, Sabina Spiga, Sergey Savel’ev, Alexander G. Balanov, Nitin Chawla, Giuseppe Desoli, Gerardo Malavena, Christian Monzio Compagnoni, Zhongrui Wang, J. Joshua Yang, Syed Ghazi Sarwat, Abu Sebastian, Thomas Mikolajick, Stefan Slesazeck, Beatriz Noheda, Bernard Dieny, Tuo-Hung (Alex) Hou, Akhil Varri, Frank Brückerhoff-Plückelmann, Wolfram Pernice, Xixiang Zhang, Sebastian Pazos, Mario Lanza, Stefan Wiefels, Regina Dittmann, Wing H. Ng, Mark Buckwell, Horatio R. J. Cox, Daniel J. Mannion, Anthony J. Kenyon, Yingming Lu, Yuchao Yang, Damien Querlioz, Louis Hutin, Elisa Vianello, Sayeed Shafayet Chowdhury, Piergiulio Mannocci, Yimao Cai, Zhong Sun, Giacomo Pedretti, John Paul Strachan, Dmitri Strukov, Manuel Le Gallo, Stefano Ambrogio, Ilia Valov, Rainer Waser
Journal: APL Materials
APL Mater. 12, 109201 (2024)
https://doi.org/10.1063/5.0179424
Published: October 2024
View articletitled, Roadmap to neuromorphic computing with emerging technologies
Open the PDF for Roadmap to neuromorphic computing with emerging technologies in another window
Journal Articles

Direct writing immersion laser lithography on graphene monolayers using two-photon absorption

Available to Purchase
Jianran Zhang, Carsten Strobel, Kathrin Estel, Thomas Mikolajick, Robert Kirchner
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062604 (2023)
https://doi.org/10.1116/6.0003017
Published: November 2023
View articletitled, Direct writing immersion laser lithography on graphene monolayers using two-photon absorption
Open the PDF for Direct writing immersion laser lithography on graphene monolayers using two-photon absorption in another window
Journal Articles

Roadmap on ferroelectric hafnia- and zirconia-based materials and devices

Open Access
José P. B. Silva, Ruben Alcala, Uygar E. Avci, Nick Barrett, Laura Bégon-Lours, Mattias Borg, Seungyong Byun, Sou-Chi Chang, Sang-Wook Cheong, Duk-Hyun Choe, Jean Coignus, Veeresh Deshpande, Athanasios Dimoulas, Catherine Dubourdieu, Ignasi Fina, Hiroshi Funakubo, Laurent Grenouillet, Alexei Gruverman, Jinseong Heo, Michael Hoffmann, H. Alex Hsain, Fei-Ting Huang, Cheol Seong Hwang, Jorge Íñiguez, Jacob L. Jones, Ilya V. Karpov, Alfred Kersch, Taegyu Kwon, Suzanne Lancaster, Maximilian Lederer, Younghwan Lee, Patrick D. Lomenzo, Lane W. Martin, Simon Martin, Shinji Migita, Thomas Mikolajick, Beatriz Noheda, Min Hyuk Park, Karin M. Rabe, Sayeef Salahuddin, Florencio Sánchez, Konrad Seidel, Takao Shimizu, Takahisa Shiraishi, Stefan Slesazeck, Akira Toriumi, Hiroshi Uchida, Bertrand Vilquin, Xianghan Xu, Kun Hee Ye, Uwe Schroeder
Journal: APL Materials
APL Mater. 11, 089201 (2023)
https://doi.org/10.1063/5.0148068
Published: August 2023
View articletitled, Roadmap on ferroelectric hafnia- and zirconia-based materials and devices
Open the PDF for Roadmap on ferroelectric hafnia- and zirconia-based materials and devices in another window
Journal Articles

Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition

Editor’s PickAvailable to Purchase
H. Alex Hsain, Younghwan Lee, Patrick D. Lomenzo, Ruben Alcala, Bohan Xu, Thomas Mikolajick, Uwe Schroeder, Gregory N. Parsons, Jacob L. Jones
Journal: Journal of Applied Physics
J. Appl. Phys. 133, 225304 (2023)
https://doi.org/10.1063/5.0147124
Published: June 2023
View articletitled, Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition
Open the PDF for Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition in another window
Includes: Supplementary data
Journal Articles

Correlating elemental compositions and charge carrier profiles in ultra-pure GaN/AlGaN stacks grown by molecular beam epitaxy

Editor’s PickOpen Access
Stefan Schmult, Pascal Appelt, Claudia Silva, Steffen Wirth, Andre Wachowiak, Andreas Großer, Thomas Mikolajick
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042702 (2023)
https://doi.org/10.1116/6.0002652
Published: May 2023
View articletitled, Correlating elemental compositions and charge carrier profiles in ultra-pure GaN/AlGaN stacks grown by molecular beam epitaxy
Open the PDF for Correlating elemental compositions and charge carrier profiles in ultra-pure GaN/AlGaN stacks grown by molecular beam epitaxy in another window
Journal Articles

Band-to-band tunneling switches based on two-dimensional van der Waals heterojunctions

FeaturedAvailable to Purchase
Phanish Chava, Zahra Fekri, Yagnika Vekariya, Thomas Mikolajick, Artur Erbe
Journal: Applied Physics Reviews
Appl. Phys. Rev. 10, 011318 (2023)
https://doi.org/10.1063/5.0130930
Published: March 2023
View articletitled, Band-to-band tunneling switches based on two-dimensional van der Waals heterojunctions
Open the PDF for Band-to-band tunneling switches based on two-dimensional van der Waals heterojunctions in another window
Journal Articles

Using Raman spectroscopy and x-ray diffraction for phase determination in ferroelectric mixed Hf1−xZrxO2-based layers

FeaturedAvailable to Purchase
Uwe Schroeder, Ridham Sachdeva, Patrick D. Lomenzo, Bohan Xu, Monica Materano, Thomas Mikolajick, Alfred Kersch
Journal: Journal of Applied Physics
J. Appl. Phys. 132, 214104 (2022)
https://doi.org/10.1063/5.0119871
Published: December 2022
View articletitled, Using Raman spectroscopy and x-ray diffraction for phase determination in ferroelectric mixed Hf1−xZrxO2-based layers
Open the PDF for Using Raman spectroscopy and x-ray diffraction for phase determination in ferroelectric mixed Hf1−xZrxO2-based layers in another window
Includes: Supplementary data
Journal Articles

Oxygen vacancy concentration as a function of cycling and polarization state in TiN/Hf0.5Zr0.5O2/TiN ferroelectric capacitors studied by x-ray photoemission electron microscopy

FeaturedAvailable to Purchase
Wassim Hamouda, Furqan Mehmood, Thomas Mikolajick, Uwe Schroeder, Tevfik Onur Mentes, Andrea Locatelli, Nick Barrett
Journal: Applied Physics Letters
Appl. Phys. Lett. 120, 202902 (2022)
https://doi.org/10.1063/5.0093125
Published: May 2022
View articletitled, Oxygen vacancy concentration as a function of cycling and polarization state in TiN/Hf0.5Zr0.5O2/TiN ferroelectric capacitors studied by x-ray photoemission electron microscopy
Open the PDF for Oxygen vacancy concentration as a function of cycling and polarization state in TiN/Hf0.5Zr0.5O2/TiN ferroelectric capacitors studied by x-ray photoemission electron microscopy in another window
Includes: Supplementary data
Journal Articles

In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride

Open Access
Johanna Reif, Martin Knaut, Sebastian Killge, Matthias Albert, Thomas Mikolajick, Johann W. Bartha
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 032602 (2022)
https://doi.org/10.1116/6.0001630
Published: April 2022
View articletitled, In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride
Open the PDF for In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride in another window
Journal Articles

Hole selective nickel oxide as transparent conductive oxide

Available to Purchase
David Tröger, Johanna Reif, Thomas Mikolajick, Matthias Grube
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 013409 (2022)
https://doi.org/10.1116/6.0001391
Published: December 2021
View articletitled, Hole selective nickel oxide as transparent conductive oxide
Open the PDF for Hole selective nickel oxide as transparent conductive oxide in another window
Includes: Supplementary data
Journal Articles

Many routes to ferroelectric HfO2: A review of current deposition methods

Available to Purchase
Hanan Alexandra Hsain, Younghwan Lee, Monica Materano, Terence Mittmann, Alexis Payne, Thomas Mikolajick, Uwe Schroeder, Gregory N. Parsons, Jacob L. Jones
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 010803 (2022)
https://doi.org/10.1116/6.0001317
Published: December 2021
View articletitled, Many routes to ferroelectric HfO2: A review of current deposition methods
Open the PDF for Many routes to ferroelectric HfO2: A review of current deposition methods in another window
Journal Articles

Pyroelectric dependence of atomic layer-deposited Hf0.5Zr0.5O2 on film thickness and annealing temperature

Available to Purchase
Patrick D. Lomenzo, Ruben Alcala, Claudia Richter, Songrui Li, Thomas Mikolajick, Uwe Schroeder
Journal: Applied Physics Letters
Appl. Phys. Lett. 119, 112903 (2021)
https://doi.org/10.1063/5.0062789
Published: September 2021
View articletitled, Pyroelectric dependence of atomic layer-deposited Hf0.5Zr0.5O2 on film thickness and annealing temperature
Open the PDF for Pyroelectric dependence of atomic layer-deposited Hf0.5Zr0.5O2 on film thickness and annealing temperature in another window
Includes: Supplementary data
Journal Articles

An unexplored antipolar phase in HfO2 from first principles and implication for wake-up mechanism

Available to Purchase
Luis Azevedo Antunes, Richard Ganser, Ruben Alcala, Thomas Mikolajick, Uwe Schroeder, Alfred Kersch
Journal: Applied Physics Letters
Appl. Phys. Lett. 119, 082903 (2021)
https://doi.org/10.1063/5.0063808
Published: August 2021
View articletitled, An unexplored antipolar phase in HfO2 from first principles and implication for wake-up mechanism
Open the PDF for An unexplored antipolar phase in HfO2 from first principles and implication for wake-up mechanism in another window
Includes: Supplementary data
Journal Articles

Bipolar conductivity in ferroelectric La:HfZrO films

Available to Purchase
Timofey V. Perevalov, Andrei A. Gismatulin, Vladimir A. Gritsenko, Igor' P. Prosvirin, Furqan Mehmood, Thomas Mikolajick, Uwe Schroeder
Journal: Applied Physics Letters
Appl. Phys. Lett. 118, 262903 (2021)
https://doi.org/10.1063/5.0050748
Published: July 2021
View articletitled, Bipolar conductivity in ferroelectric La:HfZrO films
Open the PDF for Bipolar conductivity in ferroelectric La:HfZrO films in another window
Journal Articles

Special topic on ferroelectricity in hafnium oxide: Materials and devices

Free
Thomas Mikolajick, Uwe Schroeder, Min Hyuk Park
Journal: Applied Physics Letters
Appl. Phys. Lett. 118, 180402 (2021)
https://doi.org/10.1063/5.0054064
Published: May 2021
View articletitled, Special topic on ferroelectricity in hafnium oxide: Materials and devices
Open the PDF for Special topic on ferroelectricity in hafnium oxide: Materials and devices in another window
Journal Articles

Domains and domain dynamics in fluorite-structured ferroelectrics

Open Access
Dong Hyun Lee, Younghwan Lee, Kun Yang, Ju Yong Park, Se Hyun Kim, Pothala Reddi Sekhar Reddy, Monica Materano, Halid Mulaosmanovic, Thomas Mikolajick, Jacob L. Jones, Uwe Schroeder, Min Hyuk Park
Journal: Applied Physics Reviews
Appl. Phys. Rev. 8, 021312 (2021)
https://doi.org/10.1063/5.0047977
Published: April 2021
View articletitled, Domains and domain dynamics in fluorite-structured ferroelectrics
Open the PDF for Domains and domain dynamics in fluorite-structured ferroelectrics in another window
Journal Articles

Reconfigurable thin-film transistors based on a parallel array of Si-nanowires

Available to Purchase
Dae-Young Jeon, So Jeong Park, Sebastian Pregl, Thomas Mikolajick, Walter M. Weber
Journal: Journal of Applied Physics
J. Appl. Phys. 129, 124504 (2021)
https://doi.org/10.1063/5.0036029
Published: March 2021
View articletitled, Reconfigurable thin-film transistors based on a parallel array of Si-nanowires
Open the PDF for Reconfigurable thin-film transistors based on a parallel array of Si-nanowires in another window
Includes: Supplementary data
Journal Articles

Progress and future prospects of negative capacitance electronics: A materials perspective

FeaturedOpen Access
Michael Hoffmann, Stefan Slesazeck, Thomas Mikolajick
Journal: APL Materials
APL Mater. 9, 020902 (2021)
https://doi.org/10.1063/5.0032954
Published: February 2021
View articletitled, Progress and future prospects of negative capacitance electronics: A materials perspective
Open the PDF for Progress and future prospects of negative capacitance electronics: A materials perspective in another window
Journal Articles

Perspective on ferroelectric, hafnium oxide based transistors for digital beyond von-Neumann computing

Available to Purchase
Evelyn T. Breyer, Halid Mulaosmanovic, Thomas Mikolajick, Stefan Slesazeck
Journal: Applied Physics Letters
Appl. Phys. Lett. 118, 050501 (2021)
https://doi.org/10.1063/5.0035281
Published: February 2021
View articletitled, Perspective on ferroelectric, hafnium oxide based transistors for digital beyond von-Neumann computing
Open the PDF for Perspective on ferroelectric, hafnium oxide based transistors for digital beyond von-Neumann computing in another window
Journal Articles

Impact of vacancies and impurities on ferroelectricity in PVD- and ALD-grown HfO2 films

Open Access
Lutz Baumgarten, Thomas Szyjka, Terence Mittmann, Monica Materano, Yury Matveyev, Christoph Schlueter, Thomas Mikolajick, Uwe Schroeder, Martina Müller
Journal: Applied Physics Letters
Appl. Phys. Lett. 118, 032903 (2021)
https://doi.org/10.1063/5.0035686
Published: January 2021
View articletitled, Impact of vacancies and impurities on ferroelectricity in PVD- and ALD-grown HfO2 films
Open the PDF for Impact of vacancies and impurities on ferroelectricity in PVD- and ALD-grown HfO2 films in another window
Includes: Supplementary data