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Takeo Watanabe
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Journal Articles

Removal of carbon contamination on oxidation-prone metal-coated mirrors using atomic hydrogen

Masahito Niibe, Tetsuo Harada, Akira Heya, Takeo Watanabe, Naoto Matsuo
Journal: AIP Conference Proceedings
AIP Conf. Proc. 2054, 060010 (2019)
https://doi.org/10.1063/1.5084641
Published: January 2019
View article titled, Removal of carbon contamination on oxidation-prone metal-coated mirrors using atomic hydrogen
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Journal Articles

Phase defect characterization on an extreme-ultraviolet blank mask using microcoherent extreme-ultraviolet scatterometry microscope

Tetsuo Harada, Yusuke Tanaka, Takeo Watanabe, Hiroo Kinoshita, Youichi Usui, Tsuyoshi Amano
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 06F605 (2013)
https://doi.org/10.1116/1.4826249
Published: October 2013
View article titled, Phase defect characterization on an extreme-ultraviolet blank mask using microcoherent extreme-ultraviolet scatterometry microscope
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Journal Articles

Imaging of extreme-ultraviolet mask patterns using coherent extreme-ultraviolet scatterometry microscope based on coherent diffraction imaging

Tetsuo Harada, Masato Nakasuji, Teruhiko Kimura, Takeo Watanabe, Hiroo Kinoshita, Yutaka Nagata
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 06F503 (2011)
https://doi.org/10.1116/1.3657525
Published: November 2011
View article titled, Imaging of extreme-ultraviolet mask patterns using coherent extreme-ultraviolet scatterometry microscope based on coherent diffraction imaging
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Journal Articles

Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU

Tetsuo Harada, Junki Kishimoto, Takeo Watanabe, Hiroo Kinoshita, Dong Gun Lee
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 3203–3207 (2009)
https://doi.org/10.1116/1.3258633
Published: December 2009
View article titled, Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU
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Journal Articles

Actinic Mask Inspection using EUV Microscope

Hiroo Kinoshita, Kazuhiro Hamamoto, Yuzuru Tanaka, Noriyuki Sakaya, Morio Hosoya, Tsutomu Shoki, Donggun Lee, Takeo Watanabe
Journal: AIP Conference Proceedings
AIP Conf. Proc. 879, 1478–1481 (2007)
https://doi.org/10.1063/1.2436344
Published: January 2007
View article titled, Actinic Mask Inspection using EUV Microscope
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Journal Articles

Beneficial Photoacid Generator for CA Resist in EUVL

Takeo Watanabe, Hideo Hada, Yasuyuki Fukushima, Hideaki Shiotani, Hiroo Kinoshita, Hiroshi Komano
Journal: AIP Conference Proceedings
AIP Conf. Proc. 879, 1470–1473 (2007)
https://doi.org/10.1063/1.2436342
Published: January 2007
View article titled, Beneficial Photoacid Generator for CA Resist in EUVL
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Journal Articles

Angular dependency of off-axis illumination on 100-nm-width pattern printability for extreme ultraviolet lithography: Ru/Mo/Si reflector system

In-Yong Kang, Yong-Chae Chung, Jinho Ahn, Hye-Keun Oh, Takeo Watanabe, Hiroo Kinoshita
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 2984–2986 (2004)
https://doi.org/10.1116/1.1824056
Published: December 2004
View article titled, Angular dependency of off-axis illumination on 100-nm-width pattern printability for extreme ultraviolet lithography: Ru/Mo/Si reflector system
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Journal Articles

Photoinduced outgassing from the resist for extreme ultraviolet lithography by the analysis of mass spectroscopy

Takeo Watanabe, Hiroo Kinoshita, Hajime Nii, Kazuhiro Hamamoto, Harushige Tsubakino, Hideo Hada, Hiroshi Komano, Shigeo Irie
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 19, 736–742 (2001)
https://doi.org/10.1116/1.1368671
Published: May 2001
View article titled, Photoinduced outgassing from the resist for extreme ultraviolet lithography by the analysis of mass spectroscopy
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