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Takayoshi Tsutsumi
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Journal Articles

Plasma processing and annealing for defect management at SiO2/Si interface

Shota Nunomura, Takayoshi Tsutsumi, Isao Sakata, Masaru Hori
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 052202 (2023)
https://doi.org/10.1116/6.0002822
Published: August 2023
View article titled, Plasma processing and annealing for defect management at SiO<sub>2</sub>/Si interface
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Journal Articles

Area-selective plasma-enhanced atomic layer etching (PE-ALE) of silicon dioxide using a silane coupling agent

Airah P. Osonio, Takayoshi Tsutsumi, Yoshinari Oda, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, Masaru Hori
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062601 (2022)
https://doi.org/10.1116/6.0002044
Published: October 2022
View article titled, Area-selective plasma-enhanced atomic layer etching (PE-ALE) of silicon dioxide using a silane coupling agent
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Journal Articles

In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicals

Masaki Hasegawa, Takayoshi Tsutsumi, Atsushi Tanide, Shohei Nakamura, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 042602 (2020)
https://doi.org/10.1116/6.0000124
Published: June 2020
View article titled, <em>In situ</em> surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar<sup>+</sup> ions and Cl radicals
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Journal Articles

Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study

Yusuke Fukunaga, Roberto C. Longo, Peter L. G. Ventzek, Barton Lane, Alok Ranjan, Gyeong S. Hwang, Gregory Hartmann, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori
Journal: Journal of Applied Physics
J. Appl. Phys. 127, 023303 (2020)
https://doi.org/10.1063/1.5127863
Published: January 2020
View article titled, Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study
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Journal Articles

Remotely floating wire-assisted generation of high-density atmospheric pressure plasma and SF6-added plasma etching of quartz glass

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Hidefumi Odaka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori
Journal: Journal of Applied Physics
J. Appl. Phys. 125, 063304 (2019)
https://doi.org/10.1063/1.5081875
Published: February 2019
View article titled, Remotely floating wire-assisted generation of high-density atmospheric pressure plasma and SF<sub>6</sub>-added plasma etching of quartz glass
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Journal Articles

Absolute density of precursor SiH3 radicals and H atoms in H2-diluted SiH4 gas plasma for deposition of microcrystalline silicon films

Yusuke Abe, Kenji Ishikawa, Keigo Takeda, Takayoshi Tsutsumi, Atsushi Fukushima, Hiroki Kondo, Makoto Sekine, Masaru Hori
Journal: Applied Physics Letters
Appl. Phys. Lett. 110, 043902 (2017)
https://doi.org/10.1063/1.4974821
Published: January 2017
View article titled, Absolute density of precursor SiH<sub>3</sub> radicals and H atoms in H<sub>2</sub>-diluted SiH<sub>4</sub> gas plasma for deposition of microcrystalline silicon films
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Journal Articles

Atomic layer etching of SiO2 by alternating an O2 plasma with fluorocarbon film deposition

Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Masaru Zaitsu, Akiko Kobayashi, Toshihisa Nozawa, Nobuyoshi Kobayashi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01A103 (2017)
https://doi.org/10.1116/1.4971171
Published: November 2016
View article titled, Atomic layer etching of SiO<sub>2</sub> by alternating an O<sub>2</sub> plasma with fluorocarbon film deposition
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Journal Articles

Rapid measurement of substrate temperatures by frequency-domain low-coherence interferometry

Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, Masafumi Ito
Journal: Applied Physics Letters
Appl. Phys. Lett. 103, 182102 (2013)
https://doi.org/10.1063/1.4827426
Published: October 2013
View article titled, Rapid measurement of substrate temperatures by frequency-domain low-coherence interferometry
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