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Journal Articles

Improved time dependent performance of hydrogen silsesquioxane resist using a spin on top coat

Daron A. Westly, Donald M. Tennant, Yukinori Aida, Hirofumi Ohki, Takashi Ohkubo

J. Vac. Sci. Technol. B 29, 06FJ02 (2011)

https://doi.org/10.1116/1.3660788

Published: December 2011

View article titled, Improved time dependent performance of hydrogen silsesquioxane resist using a spin on top coat

Journal Articles

Highly accurate x-ray masks with 100-nm-class high-density device patterns

Shingo Uchiyama, Masaru Shimada, Tai Tsuchizawa, Takashi Ohkubo, Masatoshi Oda, Hideo Yoshihara

J. Vac. Sci. Technol. B 18, 2990–2994 (2000)

https://doi.org/10.1116/1.1321763

Published: November 2000

View article titled, Highly accurate x-ray masks with 100-nm-class high-density device patterns

Journal Articles

Characteristics of optical components for soft x‐ray microscopy and x‐ray holography using an undulator radiation optical system (abstract)

Masami Kakuchi, Akira Ozawa, Takashi Ohkubo, Hideki Maezawa, Yasushi Kagoshima, Masami Ando

Rev. Sci. Instrum. 60, 2504 (1989)

https://doi.org/10.1063/1.1140712

Published: July 1989

View article titled, Characteristics of optical components for soft x‐ray microscopy and x‐ray holography using an undulator radiation optical system (abstract)

Journal Articles

Silicon nitride single‐layer x‐ray mask

Misao Sekimoto, Hideo Yoshihara, Takashi Ohkubo

J. Vac. Sci. Technol. 21, 1017–1021 (1982)

https://doi.org/10.1116/1.571854

Published: November 1982

View article titled, Silicon nitride single‐layer x‐ray mask