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Journal Articles

Silicon nanopillar anodes for lithium-ion batteries using nanoimprint lithography with flexible molds

Eric Mills, John Cannarella, Qi Zhang, Shoham Bhadra, Craig B. Arnold, Stephen Y. Chou

J. Vac. Sci. Technol. B 32, 06FG10 (2014)

https://doi.org/10.1116/1.4901878

Published: November 2014

View articletitled, Silicon nanopillar anodes for lithium-ion batteries using nanoimprint lithography with flexible molds

Journal Articles

Self-aligned fabrication of 10 nm wide asymmetric trenches for Si/SiGe heterojunction tunneling field effect transistors using nanoimprint lithography, shadow evaporation, and etching

Chao Wang, Stephen Y. Chou

J. Vac. Sci. Technol. B 27, 2790–2794 (2009)

https://doi.org/10.1116/1.3237138

Published: December 2009

View articletitled, Self-aligned fabrication of 10 nm wide asymmetric trenches for Si/SiGe heterojunction tunneling field effect transistors using nanoimprint lithography, shadow evaporation, and etching

Journal Articles

Nanoimprint mold fabrication and replication by room-temperature conformal chemical vapor deposition

Patrick F. Murphy, Keith J. Morton, Zengli Fu, Stephen Y. Chou

Appl. Phys. Lett. 90, 203115 (2007)

https://doi.org/10.1063/1.2741122

Published: May 2007

View articletitled, Nanoimprint mold fabrication and replication by room-temperature conformal chemical vapor deposition

Journal Articles

High fidelity fabrication of microlens arrays by nanoimprint using conformal mold duplication and low-pressure liquid material curing

Can Peng, Xiaogan Liang, Zengli Fu, Stephen Y. Chou

J. Vac. Sci. Technol. B 25, 410–414 (2007)

https://doi.org/10.1116/1.2713405

Published: March 2007

View articletitled, High fidelity fabrication of microlens arrays by nanoimprint using conformal mold duplication and low-pressure liquid material curing

Journal Articles

Large area 50 nm period grating by multiple nanoimprint lithography and spatial frequency doubling

Bo Cui, Zhaoning Yu, Haixiong Ge, Stephen Y. Chou

Appl. Phys. Lett. 90, 043118 (2007)

https://doi.org/10.1063/1.2390652

Published: January 2007

View articletitled, Large area 50 nm period grating by multiple nanoimprint lithography and spatial frequency doubling

Journal Articles

Alkylsiloxane self-assembled monolayer formation guided by nanoimprinted Si and Si O 2 templates

Amir A. Yasseri, Shashank Sharma, Theodore I. Kamins, Qiangfei Xia, Stephen Y. Chou, R. Fabian W. Pease

Appl. Phys. Lett. 89, 153121 (2006)

https://doi.org/10.1063/1.2360920

Published: October 2006

View articletitled, Alkylsiloxane self-assembled monolayer formation guided by nanoimprinted Si and Si O 2 templates

Journal Articles

In situ real time monitoring of nanosecond imprint process

Qiangfei Xia, Zhaoning Yu, He Gao, Stephen Y. Chou

Appl. Phys. Lett. 89, 073107 (2006)

https://doi.org/10.1063/1.2335952

Published: August 2006

View articletitled, In situ real time monitoring of nanosecond imprint process

Journal Articles

In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry

Zhaoning Yu, He Gao, Stephen Y. Chou

Appl. Phys. Lett. 85, 4166–4168 (2004)

https://doi.org/10.1063/1.1811396

Published: November 2004

View articletitled, In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry

Journal Articles

Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography

Michael D. Austin, Haixiong Ge, Wei Wu, Mingtao Li, Zhaoning Yu, D. Wasserman, S. A. Lyon, Stephen Y. Chou

Appl. Phys. Lett. 84, 5299–5301 (2004)

https://doi.org/10.1063/1.1766071

Published: June 2004

View articletitled, Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography

Journal Articles

Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff

Zhaoning Yu, He Gao, Wei Wu, Haixiong Ge, Stephen Y. Chou

J. Vac. Sci. Technol. B 21, 2874–2877 (2003)

https://doi.org/10.1116/1.1619958

Published: December 2003

View articletitled, Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff

Journal Articles

Ultrafast patterning of nanostructures in polymers using laser assisted nanoimprint lithography

Qiangfei Xia, Chris Keimel, Haixiong Ge, Zhaoning Yu, Wei Wu, Stephen Y. Chou

Appl. Phys. Lett. 83, 4417–4419 (2003)

https://doi.org/10.1063/1.1630162

Published: November 2003

View articletitled, Ultrafast patterning of nanostructures in polymers using laser assisted nanoimprint lithography

Journal Articles

Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography

Zhaoning Yu, Lei Chen, Wei Wu, Haixiong Ge, Stephen Y. Chou

J. Vac. Sci. Technol. B 21, 2089–2092 (2003)

https://doi.org/10.1116/1.1609471

Published: September 2003

View articletitled, Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography

Journal Articles

Room-temperature Si single-electron memory fabricated by nanoimprint lithography

Wei Wu, Jian Gu, Haixiong Ge, Christopher Keimel, Stephen Y. Chou

Appl. Phys. Lett. 83, 2268–2270 (2003)

https://doi.org/10.1063/1.1610814

Published: September 2003

View articletitled, Room-temperature Si single-electron memory fabricated by nanoimprint lithography

Journal Articles

Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels

Wei Zhang, Stephen Y. Chou

Appl. Phys. Lett. 83, 1632–1634 (2003)

https://doi.org/10.1063/1.1600505

Published: August 2003

View articletitled, Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels

Journal Articles

Dynamic modeling and scaling of nanostructure formation in the lithographically induced self-assembly and self-construction

Lin Wu, Stephen Y. Chou

Appl. Phys. Lett. 82, 3200–3202 (2003)

https://doi.org/10.1063/1.1572963

Published: May 2003

View articletitled, Dynamic modeling and scaling of nanostructure formation in the lithographically induced self-assembly and self-construction

Journal Articles

Large area direct nanoimprinting of SiO 2 – TiO 2 gel gratings for optical applications

Mingtao Li, Hua Tan, Lei Chen, Jian Wang, Stephen Y. Chou

J. Vac. Sci. Technol. B 21, 660–663 (2003)

https://doi.org/10.1116/1.1545736

Published: February 2003

View articletitled, Large area direct nanoimprinting of SiO 2 – TiO 2 gel gratings for optical applications

Journal Articles

Fabrication of 70 nm channel length polymer organic thin-film transistors using nanoimprint lithography

Michael D. Austin, Stephen Y. Chou

Appl. Phys. Lett. 81, 4431–4433 (2002)

https://doi.org/10.1063/1.1526457

Published: December 2002

View articletitled, Fabrication of 70 nm channel length polymer organic thin-film transistors using nanoimprint lithography

Journal Articles

Gradient nanostructures for interfacing microfluidics and nanofluidics

Han Cao, Jonas O. Tegenfeldt, Robert H. Austin, Stephen Y. Chou

Appl. Phys. Lett. 81, 3058–3060 (2002)

https://doi.org/10.1063/1.1515115

Published: October 2002

View articletitled, Gradient nanostructures for interfacing microfluidics and nanofluidics

Journal Articles

Single-crystal Si formed on amorphous substrate at low temperature by nanopatterning and nickel-induced lateral crystallization

Jian Gu, Stephen Y. Chou, Nan Yao, Henny Zandbergen, Jeffrey K. Farrer

Appl. Phys. Lett. 81, 1104–1106 (2002)

https://doi.org/10.1063/1.1498146

Published: August 2002

View articletitled, Single-crystal Si formed on amorphous substrate at low temperature by nanopatterning and nickel-induced lateral crystallization

Journal Articles

Fabrication of 10 nm enclosed nanofluidic channels

Han Cao, Zhaoning Yu, Jian Wang, Jonas O. Tegenfeldt, Robert H. Austin, Erli Chen, Wei Wu, Stephen Y. Chou

Appl. Phys. Lett. 81, 174–176 (2002)

https://doi.org/10.1063/1.1489102

Published: July 2002

View articletitled, Fabrication of 10 nm enclosed nanofluidic channels

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Silicon nanopillar anodes for lithium-ion batteries using nanoimprint lithography with flexible molds

Self-aligned fabrication of 10 nm wide asymmetric trenches for Si/SiGe heterojunction tunneling field effect transistors using nanoimprint lithography, shadow evaporation, and etching

Nanoimprint mold fabrication and replication by room-temperature conformal chemical vapor deposition

High fidelity fabrication of microlens arrays by nanoimprint using conformal mold duplication and low-pressure liquid material curing

Large area 50 nm period grating by multiple nanoimprint lithography and spatial frequency doubling

Alkylsiloxane self-assembled monolayer formation guided by nanoimprinted Si and Si O 2 templates

In situ real time monitoring of nanosecond imprint process

In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry

Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography

Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff

Ultrafast patterning of nanostructures in polymers using laser assisted nanoimprint lithography

Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography

Room-temperature Si single-electron memory fabricated by nanoimprint lithography

Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels

Dynamic modeling and scaling of nanostructure formation in the lithographically induced self-assembly and self-construction

Large area direct nanoimprinting of SiO 2 – TiO 2 gel gratings for optical applications

Fabrication of 70 nm channel length polymer organic thin-film transistors using nanoimprint lithography

Gradient nanostructures for interfacing microfluidics and nanofluidics

Single-crystal Si formed on amorphous substrate at low temperature by nanopatterning and nickel-induced lateral crystallization

Fabrication of 10 nm enclosed nanofluidic channels

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