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Journal Articles

Generation of low‐energy neutral beams and radiation damage of SiO2/Si by neutral bombardment

Tatsumi Mizutani, Shigeru Nishimatsu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 547–550 (1989)
https://doi.org/10.1116/1.584782
Published: May 1989
View article titled, Generation of low‐energy neutral beams and radiation damage of SiO<sub>2</sub>/Si by neutral bombardment
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Journal Articles

Anisotropic etching of polycrystalline silicon with a hot Cl2 molecular beam

Keizo Suzuki, Susumu Hiraoka, Shigeru Nishimatsu
Journal: Journal of Applied Physics
J. Appl. Phys. 64, 3697–3705 (1988)
https://doi.org/10.1063/1.341413
Published: October 1988
View article titled, Anisotropic etching of polycrystalline silicon with a hot Cl<sub>2</sub> molecular beam
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Journal Articles

Sputtering yield and radiation damage by neutral beam bombardment

Tatsumi Mizutani, Shigeru Nishimatsu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 6, 1417–1420 (1988)
https://doi.org/10.1116/1.575717
Published: May 1988
View article titled, Sputtering yield and radiation damage by neutral beam bombardment
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Journal Articles

Role of sulfur atoms in microwave plasma etching of silicon

Ken Ninomiya, Keizo Suzuki, Shigeru Nishimatsu, Osami Okada
Journal: Journal of Applied Physics
J. Appl. Phys. 62, 1459–1468 (1987)
https://doi.org/10.1063/1.339652
Published: August 1987
View article titled, Role of sulfur atoms in microwave plasma etching of silicon
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Journal Articles

Summary Abstract: Silicon etching with a hot SF6 molecular beam

Keizo Suzuki, Ken Ninomiya, Shigeru Nishimatsu, Osami Okada
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 5, 1605–1606 (1987)
https://doi.org/10.1116/1.574573
Published: July 1987
View article titled, Summary Abstract: Silicon etching with a hot SF<sub>6</sub> molecular beam
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Journal Articles

Diagnostics of microwave plasma by laser induced fluorescence

Ken Ninomiya, Keizo Suzuki, Shigeru Nishimatsu, Osami Okada
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 4, 1791–1794 (1986)
https://doi.org/10.1116/1.573939
Published: May 1986
View article titled, Diagnostics of microwave plasma by laser induced fluorescence
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Journal Articles

Reaction of atomic fluorine with silicon

Ken Ninomiya, Keizo Suzuki, Shigeru Nishimatsu, Osami Okada
Journal: Journal of Applied Physics
J. Appl. Phys. 58, 1177–1182 (1985)
https://doi.org/10.1063/1.336133
Published: August 1985
View article titled, Reaction of atomic fluorine with silicon
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Journal Articles

Radio‐frequency biased microwave plasma etching technique: A method to increase SiO2 etch rate

Keizo Suzuki, Ken Ninomiya, Shigeru Nishimatsu, Sadayuki Okudaira
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 3, 1025–1034 (1985)
https://doi.org/10.1116/1.583090
Published: July 1985
View article titled, Radio‐frequency biased microwave plasma etching technique: A method to increase SiO<sub>2</sub> etch rate
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Journal Articles

An experimental system for surface reaction studies in microwave plasma etching

Ken Ninomiya, Keizo Suzuki, Shigeru Nishimatsu, Yoshitaka Gotoh, Osami Okada
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 2, 645–652 (1984)
https://doi.org/10.1116/1.582856
Published: October 1984
View article titled, An experimental system for surface reaction studies in microwave plasma etching
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Journal Articles

A simple method for measuring the interface state density

Shigeru Nishimatsu, Mikio Ashikawa
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 45, 1109–1112 (1974)
https://doi.org/10.1063/1.1686820
Published: September 1974
View article titled, A simple method for measuring the interface state density
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