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Journal Articles

Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity

F. Weilnboeck, D. Metzler, N. Kumar, G. S. Oehrlein, R. L. Bruce, S. Engelmann, N. Fuller
Journal: Applied Physics Letters
Appl. Phys. Lett. 99, 261501 (2011)
https://doi.org/10.1063/1.3671995
Published: December 2011
View article titled, Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity
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Journal Articles

Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry

F. Weilnboeck, R. L. Bruce, S. Engelmann, G. S. Oehrlein, D. Nest, T.-Y. Chung, D. Graves, M. Li, D. Wang, C. Andes, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 993–1004 (2010)
https://doi.org/10.1116/1.3484249
Published: September 2010
View article titled, Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry
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Journal Articles

Hydrogen silsesquioxane-based hybrid electron beam and optical lithography for high density circuit prototyping

M. Guillorn, J. Chang, N. Fuller, J. Patel, M. Darnon, A. Pyzyna, E. Joseph, S. Engelmann, J. Ott, J. Newbury, D. Klaus, J. Bucchignano, P. Joshi, C. Scerbo, E. Kratschmer, W. Graham, B. To, J. Parisi, Y. Zhang, W. Haensch
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 2588–2592 (2009)
https://doi.org/10.1116/1.3246357
Published: December 2009
View article titled, Hydrogen silsesquioxane-based hybrid electron beam and optical lithography for high density circuit prototyping
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Journal Articles

Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C 4 F 8 - and C F 4 -based discharges

S. Engelmann, R. L. Bruce, F. Weilnboeck, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1165–1179 (2009)
https://doi.org/10.1116/1.3137012
Published: May 2009
View article titled, Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C 4 F 8 - and C F 4 -based discharges
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Journal Articles

Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma

R. L. Bruce, S. Engelmann, T. Lin, T. Kwon, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, J. J. Végh, D. Nest, D. B. Graves, A. Alizadeh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1142–1155 (2009)
https://doi.org/10.1116/1.3136864
Published: May 2009
View article titled, Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma
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Journal Articles

Plasma-surface interactions of advanced photoresists with C 4 F 8 ∕ Ar discharges: Plasma parameter dependencies

S. Engelmann, R. L. Bruce, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 92–106 (2009)
https://doi.org/10.1116/1.3054342
Published: January 2009
View article titled, Plasma-surface interactions of advanced photoresists with C 4 F 8 ∕ Ar discharges: Plasma parameter dependencies
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Journal Articles

Real-time studies of surface roughness development and reticulation mechanism of advanced photoresist materials during plasma processing

A. R. Pal, R. L. Bruce, F. Weilnboeck, S. Engelmann, T. Lin, M.-S. Kuo, R. Phaneuf, G. S. Oehrlein
Journal: Journal of Applied Physics
J. Appl. Phys. 105, 013311 (2009)
https://doi.org/10.1063/1.3055268
Published: January 2009
View article titled, Real-time studies of surface roughness development and reticulation mechanism of advanced photoresist materials during plasma processing
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Journal Articles

Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure III. Effect of fluorocarbon film and initial surface condition on photoresist degradation

M. Sumiya, R. Bruce, S. Engelmann, F. Weilnboeck, G. S. Oehrlein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 1978–1986 (2008)
https://doi.org/10.1116/1.3021037
Published: November 2008
View article titled, Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure III. Effect of fluorocarbon film and initial surface condition on photoresist degradation
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Journal Articles

Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposures. II. Plasma parameter trends for photoresist degradation

M. Sumiya, R. Bruce, S. Engelmann, F. Weilnboeck, G. S. Oehrlein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 1647–1653 (2008)
https://doi.org/10.1116/1.2960563
Published: September 2008
View article titled, Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposures. II. Plasma parameter trends for photoresist degradation
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Journal Articles

Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation

M. Sumiya, R. Bruce, S. Engelmann, F. Weilnboeck, G. S. Oehrlein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 1637–1646 (2008)
https://doi.org/10.1116/1.2960561
Published: September 2008
View article titled, Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation
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Journal Articles

Molecular dynamics simulations of near-surface modification of polystyrene: Bombardment with Ar + and Ar + / radical chemistries

J. J. Végh, D. Nest, D. B. Graves, R. Bruce, S. Engelmann, T. Kwon, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson
Journal: Journal of Applied Physics
J. Appl. Phys. 104, 034308 (2008)
https://doi.org/10.1063/1.2963708
Published: August 2008
View article titled, Molecular dynamics simulations of near-surface modification of polystyrene: Bombardment with Ar + and Ar + / radical chemistries
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Journal Articles

Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation

D. Nest, D. B. Graves, S. Engelmann, R. L. Bruce, F. Weilnboeck, G. S. Oehrlein, C. Andes, E. A. Hudson
Journal: Applied Physics Letters
Appl. Phys. Lett. 92, 153113 (2008)
https://doi.org/10.1063/1.2912028
Published: April 2008
View article titled, Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation
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Journal Articles

Near-surface modification of polystyrene by Ar + : Molecular dynamics simulations and experimental validation

J. J. Végh, D. Nest, D. B. Graves, R. Bruce, S. Engelmann, T. Kwon, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson
Journal: Applied Physics Letters
Appl. Phys. Lett. 91, 233113 (2007)
https://doi.org/10.1063/1.2821226
Published: December 2007
View article titled, Near-surface modification of polystyrene by Ar + : Molecular dynamics simulations and experimental validation
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Journal Articles

Plasma-surface interactions of model polymers for advanced photoresists using C 4 F 8 ∕ Ar discharges and energetic ion beams

S. Engelmann, R. L. Bruce, T. Kwon, R. Phaneuf, G. S. Oehrlein, Y. C. Bae, C. Andes, D. Graves, D. Nest, E. A. Hudson, P. Lazzeri, E. Iacob, M. Anderle
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 1353–1364 (2007)
https://doi.org/10.1116/1.2759935
Published: July 2007
View article titled, Plasma-surface interactions of model polymers for advanced photoresists using C 4 F 8 ∕ Ar discharges and energetic ion beams
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Journal Articles

Studies of plasma surface interactions during short time plasma etching of 193 and 248 nm photoresist materials

Xuefeng Hua, S. Engelmann, G. S. Oehrlein, P. Jiang, P. Lazzeri, E. Iacob, M. Anderle
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 1850–1858 (2006)
https://doi.org/10.1116/1.2217973
Published: June 2006
View article titled, Studies of plasma surface interactions during short time plasma etching of 193 and 248 nm photoresist materials
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