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Riikka L. Puurunen
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Journal Articles

Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition

Oili M. E. Ylivaara, Andreas Langner, Satu Ek, Jari Malm, Jaakko Julin, Mikko Laitinen, Saima Ali, Sakari Sintonen, Harri Lipsanen, Timo Sajavaara, Riikka L. Puurunen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062414 (2022)
https://doi.org/10.1116/6.0002095
Published: November 2022
View article titled, Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
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Journal Articles

Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3 extracted from their impact on film conformality

Karsten Arts, Vincent Vandalon, Riikka L. Puurunen, Mikko Utriainen, Feng Gao, Wilhelmus M. M. (Erwin) Kessels, Harm C. M. Knoops
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 030908 (2019)
https://doi.org/10.1116/1.5093620
Published: April 2019
View article titled, Sticking probabilities of H<sub>2</sub>O and Al(CH<sub>3</sub>)<sub>3</sub> during atomic layer deposition of Al<sub>2</sub>O<sub>3</sub> extracted from their impact on film conformality
Open the PDF for Sticking probabilities of H<sub>2</sub>O and Al(CH<sub>3</sub>)<sub>3</sub> during atomic layer deposition of Al<sub>2</sub>O<sub>3</sub> extracted from their impact on film conformality in another window
Journal Articles

Conformality in atomic layer deposition: Current status overview of analysis and modelling

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Véronique Cremers, Riikka L. Puurunen, Jolien Dendooven
Journal: Applied Physics Reviews
Appl. Phys. Rev. 6, 021302 (2019)
https://doi.org/10.1063/1.5060967
Published: April 2019
View article titled, Conformality in atomic layer deposition: Current status overview of analysis and modelling
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Journal Articles

Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

Perttu Sippola, Alexander Pyymaki Perros, Oili M. E. Ylivaara, Helena Ronkainen, Jaakko Julin, Xuwen Liu, Timo Sajavaara, Jarkko Etula, Harri Lipsanen, Riikka L. Puurunen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 051508 (2018)
https://doi.org/10.1116/1.5038856
Published: July 2018
View article titled, Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
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Includes: Supplementary data
Journal Articles

Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures

Markku Ylilammi, Oili M. E. Ylivaara, Riikka L. Puurunen
Journal: Journal of Applied Physics
J. Appl. Phys. 123, 205301 (2018)
https://doi.org/10.1063/1.5028178
Published: May 2018
View article titled, Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures
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Journal Articles

Tribological properties of thin films made by atomic layer deposition sliding against silicon

Lauri Kilpi, Oili M. E. Ylivaara, Antti Vaajoki, Xuwen Liu, Ville Rontu, Sakari Sintonen, Eero Haimi, Jari Malm, Markus Bosund, Marko Tuominen, Timo Sajavaara, Harri Lipsanen, Simo-Pekka Hannula, Riikka L. Puurunen, Helena Ronkainen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A122 (2018)
https://doi.org/10.1116/1.5003729
Published: December 2017
View article titled, Tribological properties of thin films made by atomic layer deposition sliding against silicon
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Journal Articles

Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”

Esko Ahvenniemi, Andrew R. Akbashev, Saima Ali, Mikhael Bechelany, Maria Berdova, Stefan Boyadjiev, David C. Cameron, Rong Chen, Mikhail Chubarov, Veronique Cremers, Anjana Devi, Viktor Drozd, Liliya Elnikova, Gloria Gottardi, Kestutis Grigoras, Dennis M. Hausmann, Cheol Seong Hwang, Shih-Hui Jen, Tanja Kallio, Jaana Kanervo, Ivan Khmelnitskiy, Do Han Kim, Lev Klibanov, Yury Koshtyal, A. Outi I. Krause, Jakob Kuhs, Irina Kärkkänen, Marja-Leena Kääriäinen, Tommi Kääriäinen, Luca Lamagna, Adam A. Łapicki, Markku Leskelä, Harri Lipsanen, Jussi Lyytinen, Anatoly Malkov, Anatoly Malygin, Abdelkader Mennad, Christian Militzer, Jyrki Molarius, Małgorzata Norek, Çağla Özgit-Akgün, Mikhail Panov, Henrik Pedersen, Fabien Piallat, Georgi Popov, Riikka L. Puurunen, Geert Rampelberg, Robin H. A. Ras, Erwan Rauwel, Fred Roozeboom, Timo Sajavaara, Hossein Salami, Hele Savin, Nathanaelle Schneider, Thomas E. Seidel, Jonas Sundqvist, Dmitry B. Suyatin, Tobias Törndahl, J. Ruud van Ommen, Claudia Wiemer, Oili M. E. Ylivaara, Oksana Yurkevich
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 010801 (2017)
https://doi.org/10.1116/1.4971389
Published: December 2016
View article titled, Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”
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Includes: Supplementary data
Journal Articles

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

Oili M. E. Ylivaara, Lauri Kilpi, Xuwen Liu, Sakari Sintonen, Saima Ali, Mikko Laitinen, Jaakko Julin, Eero Haimi, Timo Sajavaara, Harri Lipsanen, Simo-Pekka Hannula, Helena Ronkainen, Riikka L. Puurunen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B105 (2017)
https://doi.org/10.1116/1.4966198
Published: November 2016
View article titled, Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties
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Journal Articles

Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon

Lauri Kilpi, Oili M. E. Ylivaara, Antti Vaajoki, Jari Malm, Sakari Sintonen, Marko Tuominen, Riikka L. Puurunen, Helena Ronkainen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 01A124 (2016)
https://doi.org/10.1116/1.4935959
Published: November 2015
View article titled, Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon
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Journal Articles

Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis

Feng Gao, Sanna Arpiainen, Riikka L. Puurunen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 010601 (2015)
https://doi.org/10.1116/1.4903941
Published: December 2014
View article titled, Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis
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Journal Articles

Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

Maria Berdova, Oili M. E. Ylivaara, Ville Rontu, Pekka T. Törmä, Riikka L. Puurunen, Sami Franssila
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 01A106 (2015)
https://doi.org/10.1116/1.4893769
Published: August 2014
View article titled, Fracture properties of atomic layer deposited aluminum oxide free-standing membranes
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Journal Articles

On the reliability of nanoindentation hardness of Al2O3 films grown on Si-wafer by atomic layer deposition

Xuwen Liu, Eero Haimi, Simo-Pekka Hannula, Oili M. E. Ylivaara, Riikka L. Puurunen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 01A116 (2014)
https://doi.org/10.1116/1.4842655
Published: December 2013
View article titled, On the reliability of nanoindentation hardness of Al<sub>2</sub>O<sub>3</sub> films grown on Si-wafer by atomic layer deposition
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Journal Articles

X-ray reflectivity characterization of atomic layer deposition Al2O3/TiO2 nanolaminates with ultrathin bilayers

Sakari Sintonen, Saima Ali, Oili M. E. Ylivaara, Riikka L. Puurunen, Harri Lipsanen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 01A111 (2014)
https://doi.org/10.1116/1.4833556
Published: December 2013
View article titled, X-ray reflectivity characterization of atomic layer deposition Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> nanolaminates with ultrathin bilayers
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Journal Articles

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

Ville Miikkulainen, Markku Leskelä, Mikko Ritala, Riikka L. Puurunen
Journal: Journal of Applied Physics
J. Appl. Phys. 113, 021301 (2013)
https://doi.org/10.1063/1.4757907
Published: January 2013
View article titled, Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
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Journal Articles

Reply to “Comment on ‘Analysis of hydroxyl group controlled atomic layer deposition of hafnium oxide from hafnium tetrachloride and water” ’ [J. Appl. Phys. 95, 4777 (2004)]

Riikka L. Puurunen
Journal: Journal of Applied Physics
J. Appl. Phys. 98, 016102 (2005)
https://doi.org/10.1063/1.1943503
Published: July 2005
View article titled, Reply to “Comment on ‘Analysis of hydroxyl group controlled atomic layer deposition of hafnium oxide from hafnium tetrachloride and water” ’ [J. Appl. Phys. 95, 4777 (2004)]
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Journal Articles

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

Riikka L. Puurunen
Journal: Journal of Applied Physics
J. Appl. Phys. 97, 121301 (2005)
https://doi.org/10.1063/1.1940727
Published: June 2005
View article titled, Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
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Journal Articles

Atomic layer deposition of hafnium oxide on germanium substrates

Annelies Delabie, Riikka L. Puurunen, Bert Brijs, Matty Caymax, Thierry Conard, Bart Onsia, Olivier Richard, Wilfried Vandervorst, Chao Zhao, Marc M. Heyns, Marc Meuris, Minna M. Viitanen, Hidde H. Brongersma, Marco de Ridder, Lyudmila V. Goncharova, Eric Garfunkel, Torgny Gustafsson, Wilman Tsai
Journal: Journal of Applied Physics
J. Appl. Phys. 97, 064104 (2005)
https://doi.org/10.1063/1.1856221
Published: March 2005
View article titled, Atomic layer deposition of hafnium oxide on germanium substrates
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Journal Articles

Hafnium oxide films by atomic layer deposition for high- κ gate dielectric applications: Analysis of the density of nanometer-thin films

Riikka L. Puurunen, Annelies Delabie, Sven Van Elshocht, Matty Caymax, Martin L. Green, Bert Brijs, Olivier Richard, Hugo Bender, Thierry Conard, Ilse Hoflijk, Wilfried Vandervorst, David Hellin, Danielle Vanhaeren, Chao Zhao, Stefan De Gendt, Marc Heyns
Journal: Applied Physics Letters
Appl. Phys. Lett. 86, 073116 (2005)
https://doi.org/10.1063/1.1866219
Published: February 2005
View article titled, Hafnium oxide films by atomic layer deposition for high- κ gate dielectric applications: Analysis of the density of nanometer-thin films
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Journal Articles

Island growth as a growth mode in atomic layer deposition: A phenomenological model

Riikka L. Puurunen, Wilfried Vandervorst
Journal: Journal of Applied Physics
J. Appl. Phys. 96, 7686–7695 (2004)
https://doi.org/10.1063/1.1810193
Published: December 2004
View article titled, Island growth as a growth mode in atomic layer deposition: A phenomenological model
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Journal Articles

Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy

Riikka L. Puurunen, Wilfried Vandervorst, Wim F. A. Besling, Olivier Richard, Hugo Bender, Thierry Conard, Chao Zhao, Annelies Delabie, Matty Caymax, Stefan De Gendt, Marc Heyns, Minna M. Viitanen, Marco de Ridder, Hidde H. Brongersma, Yde Tamminga, Thuy Dao, Toon de Win, Marcel Verheijen, Monja Kaiser, Marko Tuominen
Journal: Journal of Applied Physics
J. Appl. Phys. 96, 4878–4889 (2004)
https://doi.org/10.1063/1.1787624
Published: November 2004
View article titled, Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy
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