1-16 of 16
R. Spolenak
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Sensing strain-induced symmetry breaking by reflectance anisotropy spectroscopy

M. Volpi, S. Beck, A. Hampel, H. Galinski, A. Sologubenko, R. Spolenak
Journal: Applied Physics Letters
Appl. Phys. Lett. 119, 151602 (2021)
https://doi.org/10.1063/5.0060930
Published: October 2021
View articletitled, Sensing strain-induced symmetry breaking by reflectance anisotropy spectroscopy
Open the PDF for Sensing strain-induced symmetry breaking by reflectance anisotropy spectroscopy in another window
Includes: Supplementary data
Journal Articles

Optical properties and structural coloration of chocolate

H. Galinski, E. Jeoffroy, A. Zingg, L. Grob, P. A. Rühs, R. Spolenak, A. R. Studart
Journal: Applied Physics Letters
Appl. Phys. Lett. 117, 183701 (2020)
https://doi.org/10.1063/5.0028535
Published: November 2020
View articletitled, Optical properties and structural coloration of chocolate
Open the PDF for Optical properties and structural coloration of chocolate in another window
Includes: Supplementary data
Journal Articles

Architecture-independent reactivity tuning of Ni/Al multilayers by solid solution alloying

S. Danzi, V. Schnabel, X. Zhao, J. Käch, R. Spolenak
Journal: Applied Physics Letters
Appl. Phys. Lett. 114, 183102 (2019)
https://doi.org/10.1063/1.5095828
Published: May 2019
View articletitled, Architecture-independent reactivity tuning of Ni/Al multilayers by solid solution alloying
Open the PDF for Architecture-independent reactivity tuning of Ni/Al multilayers by solid solution alloying in another window
Includes: Supplementary data
Journal Articles

Excess carrier lifetimes in Ge layers on Si

R. Geiger, J. Frigerio, M. J. Süess, D. Chrastina, G. Isella, R. Spolenak, J. Faist, H. Sigg
Journal: Applied Physics Letters
Appl. Phys. Lett. 104, 062106 (2014)
https://doi.org/10.1063/1.4865237
Published: February 2014
View articletitled, Excess carrier lifetimes in Ge layers on Si
Open the PDF for Excess carrier lifetimes in Ge layers on Si in another window
Journal Articles

Ion-induced grain growth and texturing in refractory thin films—A low temperature process

M. Seita, A. Reiser, R. Spolenak
Journal: Applied Physics Letters
Appl. Phys. Lett. 101, 251905 (2012)
https://doi.org/10.1063/1.4772640
Published: December 2012
View articletitled, Ion-induced grain growth and texturing in refractory thin films—A low temperature process
Open the PDF for Ion-induced grain growth and texturing in refractory thin films—A low temperature process in another window
Journal Articles

Crystal plasticity in Cu damascene interconnect lines undergoing electromigration as revealed by synchrotron x-ray microdiffraction

A. S. Budiman, W. D. Nix, N. Tamura, B. C. Valek, K. Gadre, J. Maiz, R. Spolenak, J. R. Patel
Journal: Applied Physics Letters
Appl. Phys. Lett. 88, 233515 (2006)
https://doi.org/10.1063/1.2210451
Published: June 2006
View articletitled, Crystal plasticity in Cu damascene interconnect lines undergoing electromigration as revealed by synchrotron x-ray microdiffraction
Open the PDF for Crystal plasticity in Cu damascene interconnect lines undergoing electromigration as revealed by synchrotron x-ray microdiffraction in another window
Journal Articles

X‐Ray Microdiffraction as a Probe to Reveal Flux Divergences in Interconnects

R. Spolenak, N. Tamura, J. R. Patel
Journal: AIP Conference Proceedings
AIP Conf. Proc. 817, 288–295 (2006)
https://doi.org/10.1063/1.2173561
Published: February 2006
View articletitled, X‐Ray Microdiffraction as a Probe to Reveal Flux Divergences in Interconnects
Open the PDF for X‐Ray Microdiffraction as a Probe to Reveal Flux Divergences in Interconnects in another window
Journal Articles

Tensile testing of ultrathin polycrystalline films: A synchrotron-based technique

J. Böhm, P. Gruber, R. Spolenak, A. Stierle, A. Wanner, E. Arzt
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 75, 1110–1119 (2004)
https://doi.org/10.1063/1.1669124
Published: April 2004
View articletitled, Tensile testing of ultrathin polycrystalline films: A synchrotron-based technique
Open the PDF for Tensile testing of ultrathin polycrystalline films: A synchrotron-based technique in another window
Journal Articles

Early stage of plastic deformation in thin films undergoing electromigration

B. C. Valek, N. Tamura, R. Spolenak, W. A. Caldwell, A. A. MacDowell, R. S. Celestre, H. A. Padmore, J. C. Bravman, B. W. Batterman, W. D. Nix, J. R. Patel
Journal: Journal of Applied Physics
J. Appl. Phys. 94, 3757–3761 (2003)
https://doi.org/10.1063/1.1600843
Published: September 2003
View articletitled, Early stage of plastic deformation in thin films undergoing electromigration
Open the PDF for Early stage of plastic deformation in thin films undergoing electromigration in another window
Journal Articles

Quantitative analysis of dislocation arrangements induced by electromigration in a passivated Al  (0.5  wt  %  Cu ) interconnect

R. I. Barabash, G. E. Ice, N. Tamura, B. C. Valek, J. C. Bravman, R. Spolenak, J. R. Patel
Journal: Journal of Applied Physics
J. Appl. Phys. 93, 5701–5706 (2003)
https://doi.org/10.1063/1.1563033
Published: May 2003
View articletitled, Quantitative analysis of dislocation arrangements induced by electromigration in a passivated Al  (0.5  wt  %  Cu ) interconnect
Open the PDF for Quantitative analysis of dislocation arrangements induced by electromigration in a passivated Al  (0.5  wt  %  Cu ) interconnect in another window
Journal Articles

Electromigration-induced plastic deformation in passivated metal lines

B. C. Valek, J. C. Bravman, N. Tamura, A. A. MacDowell, R. S. Celestre, H. A. Padmore, R. Spolenak, W. L. Brown, B. W. Batterman, J. R. Patel
Journal: Applied Physics Letters
Appl. Phys. Lett. 81, 4168–4170 (2002)
https://doi.org/10.1063/1.1525880
Published: November 2002
View articletitled, Electromigration-induced plastic deformation in passivated metal lines
Open the PDF for Electromigration-induced plastic deformation in passivated metal lines in another window
Journal Articles

High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron x-ray diffraction

N. Tamura, A. A. MacDowell, R. S. Celestre, H. A. Padmore, B. Valek, J. C. Bravman, R. Spolenak, W. L. Brown, T. Marieb, H. Fujimoto, B. W. Batterman, J. R. Patel
Journal: Applied Physics Letters
Appl. Phys. Lett. 80, 3724–3726 (2002)
https://doi.org/10.1063/1.1477621
Published: May 2002
View articletitled, High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron x-ray diffraction
Open the PDF for High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron x-ray diffraction in another window
Journal Articles

High resolution microdiffraction studies using synchrotron radiation

R. Spolenak, N. Tamura, B. C. Valek, A. A. MacDowell, R. S. Celestre, H. A. Padmore, W. L. Brown, T. Marieb, B. W. Batterman, J. R. Patel
Journal: AIP Conference Proceedings
AIP Conf. Proc. 612, 217–228 (2002)
https://doi.org/10.1063/1.1469906
Published: April 2002
View articletitled, High resolution microdiffraction studies using synchrotron radiation
Open the PDF for High resolution microdiffraction studies using synchrotron radiation in another window
Journal Articles

Submicron x-ray diffraction and its applications to problems in materials and environmental science

N. Tamura, R. S. Celestre, A. A. MacDowell, H. A. Padmore, R. Spolenak, B. C. Valek, N. Meier Chang, A. Manceau, J. R. Patel
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 73, 1369–1372 (2002)
https://doi.org/10.1063/1.1436539
Published: March 2002
View articletitled, Submicron x-ray diffraction and its applications to problems in materials and environmental science
Open the PDF for Submicron x-ray diffraction and its applications to problems in materials and environmental science in another window
Journal Articles

Alloying effects in electromigration: What controls the electromigration drift?

R. Spolenak, O. Kraft, E. Arzt
Journal: AIP Conference Proceedings
AIP Conf. Proc. 491, 126–137 (1999)
https://doi.org/10.1063/1.59900
Published: November 1999
View articletitled, Alloying effects in electromigration: What controls the electromigration drift?
Open the PDF for Alloying effects in electromigration: What controls the electromigration drift? in another window
Journal Articles

Alloying effects in electromigration: Modeling and experiments

R. Spolenak, O. Kraft, W. D. Nix, E. Arzt
Journal: AIP Conference Proceedings
AIP Conf. Proc. 418, 147–158 (1998)
https://doi.org/10.1063/1.54636
Published: January 1998
View articletitled, Alloying effects in electromigration: Modeling and experiments
Open the PDF for Alloying effects in electromigration: Modeling and experiments in another window