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Journal Articles

Direct and quantitative evidence for buckling instability as a mechanism for roughening of polymer during plasma etching

T.-C. Lin, R. L. Bruce, G. S. Oehrlein, R. J. Phaneuf, H.-C. Kan
Journal: Applied Physics Letters
Appl. Phys. Lett. 100, 233113 (2012)
https://doi.org/10.1063/1.4718940
Published: June 2012
View article titled, Direct and quantitative evidence for buckling instability as a mechanism for roughening of polymer during plasma etching
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Journal Articles

Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity

F. Weilnboeck, D. Metzler, N. Kumar, G. S. Oehrlein, R. L. Bruce, S. Engelmann, N. Fuller
Journal: Applied Physics Letters
Appl. Phys. Lett. 99, 261501 (2011)
https://doi.org/10.1063/1.3671995
Published: December 2011
View article titled, Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity
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Journal Articles

On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists

R. L. Bruce, F. Weilnboeck, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, A. Alizadeh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 041604 (2011)
https://doi.org/10.1116/1.3607604
Published: July 2011
View article titled, On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists
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Journal Articles

Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry

F. Weilnboeck, R. L. Bruce, S. Engelmann, G. S. Oehrlein, D. Nest, T.-Y. Chung, D. Graves, M. Li, D. Wang, C. Andes, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 993–1004 (2010)
https://doi.org/10.1116/1.3484249
Published: September 2010
View article titled, Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry
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Journal Articles

Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma

R. L. Bruce, T. Lin, R. J. Phaneuf, G. S. Oehrlein, W. Bell, B. Long, C. G. Willson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 751–757 (2010)
https://doi.org/10.1116/1.3455496
Published: July 2010
View article titled, Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
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Journal Articles

Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films

R. L. Bruce, F. Weilnboeck, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, J. J. Vegh, D. Nest, D. B. Graves
Journal: Journal of Applied Physics
J. Appl. Phys. 107, 084310 (2010)
https://doi.org/10.1063/1.3373587
Published: April 2010
View article titled, Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films
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Journal Articles

Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C 4 F 8 - and C F 4 -based discharges

S. Engelmann, R. L. Bruce, F. Weilnboeck, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1165–1179 (2009)
https://doi.org/10.1116/1.3137012
Published: May 2009
View article titled, Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C 4 F 8 - and C F 4 -based discharges
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Journal Articles

Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma

R. L. Bruce, S. Engelmann, T. Lin, T. Kwon, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, J. J. Végh, D. Nest, D. B. Graves, A. Alizadeh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1142–1155 (2009)
https://doi.org/10.1116/1.3136864
Published: May 2009
View article titled, Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma
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Journal Articles

Real-time studies of surface roughness development and reticulation mechanism of advanced photoresist materials during plasma processing

A. R. Pal, R. L. Bruce, F. Weilnboeck, S. Engelmann, T. Lin, M.-S. Kuo, R. Phaneuf, G. S. Oehrlein
Journal: Journal of Applied Physics
J. Appl. Phys. 105, 013311 (2009)
https://doi.org/10.1063/1.3055268
Published: January 2009
View article titled, Real-time studies of surface roughness development and reticulation mechanism of advanced photoresist materials during plasma processing
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Journal Articles

Plasma-surface interactions of advanced photoresists with C 4 F 8 ∕ Ar discharges: Plasma parameter dependencies

S. Engelmann, R. L. Bruce, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 92–106 (2009)
https://doi.org/10.1116/1.3054342
Published: January 2009
View article titled, Plasma-surface interactions of advanced photoresists with C 4 F 8 ∕ Ar discharges: Plasma parameter dependencies
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Journal Articles

Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation

D. Nest, D. B. Graves, S. Engelmann, R. L. Bruce, F. Weilnboeck, G. S. Oehrlein, C. Andes, E. A. Hudson
Journal: Applied Physics Letters
Appl. Phys. Lett. 92, 153113 (2008)
https://doi.org/10.1063/1.2912028
Published: April 2008
View article titled, Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation
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Journal Articles

Plasma-surface interactions of model polymers for advanced photoresists using C 4 F 8 ∕ Ar discharges and energetic ion beams

S. Engelmann, R. L. Bruce, T. Kwon, R. Phaneuf, G. S. Oehrlein, Y. C. Bae, C. Andes, D. Graves, D. Nest, E. A. Hudson, P. Lazzeri, E. Iacob, M. Anderle
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 1353–1364 (2007)
https://doi.org/10.1116/1.2759935
Published: July 2007
View article titled, Plasma-surface interactions of model polymers for advanced photoresists using C 4 F 8 ∕ Ar discharges and energetic ion beams
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Journal Articles

Development of a Dielectric‐Loaded Accelerator Test Facility Based on an X‐Band Magnicon Amplifier

S. H. Gold, A. K. Kinkead, W. Gai, J. G. Power, R. Konecny, C. Jing, S. G. Tantawi, C. D. Nantista, Y. Hu, X. Du, C. Tang, Y. Lin, R. W. Bruce, R. L. Bruce, A. W. Fliflet, D. Lewis, III
Journal: AIP Conference Proceedings
AIP Conf. Proc. 807, 407 (2006)
https://doi.org/10.1063/1.2158805
Published: January 2006
View article titled, Development of a Dielectric‐Loaded Accelerator Test Facility Based on an X‐Band Magnicon Amplifier
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Journal Articles

Effect of Magnetic Nanoparticles, Their Size and Functionalization on Liquid Crystal Order

L. J. Martinez‐Miranda, Kevin McCarthy, R. L. Bruce, L. K. Kurihara, Jason J. Harry, A. Noel
Journal: AIP Conference Proceedings
AIP Conf. Proc. 795, 209 (2005)
https://doi.org/10.1063/1.2128351
Published: October 2005
View article titled, Effect of Magnetic Nanoparticles, Their Size and Functionalization on Liquid Crystal Order
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Journal Articles

Collision Measurements by Magnetoplasma Pulse Response

R. L. Bruce, J. M. Larsen
Journal: Journal of Applied Physics
J. Appl. Phys. 42, 895–896 (1971)
https://doi.org/10.1063/1.1660128
Published: February 1971
View article titled, Collision Measurements by Magnetoplasma Pulse Response
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Journal Articles

A Reflection Technique for Plasma‐Density Measurement

R. L. Bruce, F. W. Crawford, R. S. Harp
Journal: Journal of Applied Physics
J. Appl. Phys. 39, 3349–3354 (1968)
https://doi.org/10.1063/1.1656781
Published: June 1968
View article titled, A Reflection Technique for Plasma‐Density Measurement
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Journal Articles

Plasma Transient Response and the Determination of Collision Data

R. L. Bruce, F. W. Crawford, R. S. Harp
Journal: Journal of Applied Physics
J. Appl. Phys. 39, 2088–2094 (1968)
https://doi.org/10.1063/1.1656493
Published: March 1968
View article titled, Plasma Transient Response and the Determination of Collision Data
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Journal Articles

Some Studies of Electron Cyclotron Echoes from Plasma

R. S. Harp, R. L. Bruce, F. W. Crawford
Journal: Journal of Applied Physics
J. Appl. Phys. 38, 3385–3394 (1967)
https://doi.org/10.1063/1.1710116
Published: July 1967
View article titled, Some Studies of Electron Cyclotron Echoes from Plasma
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