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Journal Articles

Fundamental understanding of chemical processes in extreme ultraviolet resist materials

Oleg Kostko, Bo Xu, Musahid Ahmed, Daniel S. Slaughter, D. Frank Ogletree, Kristina D. Closser, David G. Prendergast, Patrick Naulleau, Deirdre L. Olynick, Paul D. Ashby, Yi Liu, William D. Hinsberg, Gregory M. Wallraff

J. Chem. Phys. 149, 154305 (2018)

https://doi.org/10.1063/1.5046521

Published: October 2018

View articletitled, Fundamental understanding of chemical processes in extreme ultraviolet resist materials

Includes: Supplementary data

Journal Articles

The importance of inner-shell electronic structure for enhancing the EUV absorption of photoresist materials

Kristina D. Closser, D. Frank Ogletree, Patrick Naulleau, David Prendergast

J. Chem. Phys. 146, 164106 (2017)

https://doi.org/10.1063/1.4981815

Published: April 2017

View articletitled, The importance of inner-shell electronic structure for enhancing the EUV absorption of photoresist materials

Includes: Supplementary data

Journal Articles

X-ray diffraction gratings: Precise control of ultra-low blaze angle via anisotropic wet etching

Dmitriy L. Voronov, Paul Lum, Patrick Naulleau, Eric M. Gullikson, Alexei V. Fedorov, Howard A. Padmore

Appl. Phys. Lett. 109, 043112 (2016)

https://doi.org/10.1063/1.4960203

Published: July 2016

View articletitled, X-ray diffraction gratings: Precise control of ultra-low blaze angle via anisotropic wet etching

Journal Articles

Silicon nitride zoneplates and packaging for extreme ultraviolet instruments

Erik H. Anderson, Weilun Chao, Eric M. Gullikson, Senajith Rekawa, Nord Andresen, Patrick Naulleau

J. Vac. Sci. Technol. B 31, 06F606 (2013)

https://doi.org/10.1116/1.4826695

Published: October 2013

View articletitled, Silicon nitride zoneplates and packaging for extreme ultraviolet instruments

Journal Articles

Mask roughness challenges in extreme ultraviolet mask development

Patrick Naulleau, Brittany McClinton, Kenneth A. Goldberg, Iacopo Mochi, Abbas Rastegar

J. Vac. Sci. Technol. B 29, 06F501 (2011)

https://doi.org/10.1116/1.3632989

Published: October 2011

View articletitled, Mask roughness challenges in extreme ultraviolet mask development

Journal Articles

Lithographic performance evaluation of a contaminated extreme ultraviolet mask after cleaning

Simi George, Patrick Naulleau, Uzodinma Okoroanyanwu, Kornelia Dittmar, Christian Holfeld, Andrea Wüest

J. Vac. Sci. Technol. B 28, 841–848 (2010)

https://doi.org/10.1116/1.3466999

Published: July 2010

View articletitled, Lithographic performance evaluation of a contaminated extreme ultraviolet mask after cleaning

Journal Articles

Effect of carbon contamination on the printing performance of extreme ultraviolet masks

Yu-Jen Fan, Leonid Yankulin, Alin Antohe, Petros Thomas, Chimaobi Mbanaso, Rashi Garg, Yunfei Wang, Andrea Wüest, Frank Goodwin, Sungmin Huh, Patrick Naulleau, Kenneth Goldberg, Iacopo Mochi, Gregory Denbeaux

J. Vac. Sci. Technol. B 28, 321–328 (2010)

https://doi.org/10.1116/1.3333434

Published: March 2010

View articletitled, Effect of carbon contamination on the printing performance of extreme ultraviolet masks

Journal Articles

Iterative procedure for in situ extreme ultraviolet optical testing with an incoherent source

Ryan Miyakawa, Patrick Naulleau, Avideh Zakhor

J. Vac. Sci. Technol. B 27, 2927–2930 (2009)

https://doi.org/10.1116/1.3259961

Published: December 2009

View articletitled, Iterative procedure for in situ extreme ultraviolet optical testing with an incoherent source

Journal Articles

Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks

Ted Liang, Erdem Ultanir, Guojing Zhang, Seh-Jin Park, Erik Anderson, Eric Gullikson, Patrick Naulleau, Farhad Salmassi, Paul Mirkarimi, Eberhard Spiller, Sherry Baker

J. Vac. Sci. Technol. B 25, 2098–2103 (2007)

https://doi.org/10.1116/1.2779044

Published: December 2007

View articletitled, Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks

Journal Articles

Resist-based measurement of the contrast transfer function in a 0.3 numerical aperture extreme ultraviolet microfield optic

Jason P. Cain, Patrick Naulleau, Costas J. Spanos

J. Vac. Sci. Technol. B 24, 326–330 (2006)

https://doi.org/10.1116/1.2162578

Published: January 2006

View articletitled, Resist-based measurement of the contrast transfer function in a 0.3 numerical aperture extreme ultraviolet microfield optic

Journal Articles

Measuring line roughness through aerial image contrast variation using coherent extreme ultraviolet spatial filtering techniques

Michael D. Shumway, Patrick Naulleau, Kenneth A. Goldberg, Jeffrey Bokor

J. Vac. Sci. Technol. B 23, 2844–2847 (2005)

https://doi.org/10.1116/1.2134717

Published: December 2005

View articletitled, Measuring line roughness through aerial image contrast variation using coherent extreme ultraviolet spatial filtering techniques

Journal Articles

Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source

Patrick Naulleau, Jason P. Cain, Erik Anderson, Kim Dean, Paul Denham, Kenneth A. Goldberg, Brian Hoef, Keith Jackson

J. Vac. Sci. Technol. B 23, 2840–2843 (2005)

https://doi.org/10.1116/1.2127940

Published: December 2005

View articletitled, Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source

Journal Articles

Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blanks

Vincent Farys, Christelle Charpin-Nicolle, Marieke Richard, Jean-Yves Robic, Viviane Muffato, Etienne Quesnel, Sergeï Postnikov, Patrick Schiavone, Maxime Besacier, Rafik Smaali, Patrick Naulleau

J. Vac. Sci. Technol. B 23, 2860–2865 (2005)

https://doi.org/10.1116/1.2135293

Published: December 2005

View articletitled, Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blanks

Journal Articles

Probe shape measurement in an electron beam lithography system

J. Alexander Liddle, Patrick Naulleau, Gerard Schmid

J. Vac. Sci. Technol. B 22, 2897–2901 (2004)

https://doi.org/10.1116/1.1821579

Published: December 2004

View articletitled, Probe shape measurement in an electron beam lithography system

Journal Articles

At‐Wavelength Interferometry of High‐NA Diffraction‐Limited EUV Optics

Kenneth A. Goldberg, Patrick Naulleau, Senajith Rekawa, Paul Denham, J. Alexander Liddle, Erik Anderson, Keith Jackson, Jeffrey Bokor, David Attwood

AIP Conf. Proc. 705, 855–860 (2004)

https://doi.org/10.1063/1.1757930

Published: May 2004

View articletitled, At‐Wavelength Interferometry of High‐NA Diffraction‐Limited EUV Optics

Journal Articles

Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma

Patrick Naulleau, Kenneth A. Goldberg, Erik H. Anderson, Jeffrey Bokor, Bruce Harteneck, Keith Jackson, Deirdre Olynick, Farhad Salmassi, Sherry Baker, Paul Mirkarimi, Eberhard Spiller, Chris Walton, Donna O’Connell, Pei-Yang Yan, Guojing Zhang

J. Vac. Sci. Technol. B 21, 2697–2700 (2003)

https://doi.org/10.1116/1.1621669

Published: December 2003

View articletitled, Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma

Journal Articles

Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects

Patrick Naulleau, Kenneth A. Goldberg, Erik H. Anderson, Jeffrey Bokor, Eric Gullikson, Bruce Harteneck, Keith Jackson, Deirdre Olynick, Farhad Salmassi, Sherry Baker, Paul Mirkarimi, Eberhard Spiller, Chris Walton, Guojing Zhang

J. Vac. Sci. Technol. B 21, 1286–1290 (2003)

https://doi.org/10.1116/1.1580839

Published: June 2003

View articletitled, Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects

Journal Articles

Testing extreme ultraviolet optics with visible-light and extreme ultraviolet interferometry

Kenneth A. Goldberg, Patrick Naulleau, Jeffrey Bokor, Henry N. Chapman, Anton Barty

J. Vac. Sci. Technol. B 20, 2834–2839 (2002)

https://doi.org/10.1116/1.1523401

Published: December 2002

View articletitled, Testing extreme ultraviolet optics with visible-light and extreme ultraviolet interferometry

Journal Articles

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

J. Vac. Sci. Technol. B 20, 2829–2833 (2002)

https://doi.org/10.1116/1.1524976

Published: December 2002

View articletitled, Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

Journal Articles

Lithographic aerial-image contrast measurement in the extreme ultraviolet engineering test stand

Sang H. Lee, Daniel A. Tichenor, Patrick Naulleau

J. Vac. Sci. Technol. B 20, 2849–2852 (2002)

https://doi.org/10.1116/1.1526354

Published: December 2002

View articletitled, Lithographic aerial-image contrast measurement in the extreme ultraviolet engineering test stand

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Fundamental understanding of chemical processes in extreme ultraviolet resist materials

The importance of inner-shell electronic structure for enhancing the EUV absorption of photoresist materials

X-ray diffraction gratings: Precise control of ultra-low blaze angle via anisotropic wet etching

Silicon nitride zoneplates and packaging for extreme ultraviolet instruments

Mask roughness challenges in extreme ultraviolet mask development

Lithographic performance evaluation of a contaminated extreme ultraviolet mask after cleaning

Effect of carbon contamination on the printing performance of extreme ultraviolet masks

Iterative procedure for in situ extreme ultraviolet optical testing with an incoherent source

Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks

Resist-based measurement of the contrast transfer function in a 0.3 numerical aperture extreme ultraviolet microfield optic

Measuring line roughness through aerial image contrast variation using coherent extreme ultraviolet spatial filtering techniques

Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source

Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blanks

Probe shape measurement in an electron beam lithography system

At‐Wavelength Interferometry of High‐NA Diffraction‐Limited EUV Optics

Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma

Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects

Testing extreme ultraviolet optics with visible-light and extreme ultraviolet interferometry

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

Lithographic aerial-image contrast measurement in the extreme ultraviolet engineering test stand

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