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Journal Articles

Characterization of an RF-driven argon plasma at atmospheric pressure using broadband absorption and optical emission spectroscopy

G. Nayak, M. Simeni Simeni, J. Rosato, N. Sadeghi, P. J. Bruggeman

J. Appl. Phys. 128, 243302 (2020)

https://doi.org/10.1063/5.0035488

Published: December 2020

View article titled, Characterization of an RF-driven argon plasma at atmospheric pressure using broadband absorption and optical emission spectroscopy

Journal Articles

Influence of the excitation frequency on the density of helium metastable atoms in an atmospheric pressure dielectric barrier discharge

J.-S. Boisvert, N. Sadeghi, J. Margot, F. Massines

J. Appl. Phys. 121, 043302 (2017)

https://doi.org/10.1063/1.4974301

Published: January 2017

View article titled, Influence of the excitation frequency on the density of helium metastable atoms in an atmospheric pressure dielectric barrier discharge

Journal Articles

Measuring ion velocity distribution functions through high-aspect ratio holes in inductively coupled plasmas

G. Cunge, M. Darnon, J. Dubois, P. Bezard, O. Mourey, C. Petit-Etienne, L. Vallier, E. Despiau-Pujo, N. Sadeghi

Appl. Phys. Lett. 108, 093109 (2016)

https://doi.org/10.1063/1.4942892

Published: March 2016

View article titled, Measuring ion velocity distribution functions through high-aspect ratio holes in inductively coupled plasmas

Journal Articles

Ignition and extinction phenomena in helium micro hollow cathode discharges

M. K. Kulsreshath, N. Sadeghi, L. Schwaederle, T. Dufour, L. J. Overzet, P. Lefaucheux, R. Dussart

J. Appl. Phys. 114, 243303 (2013)

https://doi.org/10.1063/1.4858418

Published: December 2013

View article titled, Ignition and extinction phenomena in helium micro hollow cathode discharges

Journal Articles

Density of atoms in Ar*(3p⁵4s) states and gas temperatures in an argon surfatron plasma measured by tunable laser spectroscopy

S. Hübner, N. Sadeghi, E. A. D. Carbone, J. J. A. M. van der Mullen

J. Appl. Phys. 113, 143306 (2013)

https://doi.org/10.1063/1.4799152

Published: April 2013

View article titled, Density of atoms in Ar*(3p<sup>5</sup>4s) states and gas temperatures in an argon surfatron plasma measured by tunable laser spectroscopy

Journal Articles

On the heterogeneous character of the heartbeat instability in complex (dusty) plasmas

M. Y. Pustylnik, A. V. Ivlev, N. Sadeghi, R. Heidemann, S. Mitic, H. M. Thomas, G. E. Morfill

Phys. Plasmas 19, 103701 (2012)

https://doi.org/10.1063/1.4757213

Published: October 2012

View article titled, On the heterogeneous character of the heartbeat instability in complex (dusty) plasmas

Journal Articles

Analysis of pulsed high-density HBr and Cl₂ plasmas: Impact of the pulsing parameters on the radical densities

P. Bodart, M. Brihoum, G. Cunge, O. Joubert, N. Sadeghi

J. Appl. Phys. 110, 113302 (2011)

https://doi.org/10.1063/1.3663443

Published: December 2011

View article titled, Analysis of pulsed high-density HBr and Cl<sub>2</sub> plasmas: Impact of the pulsing parameters on the radical densities

Journal Articles

Unexpected transverse velocity component of Xe + ions near the exit plane of a Hall thruster

G. Bourgeois, S. Mazouffre, N. Sadeghi

Phys. Plasmas 17, 113502 (2010)

https://doi.org/10.1063/1.3507308

Published: November 2010

View article titled, Unexpected transverse velocity component of Xe + ions near the exit plane of a Hall thruster

Journal Articles

Gas convection caused by electron pressure drop in the afterglow of a pulsed inductively coupled plasma discharge

G. Cunge, D. Vempaire, N. Sadeghi

Appl. Phys. Lett. 96, 131501 (2010)

https://doi.org/10.1063/1.3368124

Published: March 2010

View article titled, Gas convection caused by electron pressure drop in the afterglow of a pulsed inductively coupled plasma discharge

Journal Articles

A time-resolved laser induced fluorescence study on the ion velocity distribution function in a Hall thruster after a fast current disruption

S. Mazouffre, D. Gawron, N. Sadeghi

Phys. Plasmas 16, 043504 (2009)

https://doi.org/10.1063/1.3112704

Published: April 2009

View article titled, A time-resolved laser induced fluorescence study on the ion velocity distribution function in a Hall thruster after a fast current disruption

Journal Articles

Gas temperature measurement in C F 4 , S F 6 , O 2 , Cl 2 , and HBr inductively coupled plasmas

G. Cunge, R. Ramos, D. Vempaire, M. Touzeau, M. Neijbauer, N. Sadeghi

J. Vac. Sci. Technol. A 27, 471–478 (2009)

https://doi.org/10.1116/1.3106626

Published: March 2009

View article titled, Gas temperature measurement in C F 4 , S F 6 , O 2 , Cl 2 , and HBr inductively coupled plasmas

Journal Articles

A laser spectroscopic study on Xe + ion transport phenomena in the E × B discharge of a Hall effect thruster

S. Mazouffre, D. Gawron, V. Kulaev, J. Pérez Luna, N. Sadeghi

AIP Conf. Proc. 993, 447–454 (2008)

https://doi.org/10.1063/1.2909173

Published: March 2008

View article titled, A laser spectroscopic study on Xe + ion transport phenomena in the E × B discharge of a Hall effect thruster

Journal Articles

Broadband and time-resolved absorption spectroscopy with light emitting diodes: Application to etching plasma monitoring

G. Cunge, D. Vempaire, M. Touzeau, N. Sadeghi

Appl. Phys. Lett. 91, 231503 (2007)

https://doi.org/10.1063/1.2822448

Published: December 2007

View article titled, Broadband and time-resolved absorption spectroscopy with light emitting diodes: Application to etching plasma monitoring

Journal Articles

Influence of the reactor wall composition on radicals' densities and total pressure in Cl 2 inductively coupled plasmas: I. Without silicon etching

G. Cunge, N. Sadeghi, R. Ramos

J. Appl. Phys. 102, 093304 (2007)

https://doi.org/10.1063/1.2803880

Published: November 2007

View article titled, Influence of the reactor wall composition on radicals' densities and total pressure in Cl 2 inductively coupled plasmas: I. Without silicon etching

Journal Articles

Influence of the reactor wall composition on radicals’ densities and total pressure in Cl 2 inductively coupled plasmas: II. During silicon etching

G. Cunge, N. Sadeghi, R. Ramos

J. Appl. Phys. 102, 093305 (2007)

https://doi.org/10.1063/1.2803881

Published: November 2007

View article titled, Influence of the reactor wall composition on radicals’ densities and total pressure in Cl 2 inductively coupled plasmas: II. During silicon etching

Journal Articles

Doppler‐Free Spectroscopy Measurements of Isotope Shifts and Hyperfine Components of Near‐IR Xenon Lines

S. Mazouffre, E. Pawelec, N. Tran Bich, N. Sadeghi

AIP Conf. Proc. 812, 457–460 (2006)

https://doi.org/10.1063/1.2168884

Published: January 2006

View article titled, Doppler‐Free Spectroscopy Measurements of Isotope Shifts and Hyperfine Components of Near‐IR Xenon Lines

Journal Articles

Study of the Ar metastable atom population in a hollow cathode discharge by means of a hybrid model and spectrometric measurements

N. Baguer, A. Bogaerts, Z. Donko, R. Gijbels, N. Sadeghi

J. Appl. Phys. 97, 123305 (2005)

https://doi.org/10.1063/1.1929857

Published: June 2005

View article titled, Study of the Ar metastable atom population in a hollow cathode discharge by means of a hybrid model and spectrometric measurements

Journal Articles

Production and loss mechanisms of Si Cl X etch products during silicon etching in a high density H Br ∕ Cl 2 ∕ O 2 plasma

G. Cunge, M. Kogelschatz, N. Sadeghi

J. Appl. Phys. 96, 4578–4587 (2004)

https://doi.org/10.1063/1.1786338

Published: October 2004

View article titled, Production and loss mechanisms of Si Cl X etch products during silicon etching in a high density H Br ∕ Cl 2 ∕ O 2 plasma

Journal Articles

Enhancement of the recombination rate of Br atoms by CF 4 addition and resist etching in HBr/Cl 2 / O 2 plasmas

G. Cunge, O. Joubert, N. Sadeghi

J. Appl. Phys. 94, 6285–6290 (2003)

https://doi.org/10.1063/1.1619575

Published: November 2003

View article titled, Enhancement of the recombination rate of Br atoms by CF 4 addition and resist etching in HBr/Cl 2 / O 2 plasmas

Journal Articles

Ion flux composition in HBr / Cl 2 / O 2 and HBr / Cl 2 / O 2 / CF 4 chemistries during silicon etching in industrial high-density plasmas

G. Cunge, R. L. Inglebert, O. Joubert, L. Vallier, N. Sadeghi

J. Vac. Sci. Technol. B 20, 2137–2148 (2002)

https://doi.org/10.1116/1.1511219

Published: October 2002

View article titled, Ion flux composition in HBr / Cl 2 / O 2 and HBr / Cl 2 / O 2 / CF 4 chemistries during silicon etching in industrial high-density plasmas

NARROW

Topics

Characterization of an RF-driven argon plasma at atmospheric pressure using broadband absorption and optical emission spectroscopy

Influence of the excitation frequency on the density of helium metastable atoms in an atmospheric pressure dielectric barrier discharge

Measuring ion velocity distribution functions through high-aspect ratio holes in inductively coupled plasmas

Ignition and extinction phenomena in helium micro hollow cathode discharges

Density of atoms in Ar*(3p⁵4s) states and gas temperatures in an argon surfatron plasma measured by tunable laser spectroscopy

On the heterogeneous character of the heartbeat instability in complex (dusty) plasmas

Analysis of pulsed high-density HBr and Cl₂ plasmas: Impact of the pulsing parameters on the radical densities

Unexpected transverse velocity component of Xe + ions near the exit plane of a Hall thruster

Gas convection caused by electron pressure drop in the afterglow of a pulsed inductively coupled plasma discharge

A time-resolved laser induced fluorescence study on the ion velocity distribution function in a Hall thruster after a fast current disruption

Gas temperature measurement in C F 4 , S F 6 , O 2 , Cl 2 , and HBr inductively coupled plasmas

A laser spectroscopic study on Xe + ion transport phenomena in the E × B discharge of a Hall effect thruster

Broadband and time-resolved absorption spectroscopy with light emitting diodes: Application to etching plasma monitoring

Influence of the reactor wall composition on radicals' densities and total pressure in Cl 2 inductively coupled plasmas: I. Without silicon etching

Influence of the reactor wall composition on radicals’ densities and total pressure in Cl 2 inductively coupled plasmas: II. During silicon etching

Doppler‐Free Spectroscopy Measurements of Isotope Shifts and Hyperfine Components of Near‐IR Xenon Lines

Study of the Ar metastable atom population in a hollow cathode discharge by means of a hybrid model and spectrometric measurements

Production and loss mechanisms of Si Cl X etch products during silicon etching in a high density H Br ∕ Cl 2 ∕ O 2 plasma

Enhancement of the recombination rate of Br atoms by CF 4 addition and resist etching in HBr/Cl 2 / O 2 plasmas

Ion flux composition in HBr / Cl 2 / O 2 and HBr / Cl 2 / O 2 / CF 4 chemistries during silicon etching in industrial high-density plasmas

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