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Journal Articles

In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes

Editor’s Pick
Heta-Elisa Nieminen, Mykhailo Chundak, Mikko J. Heikkilä, Paloma Ruiz Kärkkäinen, Marko Vehkamäki, Matti Putkonen, Mikko Ritala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 022401 (2023)
https://doi.org/10.1116/6.0002312
Published: February 2023
View article titled, <em>In vacuo</em> cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes
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Journal Articles

Atomic layer deposition of GdF3 thin films

Elisa Atosuo, Kenichiro Mizohata, Miika Mattinen, Miia Mäntymäki, Marko Vehkamäki, Markku Leskelä, Mikko Ritala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 022402 (2022)
https://doi.org/10.1116/6.0001629
Published: January 2022
View article titled, Atomic layer deposition of GdF<sub>3</sub> thin films
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Journal Articles

Reaction mechanism studies on atomic layer deposition process of AlF3

Heta-Elisa Nieminen, Mikko Ritala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 022401 (2022)
https://doi.org/10.1116/6.0001624
Published: January 2022
View article titled, Reaction mechanism studies on atomic layer deposition process of AlF<sub>3</sub>
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Journal Articles

Synchronizing gas injections and time-resolved data acquisition for perturbation-enhanced APXPS experiments

Evgeniy A. Redekop, Niclas Johansson, Esko Kokkonen, Samuli Urpelainen, Felipe Lopes da Silva, Mikko Kaipio, Heta-Elisa Nieminen, Foqia Rehman, Ville Miikkulainen, Mikko Ritala, Unni Olsbye
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 92, 044101 (2021)
https://doi.org/10.1063/5.0039957
Published: April 2021
View article titled, Synchronizing gas injections and time-resolved data acquisition for perturbation-enhanced APXPS experiments
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Includes: Supplementary data
Journal Articles

Atomic layer deposition of TbF3 thin films

Elisa Atosuo, Juha Ojala, Mikko J. Heikkilä, Miika Mattinen, Kenichiro Mizohata, Jyrki Räisänen, Markku Leskelä, Mikko Ritala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 022404 (2021)
https://doi.org/10.1116/6.0000790
Published: February 2021
View article titled, Atomic layer deposition of TbF<sub>3</sub> thin films
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Journal Articles

Magnetic properties and resistive switching in mixture films and nanolaminates consisting of iron and silicon oxides grown by atomic layer deposition

Kaupo Kukli, Marianna Kemell, Helena Castán, Salvador Dueñas, Joosep Link, Raivo Stern, Mikko J. Heikkilä, Taivo Jõgiaas, Jekaterina Kozlova, Mihkel Rähn, Kenichiro Mizohata, Mikko Ritala, Markku Leskelä
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 042405 (2020)
https://doi.org/10.1116/6.0000212
Published: June 2020
View article titled, Magnetic properties and resistive switching in mixture films and nanolaminates consisting of iron and silicon oxides grown by atomic layer deposition
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Journal Articles

Erratum: “History of atomic layer deposition and its relationship with the American Vacuum Society” [J. Vac. Sci. Technol. A 31, 050818 (2013)]

Gregory N. Parsons, Jeffrey W. Elam, Steven M. George, Suvi Haukka, Hyeongtag Jeon, W. M. M. (Erwin) Kessels, Markku Leskelä, Paul Poodt, Mikko Ritala, Steven M. Rossnagel
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 037001 (2020)
https://doi.org/10.1116/6.0000143
Published: March 2020
View article titled, Erratum: “History of atomic layer deposition and its relationship with the American Vacuum Society” [J. Vac. Sci. Technol. A 31, 050818 (2013)]
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Journal Articles

Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursors

Editor’s Pick
Ville Miikkulainen, Katja Väyrynen, Kenichiro Mizohata, Jyrki Räisänen, Marko Vehkamäki, Mikko Ritala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 060911 (2019)
https://doi.org/10.1116/1.5124100
Published: November 2019
View article titled, Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursors
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Journal Articles

Controlling the refractive index and third-order nonlinearity of polyimide/Ta2O5 nanolaminates for optical applications

Elina Färm, Soroush Mehravar, Khanh Kieu, Nasser Peyghambarian, Mikko Ritala, Markku Leskelä, Marianna Kemell
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 060908 (2019)
https://doi.org/10.1116/1.5121589
Published: November 2019
View article titled, Controlling the refractive index and third-order nonlinearity of polyimide/Ta<sub>2</sub>O<sub>5</sub> nanolaminates for optical applications
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Journal Articles

Review Article: Atomic layer deposition of optoelectronic materials

Featured
Markku Leskelä, Miika Mattinen, Mikko Ritala
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 030801 (2019)
https://doi.org/10.1116/1.5083692
Published: April 2019
View article titled, Review Article: Atomic layer deposition of optoelectronic materials
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Journal Articles

Studies on solid state reactions of atomic layer deposited thin films of lithium carbonate with hafnia and zirconia

Miia Mäntymäki, Elisa Atosuo, Mikko J. Heikkilä, Marko Vehkamäki, Miika Mattinen, Kenichiro Mizohata, Jyrki Räisänen, Mikko Ritala, Markku Leskelä
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020929 (2019)
https://doi.org/10.1116/1.5081494
Published: February 2019
View article titled, Studies on solid state reactions of atomic layer deposited thin films of lithium carbonate with hafnia and zirconia
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Journal Articles

Crystalline tungsten sulfide thin films by atomic layer deposition and mild annealing

Editor’s Pick
Miika Mattinen, Timo Hatanpää, Peter J. King, Kristoffer Meinander, Kenichiro Mizohata, Pasi Jalkanen, Jyrki Räisänen, Mikko Ritala, Markku Leskelä
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020921 (2019)
https://doi.org/10.1116/1.5074153
Published: February 2019
View article titled, Crystalline tungsten sulfide thin films by atomic layer deposition and mild annealing
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Includes: Supplementary data
Journal Articles

Toward epitaxial ternary oxide multilayer device stacks by atomic layer deposition

Editor’s Pick
Peter J. King, Marko Vehkamäki, Miika Mattinen, Mikko J. Heikkilä, Kenichiro Mizohata, Wontae Noh, Markku Leskelä, Mikko Ritala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020602 (2019)
https://doi.org/10.1116/1.5081997
Published: January 2019
View article titled, Toward epitaxial ternary oxide multilayer device stacks by atomic layer deposition
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Journal Articles

Comparative study on the use of novel heteroleptic cyclopentadienyl-based zirconium precursors with H2O and O3 for atomic layer deposition of ZrO2

Editor’s Pick
Sanni Seppälä, Marko Vehkamäki, Kenichiro Mizohata, Wontae Noh, Jyrki Räisänen, Mikko Ritala, Markku Leskelä
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020912 (2019)
https://doi.org/10.1116/1.5079539
Published: January 2019
View article titled, Comparative study on the use of novel heteroleptic cyclopentadienyl-based zirconium precursors with H<sub>2</sub>O and O<sub>3</sub> for atomic layer deposition of ZrO<sub>2</sub>
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Journal Articles

Atomic layer deposition of cobalt(II) oxide thin films from Co(BTSA)2(THF) and H2O

Editor’s Pick
Tomi Iivonen, Mikko Kaipio, Timo Hatanpää, Kenichiro Mizohata, Kristoffer Meinander, Jyrki Räisänen, Jiyeon Kim, Mikko Ritala, Markku Leskelä
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 010908 (2019)
https://doi.org/10.1116/1.5066638
Published: January 2019
View article titled, Atomic layer deposition of cobalt(II) oxide thin films from Co(BTSA)<sub>2</sub>(THF) and H<sub>2</sub>O
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Journal Articles

Patterned films by atomic layer deposition using Parafilm as a mask

Chao Zhang, Jesse Kalliomäki, Markku Leskelä, Mikko Ritala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01B102 (2018)
https://doi.org/10.1116/1.5001033
Published: August 2017
View article titled, Patterned films by atomic layer deposition using Parafilm as a mask
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Journal Articles

Atomic layer deposition of tin oxide thin films from bis[bis(trimethylsilyl)amino]tin(II) with ozone and water

Jere Tupala, Marianna Kemell, Miika Mattinen, Kristoffer Meinander, Sanni Seppälä, Timo Hatanpää, Jyrki Räisänen, Mikko Ritala, Markku Leskelä
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 041506 (2017)
https://doi.org/10.1116/1.4984279
Published: May 2017
View article titled, Atomic layer deposition of tin oxide thin films from bis[bis(trimethylsilyl)amino]tin(II) with ozone and water
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Journal Articles

Atomic layer deposition and properties of mixed Ta2O5 and ZrO2 films

Editor’s Pick
Kaupo Kukli, Marianna Kemell, Marko Vehkamäki, Mikko J. Heikkilä, Kenichiro Mizohata, Kristjan Kalam, Mikko Ritala, Markku Leskelä, Ivan Kundrata, Karol Fröhlich
Journal: AIP Advances
AIP Advances 7, 025001 (2017)
https://doi.org/10.1063/1.4975928
Published: February 2017
View article titled, Atomic layer deposition and properties of mixed Ta<sub>2</sub>O<sub>5</sub> and ZrO<sub>2</sub> films
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Journal Articles

As2S3 thin films deposited by atomic layer deposition

Elina Färm, Mikko J. Heikkilä, Marko Vehkamäki, Kenichiro Mizohata, Mikko Ritala, Markku Leskelä, Marianna Kemell
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B114 (2017)
https://doi.org/10.1116/1.4968202
Published: November 2016
View article titled, As<sub>2</sub>S<sub>3</sub> thin films deposited by atomic layer deposition
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Journal Articles

Potential gold(I) precursors evaluated for atomic layer deposition

Maarit Mäkelä, Timo Hatanpää, Mikko Ritala, Markku Leskelä, Kenichiro Mizohata, Kristoffer Meinander, Jyrki Räisänen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B112 (2017)
https://doi.org/10.1116/1.4968193
Published: November 2016
View article titled, Potential gold(I) precursors evaluated for atomic layer deposition
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