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Manuel Gschrey
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Journal Articles

Generation of maximally entangled states and coherent control in quantum dot microlenses

Editor’s Pick
Samir Bounouar, Christoph de la Haye, Max Strauß, Peter Schnauber, Alexander Thoma, Manuel Gschrey, Jan-Hindrik Schulze, André Strittmatter, Sven Rodt, Stephan Reitzenstein
Journal: Applied Physics Letters
Appl. Phys. Lett. 112, 153107 (2018)
https://doi.org/10.1063/1.5020242
Published: April 2018
View article titled, Generation of maximally entangled states and coherent control in quantum dot microlenses
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Includes: Supplementary data
Journal Articles

Accessing the dark exciton spin in deterministic quantum-dot microlenses

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Tobias Heindel, Alexander Thoma, Ido Schwartz, Emma R. Schmidgall, Liron Gantz, Dan Cogan, Max Strauß, Peter Schnauber, Manuel Gschrey, Jan-Hindrik Schulze, Andre Strittmatter, Sven Rodt, David Gershoni, Stephan Reitzenstein
Journal: APL Photonics
APL Photonics 2, 121303 (2017)
https://doi.org/10.1063/1.5004147
Published: December 2017
View article titled, Accessing the dark exciton spin in deterministic quantum-dot microlenses
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Journal Articles

Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing

Arsenty Kaganskiy, Manuel Gschrey, Alexander Schlehahn, Ronny Schmidt, Jan-Hindrik Schulze, Tobias Heindel, André Strittmatter, Sven Rodt, Stephan Reitzenstein
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 86, 073903 (2015)
https://doi.org/10.1063/1.4926995
Published: July 2015
View article titled, Advanced <em>in-situ</em> electron-beam lithography for deterministic nanophotonic device processing
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Journal Articles

Resolution and alignment accuracy of low-temperature in situ electron beam lithography for nanophotonic device fabrication

Manuel Gschrey, Ronny Schmidt, Jan-Hindrik Schulze, André Strittmatter, Sven Rodt, Stephan Reitzenstein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 021603 (2015)
https://doi.org/10.1116/1.4914914
Published: March 2015
View article titled, Resolution and alignment accuracy of low-temperature <em>in situ</em> electron beam lithography for nanophotonic device fabrication
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Journal Articles

Study of high-resolution electron-beam resists for applications in low-temperature lithography

Manuel Gschrey, Ronny Schmidt, Arsenty Kaganskiy, Sven Rodt, Stephan Reitzenstein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 061601 (2014)
https://doi.org/10.1116/1.4896671
Published: September 2014
View article titled, Study of high-resolution electron-beam resists for applications in low-temperature lithography
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