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Journal Articles

Future of plasma etching for microelectronics: Challenges and opportunities

Featured
Gottlieb S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce, Jane P. Chang, Jessica C. DeMott, Vincent M. Donnelly, Rémi Dussart, Andreas Fischer, Richard A. Gottscho, Satoshi Hamaguchi, Masanobu Honda, Masaru Hori, Kenji Ishikawa, Steven G. Jaloviar, Keren J. Kanarik, Kazuhiro Karahashi, Akiteru Ko, Hiten Kothari, Nobuyuki Kuboi, Mark J. Kushner, Thorsten Lill, Pingshan Luan, Ali Mesbah, Eric Miller, Shoubhanik Nath, Yoshinobu Ohya, Mitsuhiro Omura, Chanhoon Park, John Poulose, Shahid Rauf, Makoto Sekine, Taylor G. Smith, Nathan Stafford, Theo Standaert, Peter L. G. Ventzek
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 041501 (2024)
https://doi.org/10.1116/6.0003579
Published: June 2024
View article titled, Future of plasma etching for microelectronics: Challenges and opportunities
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Journal Articles

Erratum: “Universal scaling relationship for atomic layer etching” [J. Vac. Sci. Technol. A 39, 010401 (2021)]

Keren J. Kanarik, Samantha Tan, Wenbing Yang, Ivan L. Berry, Yang Pan, Richard A. Gottscho
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 037001 (2021)
https://doi.org/10.1116/6.0001000
Published: March 2021
View article titled, Erratum: “Universal scaling relationship for atomic layer etching” [J. Vac. Sci. Technol. A 39, 010401 (2021)]
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Journal Articles

Universal scaling relationship for atomic layer etching

Keren J. Kanarik, Samantha Tan, Wenbing Yang, Ivan L. Berry, Yang Pan, Richard A. Gottscho
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 010401 (2021)
https://doi.org/10.1116/6.0000762
Published: December 2020
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Journal Articles

Inside the mysterious world of plasma: A process engineer’s perspective

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Keren J. Kanarik
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 031004 (2020)
https://doi.org/10.1116/1.5141863
Published: March 2020
View article titled, Inside the mysterious world of plasma: A process engineer’s perspective
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Journal Articles

Applying sputtering theory to directional atomic layer etching

Ivan L. Berry, Keren J. Kanarik, Thorsten Lill, Samantha Tan, Vahid Vahedi, Richard A. Gottscho
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01B105 (2018)
https://doi.org/10.1116/1.5003393
Published: December 2017
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Journal Articles

Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactions

Editor’s Pick
Chad M. Huard, Yiting Zhang, Saravanapriyan Sriraman, Alex Paterson, Keren J. Kanarik, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 031306 (2017)
https://doi.org/10.1116/1.4979661
Published: April 2017
View article titled, Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactions
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Journal Articles

Predicting synergy in atomic layer etching

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Keren J. Kanarik, Samantha Tan, Wenbing Yang, Taeseung Kim, Thorsten Lill, Alexander Kabansky, Eric A. Hudson, Tomihito Ohba, Kazuo Nojiri, Jengyi Yu, Rich Wise, Ivan L. Berry, Yang Pan, Jeffrey Marks, Richard A. Gottscho
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C302 (2017)
https://doi.org/10.1116/1.4979019
Published: March 2017
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Journal Articles

Overview of atomic layer etching in the semiconductor industry

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Keren J. Kanarik, Thorsten Lill, Eric A. Hudson, Saravanapriyan Sriraman, Samantha Tan, Jeffrey Marks, Vahid Vahedi, Richard A. Gottscho
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 020802 (2015)
https://doi.org/10.1116/1.4913379
Published: March 2015
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