1-6 of 6
Kenneth E. Gonsalves
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Novel process integration flow of germanium-on-silicon FinFETs for low-power technologies

Sumit Choudhary, Midathala Yogesh, Daniel Schwarz, Hannes S. Funk, Subrata Ghosh, Satinder K. Sharma, Jörg Schulze, Kenneth E. Gonsalves
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 052203 (2023)
https://doi.org/10.1116/6.0002767
Published: August 2023
View article titled, Novel process integration flow of germanium-on-silicon FinFETs for low-power technologies
Open the PDF for Novel process integration flow of germanium-on-silicon FinFETs for low-power technologies in another window
Includes: Supplementary data
Journal Articles

Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness

Pulikanti Guruprasad Reddy, Neha Thakur, Chien-Lin Lee, Sheng-Wei Chien, Chullikkattil P. Pradeep, Subrata Ghosh, Kuen-Yu Tsai, Kenneth E. Gonsalves
Journal: AIP Advances
AIP Advances 7, 085314 (2017)
https://doi.org/10.1063/1.4989981
Published: August 2017
View article titled, Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness
Open the PDF for Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness in another window
Journal Articles

Effects of photoacid generator incorporation into the polymer main chain on 193 nm chemically amplified resist behavior and lithographic performance

Cheng-Tsung Lee, Clifford L. Henderson, Mingxing Wang, Kenneth E. Gonsalves, Wang Yueh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2136–2139 (2007)
https://doi.org/10.1116/1.2801868
Published: December 2007
View article titled, Effects of photoacid generator incorporation into the polymer main chain on 193 nm chemically amplified resist behavior and lithographic performance
Open the PDF for Effects of photoacid generator incorporation into the polymer main chain on 193 nm chemically amplified resist behavior and lithographic performance in another window
Journal Articles

Incorporation of polyhedral oligosilsesquioxane in chemically amplified resists to improve their reactive ion etching resistance

Hengpeng Wu, Yongqi Hu, Kenneth E. Gonsalves, Miguel Jose Yacaman
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 19, 851–855 (2001)
https://doi.org/10.1116/1.1368672
Published: May 2001
View article titled, Incorporation of polyhedral oligosilsesquioxane in chemically amplified resists to improve their reactive ion etching resistance
Open the PDF for Incorporation of polyhedral oligosilsesquioxane in chemically amplified resists to improve their reactive ion etching resistance in another window
Journal Articles

Combinatorial approach for the synthesis of terpolymers and their novel application as very-high-contrast resists for x-ray nanolithography

Kenneth E. Gonsalves, Jianzhao Wang, Hengpeng Wu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 18, 325–327 (2000)
https://doi.org/10.1116/1.591193
Published: January 2000
View article titled, Combinatorial approach for the synthesis of terpolymers and their novel application as very-high-contrast resists for x-ray nanolithography
Open the PDF for Combinatorial approach for the synthesis of terpolymers and their novel application as very-high-contrast resists for x-ray nanolithography in another window
Journal Articles

Optical and microstructural characterization of chemically synthesized gallium nitride nanopowders

Kenneth E. Gonsalves, Sri Prakash Rangarajan, Greg Carlson, Jayant Kumar, Ke Yang, Mohamed Benaissa, M. José-Yacamán
Journal: Applied Physics Letters
Appl. Phys. Lett. 71, 2175–2177 (1997)
https://doi.org/10.1063/1.119565
Published: October 1997
View article titled, Optical and microstructural characterization of chemically synthesized gallium nitride nanopowders
Open the PDF for Optical and microstructural characterization of chemically synthesized gallium nitride nanopowders in another window