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Journal Articles

Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma

Ali Mahmoodinezhad, Carlos Morales, Franziska Naumann, Paul Plate, Robert Meyer, Christoph Janowitz, Karsten Henkel, Małgorzata Kot, Marvin Hartwig Zoellner, Christian Wenger, Jan Ingo Flege
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 062406 (2021)
https://doi.org/10.1116/6.0001375
Published: October 2021
View article titled, Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma
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Journal Articles

Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition

Editor’s Pick
Ali Mahmoodinezhad, Christoph Janowitz, Franziska Naumann, Paul Plate, Hassan Gargouri, Karsten Henkel, Dieter Schmeißer, Jan Ingo Flege
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022404 (2020)
https://doi.org/10.1116/1.5134800
Published: January 2020
View article titled, Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
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Includes: Supplementary data
Journal Articles

In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition

Franziska Naumann, Johanna Reck, Hassan Gargouri, Bernd Gruska, Adrian Blümich, Ali Mahmoodinezhad, Christoph Janowitz, Karsten Henkel, Jan Ingo Flege
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 014014 (2020)
https://doi.org/10.1116/1.5122797
Published: January 2020
View article titled, <em>In situ</em> real-time and <em>ex situ</em> spectroscopic analysis of Al<sub>2</sub>O<sub>3</sub> films prepared by plasma enhanced atomic layer deposition
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Journal Articles

Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources

Małgorzata Kot, Karsten Henkel, Franziska Naumann, Hassan Gargouri, Lidia Lupina, Viola Wilker, Peter Kus, Emilia Poz´arowska, Samiran Garain, Zied Rouissi, Dieter Schmeißer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020913 (2019)
https://doi.org/10.1116/1.5079628
Published: January 2019
View article titled, Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
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Journal Articles

Intrinsic electronic defects and multiple-atom processes in the oxidic semiconductor Ga2O3

Editor’s Pick
Dieter Schmeißer, Karsten Henkel
Journal: Journal of Applied Physics
J. Appl. Phys. 123, 161596 (2018)
https://doi.org/10.1063/1.5010740
Published: February 2018
View article titled, Intrinsic electronic defects and multiple-atom processes in the oxidic semiconductor Ga<sub>2</sub>O<sub>3</sub>
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Journal Articles

Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study

Małgorzata Kot, Justyna Łobaza, Franziska Naumann, Hassan Gargouri, Karsten Henkel, Dieter Schmeißer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A114 (2018)
https://doi.org/10.1116/1.5003356
Published: December 2017
View article titled, Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
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Journal Articles

In-gap states in titanium dioxide and oxynitride atomic layer deposited films

Karsten Henkel, Chittaranjan Das, Małgorzata Kot, Dieter Schmeißer, Franziska Naumann, Irina Kärkkänen, Hassan Gargouri
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B135 (2017)
https://doi.org/10.1116/1.4972247
Published: December 2016
View article titled, In-gap states in titanium dioxide and oxynitride atomic layer deposited films
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Journal Articles

Localized defect states and charge trapping in atomic layer deposited-Al2O3 films

Karsten Henkel, Malgorzata Kot, Dieter Schmeißer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B125 (2017)
https://doi.org/10.1116/1.4971991
Published: December 2016
View article titled, Localized defect states and charge trapping in atomic layer deposited-Al<sub>2</sub>O<sub>3</sub> films
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Journal Articles

Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study

Małgorzata Sowińska, Karsten Henkel, Dieter Schmeißer, Irina Kärkkänen, Jessica Schneidewind, Franziska Naumann, Bernd Gruska, Hassan Gargouri
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 01A127 (2016)
https://doi.org/10.1116/1.4936227
Published: November 2015
View article titled, Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
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Journal Articles

Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties

Chittaranjan Das, Karsten Henkel, Massimo Tallarida, Dieter Schmeißer, Hassan Gargouri, Irina Kärkkänen, Jessica Schneidewind, Bernd Gruska, Michael Arens
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 01A144 (2015)
https://doi.org/10.1116/1.4903938
Published: December 2014
View article titled, Thermal and plasma enhanced atomic layer deposition of TiO<sub>2</sub>: Comparison of spectroscopic and electric properties
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Journal Articles

Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25 °C≤ T ≤ 200 °C

Karsten Henkel, Hassan Gargouri, Bernd Gruska, Michael Arens, Massimo Tallarida, Dieter Schmeißer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 01A107 (2014)
https://doi.org/10.1116/1.4831897
Published: November 2013
View article titled, Capacitance and conductance versus voltage characterization of Al<sub>2</sub>O<sub>3</sub> layers prepared by plasma enhanced atomic layer deposition at 25 °C≤ T ≤ 200 °C
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Journal Articles

Ferroelectric properties of spin-coated ultrathin (down to 10 nm) copolymer films

Klaus Müller, Dipankar Mandal, Karsten Henkel, Ioanna Paloumpa, Dieter Schmeisser
Journal: Applied Physics Letters
Appl. Phys. Lett. 93, 112901 (2008)
https://doi.org/10.1063/1.2975159
Published: September 2008
View article titled, Ferroelectric properties of spin-coated ultrathin (down to 10 nm) copolymer films
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Journal Articles

A polymer high- k dielectric insulator for organic field-effect transistors

Klaus Müller, Ioanna Paloumpa, Karsten Henkel, Dieter Schmeisser
Journal: Journal of Applied Physics
J. Appl. Phys. 98, 056104 (2005)
https://doi.org/10.1063/1.2032611
Published: September 2005
View article titled, A polymer high- k dielectric insulator for organic field-effect transistors
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