Page 1 | Search Results | AIP Publishing

1-20 of 79

Sort by

Sort Order Select

Journal Articles

Direct observation of preferential heating near grain boundaries in patterned silicide films

M. Cannaerts, A. Volodin, C. Van Haesendonck, O. Chamirian, K. Maex, D. Smeets, A. Vantomme

J. Appl. Phys. 108, 063539 (2010)

https://doi.org/10.1063/1.3475506

Published: September 2010

View article titled, Direct observation of preferential heating near grain boundaries in patterned silicide films

Journal Articles

Study of metal-related deep-level defects in germanide Schottky barriers on n -type germanium

E. Simoen, K. Opsomer, C. Claeys, K. Maex, C. Detavernier, R. L. Van Meirhaeghe, P. Clauws

J. Appl. Phys. 104, 023705 (2008)

https://doi.org/10.1063/1.2956708

Published: July 2008

View article titled, Study of metal-related deep-level defects in germanide Schottky barriers on n -type germanium

Journal Articles

Analysis of the size effect in electroplated fine copper wires and a realistic assessment to model copper resistivity

W. Zhang, S. H. Brongersma, Z. Li, D. Li, O. Richard, K. Maex

J. Appl. Phys. 101, 063703 (2007)

https://doi.org/10.1063/1.2711385

Published: March 2007

View article titled, Analysis of the size effect in electroplated fine copper wires and a realistic assessment to model copper resistivity

Journal Articles

Impact of Ni-silicide grain orientation on the strain and stress fields induced in patterned silicon

C. Torregiani, K. Maex, A. Benedetti, H. Bender, P. Van Houtte, B. J. Pawlak, J. A. Kittl

Appl. Phys. Lett. 90, 054101 (2007)

https://doi.org/10.1063/1.2437064

Published: January 2007

View article titled, Impact of Ni-silicide grain orientation on the strain and stress fields induced in patterned silicon

Journal Articles

Influence of Ge substrate crystallinity on Co germanide formation in solid-state reactions

K. Opsomer, D. Deduytsche, C. Detavernier, R. L. Van Meirhaeghe, A. Lauwers, K. Maex, C. Lavoie

Appl. Phys. Lett. 90, 031906 (2007)

https://doi.org/10.1063/1.2431781

Published: January 2007

View article titled, Influence of Ge substrate crystallinity on Co germanide formation in solid-state reactions

Journal Articles

Using scaling laws to understand the growth mechanism of atomic layer deposited W N x C y films on methyl-terminated surfaces

A. Martin Hoyas, J. Schuhmacher, C. M. Whelan, T. Fernandez Landaluce, D. Vanhaeren, K. Maex, J. P. Celis

J. Appl. Phys. 100, 114903 (2006)

https://doi.org/10.1063/1.2363241

Published: December 2006

View article titled, Using scaling laws to understand the growth mechanism of atomic layer deposited W N x C y films on methyl-terminated surfaces

Journal Articles

Internal photoemission of electrons at interfaces of metals with low- κ insulators

S. Shamuilia, V. V. Afanas’ev, P. Somers, A. Stesmans, Y.-L. Li, Zs. Tőkei, G. Groeseneken, K. Maex

Appl. Phys. Lett. 89, 202909 (2006)

https://doi.org/10.1063/1.2360893

Published: November 2006

View article titled, Internal photoemission of electrons at interfaces of metals with low- κ insulators

Journal Articles

Deep level transient spectroscopy study of Pd and Pt sputtering damage in n -type germanium

E. Simoen, K. Opsomer, C. Claeys, K. Maex, C. Detavernier, R. L. Van Meirhaeghe, P. Clauws

Appl. Phys. Lett. 89, 202114 (2006)

https://doi.org/10.1063/1.2388869

Published: November 2006

View article titled, Deep level transient spectroscopy study of Pd and Pt sputtering damage in n -type germanium

Journal Articles

Deep level transient spectroscopy study of nickel-germanide Schottky barriers on n -type germanium

E. Simoen, K. Opsomer, C. Claeys, K. Maex, C. Detavernier, R. L. Van Meirhaeghe, S. Forment, P. Clauws

Appl. Phys. Lett. 88, 183506 (2006)

https://doi.org/10.1063/1.2199615

Published: May 2006

View article titled, Deep level transient spectroscopy study of nickel-germanide Schottky barriers on n -type germanium

Journal Articles

The impact of the density and type of reactive sites on the characteristics of the atomic layer deposited W N x C y films

A. Martin Hoyas, Y. Travaly, J. Schuhmacher, T. Sajavaara, C. M. Whelan, B. Eyckens, O. Richard, S. Giangrandi, B. Brijs, W. Vandervorst, K. Maex, J. P. Celis, A. M. Jonas, A. Vantomme

J. Appl. Phys. 99, 063515 (2006)

https://doi.org/10.1063/1.2182074

Published: March 2006

View article titled, The impact of the density and type of reactive sites on the characteristics of the atomic layer deposited W N x C y films

Journal Articles

Short-ranged structural rearrangement and enhancement of mechanical properties of organosilicate glasses induced by ultraviolet radiation

F. Iacopi, Y. Travaly, B. Eyckens, C. Waldfried, T. Abell, E. P. Guyer, D. M. Gage, R. H. Dauskardt, T. Sajavaara, K. Houthoofd, P. Grobet, P. Jacobs, K. Maex

J. Appl. Phys. 99, 053511 (2006)

https://doi.org/10.1063/1.2178393

Published: March 2006

View article titled, Short-ranged structural rearrangement and enhancement of mechanical properties of organosilicate glasses induced by ultraviolet radiation

Journal Articles

Application of flash-assist rapid thermal processing subsequent to low-temperature furnace anneals

R. A. Camillo-Castillo, M. E. Law, K. S. Jones, R. Lindsay, K. Maex, B. J. Pawlak, S. McCoy

J. Vac. Sci. Technol. B 24, 450–455 (2006)

https://doi.org/10.1116/1.2140003

Published: January 2006

View article titled, Application of flash-assist rapid thermal processing subsequent to low-temperature furnace anneals

Journal Articles

Mechanisms of arsenic segregation to the Ni 2 Si ∕ SiO 2 interface during Ni 2 Si formation

M. A. Pawlak, T. Janssens, A. Lauwers, A. Vantomme, W. Vandervorst, K. Maex, J. A. Kittl

Appl. Phys. Lett. 87, 181910 (2005)

https://doi.org/10.1063/1.2125124

Published: October 2005

View article titled, Mechanisms of arsenic segregation to the Ni 2 Si ∕ SiO 2 interface during Ni 2 Si formation

Journal Articles

A theoretical and experimental study of atomic-layer-deposited films onto porous dielectric substrates

Y. TravaIy, J. Schuhmacher, M. R. Baklanov, S. Giangrandi, O. Richard, B. Brijs, M. Van Hove, K. Maex, T. Abell, K. R. F. Somers, M. F. A. Hendrickx, L. G. Vanquickenborne, A. Ceulemans, A. M. Jonas

J. Appl. Phys. 98, 083515 (2005)

https://doi.org/10.1063/1.2108151

Published: October 2005

View article titled, A theoretical and experimental study of atomic-layer-deposited films onto porous dielectric substrates

Journal Articles

Effect of plasma treatments on a low- k dielectric polymer surface

A. Martin Hoyas, J. Schuhmacher, C. M. Whelan, M. R. Baklanov, L. Carbonell, J. P. Celis, K. Maex

J. Vac. Sci. Technol. B 23, 1551–1557 (2005)

https://doi.org/10.1116/1.1943441

Published: July 2005

View article titled, Effect of plasma treatments on a low- k dielectric polymer surface

Journal Articles

Influence of the anneal conditions on arsenic activation during solid-phase epitaxial regrowth

B. J. Pawlak, R. Duffy, T. Janssens, W. Vandervorst, K. Maex, A. J. Smith, N. E. B. Cowern, T. Dao, Y. Tamminga

Appl. Phys. Lett. 87, 031915 (2005)

https://doi.org/10.1063/1.1997276

Published: July 2005

View article titled, Influence of the anneal conditions on arsenic activation during solid-phase epitaxial regrowth

Journal Articles

Interface characterization of nanoscale laminate structures on dense dielectric substrates by x-ray reflectivity

Y. Travaly, J. Schuhmacher, A. M. Hoyas, M. Van Hove, K. Maex, T. Abell, V. Sutcliffe, A. M. Jonas

J. Appl. Phys. 97, 084316 (2005)

https://doi.org/10.1063/1.1874301

Published: April 2005

View article titled, Interface characterization of nanoscale laminate structures on dense dielectric substrates by x-ray reflectivity

Journal Articles

The relation between phase transformation and onset of thermal degradation in nanoscale Co Si 2 -polycrystalline silicon structures

M. J. H. van Dal, D. Jawarani, J. G. M. van Berkum, M. Kaiser, J. A. Kittl, C. Vrancken, M. de Potter, A. Lauwers, K. Maex

J. Appl. Phys. 96, 7568–7573 (2004)

https://doi.org/10.1063/1.1815384

Published: December 2004

View article titled, The relation between phase transformation and onset of thermal degradation in nanoscale Co Si 2 -polycrystalline silicon structures

Journal Articles

Microstructure and resistivity characterization of CuAu I superlattice formed in Cu ∕ Au thin films

W. Zhang, S. H. Brongersma, O. Richard, B. Brijs, R. Palmans, L. Froyen, K. Maex

J. Vac. Sci. Technol. B 22, 2715–2718 (2004)

https://doi.org/10.1116/1.1819899

Published: November 2004

View article titled, Microstructure and resistivity characterization of CuAu I superlattice formed in Cu ∕ Au thin films

Journal Articles

Polymer dielectric treatment using ultraviolet-ozone: A photoelectron spectroscopy and ellipsometric porosimetry study

Quoc Toan Le, C. M. Whelan, H. Struyf, S. Vanhaelemeersch, A. Azioune, P. Louette, J.-J. Pireaux, K. Maex

J. Appl. Phys. 96, 3807–3810 (2004)

https://doi.org/10.1063/1.1775049

Published: October 2004

View article titled, Polymer dielectric treatment using ultraviolet-ozone: A photoelectron spectroscopy and ellipsometric porosimetry study

NARROW

Topics

Direct observation of preferential heating near grain boundaries in patterned silicide films

Study of metal-related deep-level defects in germanide Schottky barriers on n -type germanium

Analysis of the size effect in electroplated fine copper wires and a realistic assessment to model copper resistivity

Impact of Ni-silicide grain orientation on the strain and stress fields induced in patterned silicon

Influence of Ge substrate crystallinity on Co germanide formation in solid-state reactions

Using scaling laws to understand the growth mechanism of atomic layer deposited W N x C y films on methyl-terminated surfaces

Internal photoemission of electrons at interfaces of metals with low- κ insulators

Deep level transient spectroscopy study of Pd and Pt sputtering damage in n -type germanium

Deep level transient spectroscopy study of nickel-germanide Schottky barriers on n -type germanium

The impact of the density and type of reactive sites on the characteristics of the atomic layer deposited W N x C y films

Short-ranged structural rearrangement and enhancement of mechanical properties of organosilicate glasses induced by ultraviolet radiation

Application of flash-assist rapid thermal processing subsequent to low-temperature furnace anneals

Mechanisms of arsenic segregation to the Ni 2 Si ∕ SiO 2 interface during Ni 2 Si formation

A theoretical and experimental study of atomic-layer-deposited films onto porous dielectric substrates

Effect of plasma treatments on a low- k dielectric polymer surface

Influence of the anneal conditions on arsenic activation during solid-phase epitaxial regrowth

Interface characterization of nanoscale laminate structures on dense dielectric substrates by x-ray reflectivity

The relation between phase transformation and onset of thermal degradation in nanoscale Co Si 2 -polycrystalline silicon structures

Microstructure and resistivity characterization of CuAu I superlattice formed in Cu ∕ Au thin films

Polymer dielectric treatment using ultraviolet-ozone: A photoelectron spectroscopy and ellipsometric porosimetry study

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

This Feature Is Available To Subscribers Only