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Journal Articles

Electronic vs phononic thermal transport in Cr-doped V2O3 thin films across the Mott transition

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Johannes Mohr, Kiumars Aryana, Md. Rafiqul Islam, Dirk J. Wouters, Rainer Waser, Patrick E. Hopkins, Joyeeta Nag, Daniel Bedau
Journal: Applied Physics Letters
Appl. Phys. Lett. 125, 142201 (2024)
https://doi.org/10.1063/5.0231707
Published: September 2024
View articletitled, Electronic vs phononic thermal transport in Cr-doped V2O3 thin films across the Mott transition
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Journal Articles

Inherent area selective deposition of silicon dioxide in multilayer 3D SiOx–SiNx stacks

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Kartik Sondhi, Stephen Ross, Joyeeta Nag, X. C. Guo, Dexin Zhao, Adarsh Rajashekhar, Senaka Kanakamedala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 050403 (2024)
https://doi.org/10.1116/6.0003790
Published: August 2024
View articletitled, Inherent area selective deposition of silicon dioxide in multilayer 3D SiOx–SiNx stacks
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Journal Articles

Understanding 3D anisotropic reactive ion etching of oxide-metal stacks

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Prafful Golani, Roshan J. Tirukkonda, Aaron N. Fancher, Stephen R. Ross, Mark D. Kraman, Rahul Sharangpani, Joyeeta Nag, Kartik Sondhi, Alexei L. Bogdanov, Senaka K. Kanakamedala
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062206 (2023)
https://doi.org/10.1116/6.0003105
Published: November 2023
View articletitled, Understanding 3D anisotropic reactive ion etching of oxide-metal stacks
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Includes: Supplementary data
Journal Articles

Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks

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Kartik Sondhi, Rahul Sharangpani, Roshan Tirukkonda, Joyeeta Nag, Xing-Cai Guo, Michael A. Gribelyuk, Raghuveer S. Makala, Senaka Kanakamedala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 050402 (2023)
https://doi.org/10.1116/6.0002860
Published: August 2023
View articletitled, Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks
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Includes: Supplementary data
Journal Articles

Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling

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Roshan J. Tirukkonda, Mark D. Kraman, Rahul Sharangpani, Kartik Sondhi, Aaron N. Fancher, Stephen R. Ross, Joyeeta Nag, Alexei L. Bogdanov, Raghuveer S. Makala, Senaka K. Kanakamedala
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 043202 (2023)
https://doi.org/10.1116/6.0002709
Published: June 2023
View articletitled, Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling
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Includes: Supplementary data
Journal Articles

Area selective deposition of ruthenium on 3D structures

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Kartik Sondhi, Rahul Sharangpani, Ramy Nashed Bassely Said, Joyeeta Nag, Michael Gribelyuk, Senaka Kanakamedala, Raghuveer S. Makala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062412 (2022)
https://doi.org/10.1116/6.0002148
Published: November 2022
View articletitled, Area selective deposition of ruthenium on 3D structures
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Includes: Supplementary data
Journal Articles

Non-congruence of thermally driven structural and electronic transitions in VO2

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Joyeeta Nag, Richard F. Haglund, Jr., E. Andrew Payzant, Karren L. More
Journal: Journal of Applied Physics
J. Appl. Phys. 112, 103532 (2012)
https://doi.org/10.1063/1.4764040
Published: November 2012
View articletitled, Non-congruence of thermally driven structural and electronic transitions in VO2
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Includes: Supplementary data
Journal Articles

Enhanced performance of room-temperature-grown epitaxial thin films of vanadium dioxide

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Joyeeta Nag, E. Andrew Payzant, Karren L. More, Richard F. Haglund, Jr.
Journal: Applied Physics Letters
Appl. Phys. Lett. 98, 251916 (2011)
https://doi.org/10.1063/1.3600333
Published: June 2011
View articletitled, Enhanced performance of room-temperature-grown epitaxial thin films of vanadium dioxide
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Includes: Supplementary data