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José H. D. da Silva
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Journal Articles

Deposition rate and optical emissions in niobium oxide processes by reactive sputtering

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João Saccoman, Nilton Francelosi A. Neto, José H. D. da Silva
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033402 (2024)
https://doi.org/10.1116/6.0003255
Published: March 2024
View article titled, Deposition rate and optical emissions in niobium oxide processes by reactive sputtering
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Journal Articles

The role of Nb2O5 deposition process on perovskite solar cells

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Silvia L. Fernandes, Larissa de O. Garcia, Roberto de A. Ramos Júnior, Lucas J. Affonço, Diego Bagnis, Rodrigo Vilaça, Fenelon M. Pontes, José H. D. da Silva, Carlos F. O. Graeff
Journal: Journal of Renewable and Sustainable Energy
J. Renewable Sustainable Energy 14, 043703 (2022)
https://doi.org/10.1063/5.0083073
Published: July 2022
View article titled, The role of Nb<sub>2</sub>O<sub>5</sub> deposition process on perovskite solar cells
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Includes: Supplementary data
Journal Articles

Role of oxygen flow rate on the structure and stoichiometry of cobalt oxide films deposited by reactive sputtering

Nilton Francelosi A. Neto, Cristiane Stegemann, Lucas J. Affonço, Douglas M. G. Leite, José H. D. da Silva
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 013405 (2022)
https://doi.org/10.1116/6.0001418
Published: November 2021
View article titled, Role of oxygen flow rate on the structure and stoichiometry of cobalt oxide films deposited by reactive sputtering
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Journal Articles

Role of the reactive sputtering deposition power in the phase control of cobalt oxide films

Nilton Francelosi Azevedo Neto, Douglas M. G. Leite, Paulo N. Lisboa-Filho, José H. D. da Silva
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 061512 (2018)
https://doi.org/10.1116/1.5046952
Published: November 2018
View article titled, Role of the reactive sputtering deposition power in the phase control of cobalt oxide films
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Journal Articles

Effects of substrate temperature, substrate orientation, and energetic atomic collisions on the structure of GaN films grown by reactive sputtering

Ziani S. Schiaber, Douglas M. G. Leite, José R. R. Bortoleto, Paulo N. Lisboa-Filho, José H. D. da Silva
Journal: Journal of Applied Physics
J. Appl. Phys. 114, 183515 (2013)
https://doi.org/10.1063/1.4828873
Published: November 2013
View article titled, Effects of substrate temperature, substrate orientation, and energetic atomic collisions on the structure of GaN films grown by reactive sputtering
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