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Jon Tomas Gudmundsson
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Journal Articles

High power impulse magnetron sputtering of a zirconium target

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Swetha Suresh Babu, Joel Fischer, Kateryna Barynova, Martin Rudolph, Daniel Lundin, Jon Tomas Gudmundsson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043007 (2024)
https://doi.org/10.1116/6.0003647
Published: June 2024
View article titled, High power impulse magnetron sputtering of a zirconium target
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Journal Articles

Field reversal in low pressure, unmagnetized radio frequency capacitively coupled argon plasma discharges

De-Qi Wen, Janez Krek, Jon Tomas Gudmundsson, Emi Kawamura, Michael A Lieberman, Peng Zhang, John P Verboncoeur
Journal: Applied Physics Letters
Appl. Phys. Lett. 123, 264102 (2023)
https://doi.org/10.1063/5.0179467
Published: December 2023
View article titled, Field reversal in low pressure, unmagnetized radio frequency capacitively coupled argon plasma discharges
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Journal Articles

On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputtering

Martin Rudolph, Hamidreza Hajihoseini, Michael A. Raadu, Jon Tomas Gudmundsson, Nils Brenning, Tiberiu M. Minea, André Anders, Daniel Lundin
Journal: Journal of Applied Physics
J. Appl. Phys. 129, 033303 (2021)
https://doi.org/10.1063/5.0036902
Published: January 2021
View article titled, On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputtering
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Journal Articles

Structural and photoluminescence study of TiO2 layer with self-assembled Si1−xGex nanoislands

Muhammad Taha Sultan, Jon Tomas Gudmundsson, Andrei Manolescu, Halldor Gudfinnur Svavarsson
Journal: Journal of Applied Physics
J. Appl. Phys. 128, 085304 (2020)
https://doi.org/10.1063/5.0011180
Published: August 2020
View article titled, Structural and photoluminescence study of TiO<sub>2</sub> layer with self-assembled Si<sub>1−<em>x</em></sub>Ge<em><sub>x</sub></em> nanoislands
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Journal Articles

Effect of substrate bias on microstructure of epitaxial film grown by HiPIMS: An atomistic simulation

Movaffaq Kateb, Jon Tomas Gudmundsson, Snorri Ingvarsson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 043006 (2020)
https://doi.org/10.1116/6.0000233
Published: June 2020
View article titled, Effect of substrate bias on microstructure of epitaxial film grown by HiPIMS: An atomistic simulation
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Journal Articles

Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength

Nils Brenning, Alexandre Butler, Hamidreza Hajihoseini, Martin Rudolph, Michael A. Raadu, Jon Tomas Gudmundsson, Tiberiu Minea, Daniel Lundin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033008 (2020)
https://doi.org/10.1116/6.0000079
Published: April 2020
View article titled, Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength
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Journal Articles

Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering

Hamidreza Hajihoseini, Martin Čada, Zdenek Hubička, Selen Ünaldi, Michael A. Raadu, Nils Brenning, Jon Tomas Gudmundsson, Daniel Lundin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033009 (2020)
https://doi.org/10.1116/1.5145292
Published: April 2020
View article titled, Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering
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Journal Articles

Role of ionization fraction on the surface roughness, density, and interface mixing of the films deposited by thermal evaporation, dc magnetron sputtering, and HiPIMS: An atomistic simulation

Movaffaq Kateb, Hamidreza Hajihoseini, Jon Tomas Gudmundsson, Snorri Ingvarsson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 031306 (2019)
https://doi.org/10.1116/1.5094429
Published: April 2019
View article titled, Role of ionization fraction on the surface roughness, density, and interface mixing of the films deposited by thermal evaporation, dc magnetron sputtering, and HiPIMS: An atomistic simulation
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Journal Articles

Effect of atomic ordering on the magnetic anisotropy of single crystal Ni80Fe20

Movaffaq Kateb, Jon Tomas Gudmundsson, Snorri Ingvarsson
Journal: AIP Advances
AIP Advances 9, 035308 (2019)
https://doi.org/10.1063/1.5088602
Published: March 2019
View article titled, Effect of atomic ordering on the magnetic anisotropy of single crystal Ni<sub>80</sub>Fe<sub>20</sub>
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