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Journal Articles

Microfluidic production of monodisperse emulsions for cosmetics

Daehwan Park, Hajeong Kim, Jin Woong Kim
Journal: Biomicrofluidics
Biomicrofluidics 15, 051302 (2021)
https://doi.org/10.1063/5.0057733
Published: October 2021
View articletitled, Microfluidic production of monodisperse emulsions for cosmetics
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Journal Articles

Evaluation of electrical conductivity and anisotropy in muscle tissues using conductivity tensor imaging (CTI)

Bup Kyung Choi, Nitish Katoch, In Ok Ko, Ji Ae Park, Jin Woong Kim, Hyung Joong Kim, Eung Je Woo
Journal: AIP Advances
AIP Advances 10, 115115 (2020)
https://doi.org/10.1063/5.0031592
Published: November 2020
View articletitled, Evaluation of electrical conductivity and anisotropy in muscle tissues using conductivity tensor imaging (CTI)
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Journal Articles

Origin of de-swelling and dynamics of dense ionic microgel suspensions

Giovanni Romeo, Luna Imperiali, Jin-Woong Kim, Alberto Fernández-Nieves, David A. Weitz
Journal: The Journal of Chemical Physics
J. Chem. Phys. 136, 124905 (2012)
https://doi.org/10.1063/1.3697762
Published: March 2012
View articletitled, Origin of de-swelling and dynamics of dense ionic microgel suspensions
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Journal Articles

Improvement of Poly Profile in Sub 30 nm Device By Damage Engineering and Tilted Implantation Method

Chul‐Young Ham, Noh‐Yeal Kwak, Sang‐Soo Lee, Seung‐Woo Shin, Min‐Sung Ko, Jae‐Mun Kim, Byung‐Seok Lee, Jin‐Woong Kim, Choong‐Young Oh, Yong‐Su Kim, Benjamin Colombeau
Journal: AIP Conference Proceedings
AIP Conf. Proc. 1321, 41–44 (2011)
https://doi.org/10.1063/1.3548439
Published: January 2011
View articletitled, Improvement of Poly Profile in Sub 30 nm Device By Damage Engineering and Tilted Implantation Method
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Journal Articles

Modified atomic layer deposition of Ru O 2 thin films for capacitor electrodes

Jin-Hyock Kim, Deok-Sin Kil, Seung-Jin Yeom, Jae-Sung Roh, Noh-Jung Kwak, Jin-Woong Kim
Journal: Applied Physics Letters
Appl. Phys. Lett. 91, 052908 (2007)
https://doi.org/10.1063/1.2767769
Published: August 2007
View articletitled, Modified atomic layer deposition of Ru O 2 thin films for capacitor electrodes
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Journal Articles

Characteristics of the nanoscale titanium film deposited by plasma enhanced chemical vapor deposition and comparison of the film properties with the film by physical vapor deposition

Joo Wan Lee, Soo-Hyun Kim, No Jung Kwak, Young Jin Lee, Hyun Chul Sohn, Jin Woong Kim, Ho-Jung Sun
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 1460–1463 (2006)
https://doi.org/10.1116/1.2201458
Published: May 2006
View articletitled, Characteristics of the nanoscale titanium film deposited by plasma enhanced chemical vapor deposition and comparison of the film properties with the film by physical vapor deposition
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Journal Articles

Epitaxial growth of CoSi 2 in a decanano contact opening on a (100) silicon substrate

Ho-Jung Sun, Young-Jin Lee, Soo-Hyun Kim, Joo-Wan Lee, Ja-Chun Ku, Hyun-Chul Sohn, Jin-Woong Kim, Uisik Kim, Nak-Kyun Sung
Journal: Applied Physics Letters
Appl. Phys. Lett. 86, 221919 (2005)
https://doi.org/10.1063/1.1943500
Published: May 2005
View articletitled, Epitaxial growth of CoSi 2 in a decanano contact opening on a (100) silicon substrate
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Journal Articles

Effect of gate hard mask and sidewall spacer structures on the gate oxide reliability of W ∕ W N x ∕ poly ‐ Si gate MOSFET for high density DRAM applications

Kwan-Yong Lim, Heung-Jae Cho, Se-Aug Jang, Yong Soo Kim, Jae-Geun Oh, Jung-Ho Lee, Hong-Seon Yang, Hyun-Chul Sohn, Jin-Woong Kim
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 1036–1040 (2005)
https://doi.org/10.1116/1.1897708
Published: May 2005
View articletitled, Effect of gate hard mask and sidewall spacer structures on the gate oxide reliability of W ∕ W N x ∕ poly ‐ Si gate MOSFET for high density DRAM applications
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Journal Articles

Effect of fluorine incorporation on silicon dioxide prepared by high density plasma chemical vapor deposition with SiH 4 ∕ O 2 ∕ NF 3 chemistry

Jae-Hong Kim, Chai-O Chung, Dongsun Sheen, Yong-Sun Sohn, Hyun-Chul Sohn, Jin-Woong Kim, Sung-Wook Park
Journal: Journal of Applied Physics
J. Appl. Phys. 96, 1435–1442 (2004)
https://doi.org/10.1063/1.1767979
Published: August 2004
View articletitled, Effect of fluorine incorporation on silicon dioxide prepared by high density plasma chemical vapor deposition with SiH 4 ∕ O 2 ∕ NF 3 chemistry
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Journal Articles

Plasma enhanced chemical vapor deposition Si-rich silicon oxynitride films for advanced self-aligned contact oxide etching in sub-0.25 μm ultralarge scale integration technology and beyond

Jeong-Ho Kim, Jae-Seon Yu, Ja-Chun Ku, Choon-Kun Ryu, Su-Jin Oh, Si-Bum Kim, Jin-Woong Kim, Jeong-Mo Hwang, Su-Youb Lee, Inazawa Kouichiro
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 18, 1401–1410 (2000)
https://doi.org/10.1116/1.582362
Published: July 2000
View articletitled, Plasma enhanced chemical vapor deposition Si-rich silicon oxynitride films for advanced self-aligned contact oxide etching in sub-0.25 μm ultralarge scale integration technology and beyond
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