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Jeong Hwan Han
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Journal Articles

Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H2/N2/Ar plasma

Wangu Kang, Ji Sang Ahn, Jeong Hwan Han
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062401 (2023)
https://doi.org/10.1116/6.0002970
Published: September 2023
View article titled, Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H<sub>2</sub>/N<sub>2</sub>/Ar plasma
Open the PDF for Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H<sub>2</sub>/N<sub>2</sub>/Ar plasma in another window
Includes: Supplementary data
Journal Articles

Thermal atomic layer deposition of molybdenum carbide films using bis(ethylbenzene)molybdenum and H2

Ji Sang Ahn, Wangu Kang, Jeong Hwan Han
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 012405 (2023)
https://doi.org/10.1116/6.0002308
Published: December 2022
View article titled, Thermal atomic layer deposition of molybdenum carbide films using bis(ethylbenzene)molybdenum and H<sub>2</sub>
Open the PDF for Thermal atomic layer deposition of molybdenum carbide films using bis(ethylbenzene)molybdenum and H<sub>2</sub> in another window
Includes: Supplementary data
Journal Articles

Investigation of phases and chemical states of tin titanate films grown by atomic layer deposition

Hong Keun Chung, Jung Joon Pyeon, In-Hwan Baek, Ga-Yeon Lee, Hansol Lee, Sung Ok Won, Jeong Hwan Han, Taek-Mo Chung, Tae Joo Park, Seong Keun Kim
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 012404 (2020)
https://doi.org/10.1116/1.5134136
Published: December 2019
View article titled, Investigation of phases and chemical states of tin titanate films grown by atomic layer deposition
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Journal Articles

Performance of exchange-correlation functionals in density functional theory calculations for liquid metal: A benchmark test for sodium

Jeong-Hwan Han, Takuji Oda
Journal: The Journal of Chemical Physics
J. Chem. Phys. 148, 144501 (2018)
https://doi.org/10.1063/1.5017198
Published: April 2018
View article titled, Performance of exchange-correlation functionals in density functional theory calculations for liquid metal: A benchmark test for sodium
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Includes: Supplementary data
Journal Articles

Schottky diode with excellent performance for large integration density of crossbar resistive memory

Gun Hwan Kim, Jong Ho Lee, Jeong Hwan Han, Seul Ji Song, Jun Yeong Seok, Jung Ho Yoon, Kyung Jean Yoon, Min Hwan Lee, Tae Joo Park, Cheol Seong Hwang
Journal: Applied Physics Letters
Appl. Phys. Lett. 100, 213508 (2012)
https://doi.org/10.1063/1.4722784
Published: May 2012
View article titled, Schottky diode with excellent performance for large integration density of crossbar resistive memory
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Journal Articles

The mechanism for the suppression of leakage current in high dielectric TiO2 thin films by adopting ultra-thin HfO2 films for memory application

Minha Seo, Sang Ho Rha, Seong Keun Kim, Jeong Hwan Han, Woongkyu Lee, Sora Han, Cheol Seong Hwang
Journal: Journal of Applied Physics
J. Appl. Phys. 110, 024105 (2011)
https://doi.org/10.1063/1.3605527
Published: July 2011
View article titled, The mechanism for the suppression of leakage current in high dielectric TiO<sub>2</sub> thin films by adopting ultra-thin HfO<sub>2</sub> films for memory application
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Journal Articles

Improvement in the leakage current characteristic of metal-insulator-metal capacitor by adopting RuO2 film as bottom electrode

Jeong Hwan Han, Sora Han, Woongkyu Lee, Sang Woon Lee, Seong Keun Kim, Julien Gatineau, Christian Dussarrat, Cheol Seong Hwang
Journal: Applied Physics Letters
Appl. Phys. Lett. 99, 022901 (2011)
https://doi.org/10.1063/1.3609875
Published: July 2011
View article titled, Improvement in the leakage current characteristic of metal-insulator-metal capacitor by adopting RuO<sub>2</sub> film as bottom electrode
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Journal Articles

Enhanced electrical properties of Sr Ti O 3 thin films grown by atomic layer deposition at high temperature for dynamic random access memory applications

Sang Woon Lee, Oh Seong Kwon, Jeong Hwan Han, Cheol Seong Hwang
Journal: Applied Physics Letters
Appl. Phys. Lett. 92, 222903 (2008)
https://doi.org/10.1063/1.2939102
Published: June 2008
View article titled, Enhanced electrical properties of Sr Ti O 3 thin films grown by atomic layer deposition at high temperature for dynamic random access memory applications
Open the PDF for Enhanced electrical properties of Sr Ti O 3 thin films grown by atomic layer deposition at high temperature for dynamic random access memory applications in another window