Page 1 | Search Results | AIP Publishing

1-20 of 51

Sort by

Sort Order Select

Journal Articles

Electrodes for carbon nanotube devices by focused electron beam induced deposition of gold

T. Brintlinger, M. S. Fuhrer, J. Melngailis, I. Utke, T. Bret, A. Perentes, P. Hoffmann, M. Abourida, P. Doppelt

J. Vac. Sci. Technol. B 23, 3174–3177 (2005)

https://doi.org/10.1116/1.2130355

Published: December 2005

View article titled, Electrodes for carbon nanotube devices by focused electron beam induced deposition of gold

Journal Articles

Effect of 90° domain movement on the piezoelectric response of patterned PbZr 0.2 Ti 0.8 O 3 ∕ SrTiO 3 ∕ Si heterostructures

Zhengkun Ma, F. Zavaliche, L. Chen, J. Ouyang, J. Melngailis, A. L. Roytburd, V. Vaithyanathan, D. G. Schlom, T. Zhao, R. Ramesh

Appl. Phys. Lett. 87, 072907 (2005)

https://doi.org/10.1063/1.2012527

Published: August 2005

View article titled, Effect of 90° domain movement on the piezoelectric response of patterned PbZr 0.2 Ti 0.8 O 3 ∕ SrTiO 3 ∕ Si heterostructures

Journal Articles

Realizing intrinsic piezoresponse in epitaxial submicron lead zirconate titanate capacitors on Si

V. Nagarajan, A. Stanishevsky, L. Chen, T. Zhao, B.-T. Liu, J. Melngailis, A. L. Roytburd, R. Ramesh, J. Finder, Z. Yu, R. Droopad, K. Eisenbeiser

Appl. Phys. Lett. 81, 4215–4217 (2002)

https://doi.org/10.1063/1.1516857

Published: November 2002

View article titled, Realizing intrinsic piezoresponse in epitaxial submicron lead zirconate titanate capacitors on Si

Journal Articles

Radiation damage and its recovery in focused ion beam fabricated ferroelectric capacitors

A. Stanishevsky, B. Nagaraj, J. Melngailis, R. Ramesh, L. Khriachtchev, E. McDaniel

J. Appl. Phys. 92, 3275–3278 (2002)

https://doi.org/10.1063/1.1489069

Published: September 2002

View article titled, Radiation damage and its recovery in focused ion beam fabricated ferroelectric capacitors

Journal Articles

Quantitative imaging of dielectric permittivity and tunability with a near-field scanning microwave microscope

D. E. Steinhauer, C. P. Vlahacos, F. C. Wellstood, Steven M. Anlage, C. Canedy, R. Ramesh, A. Stanishevsky, J. Melngailis

Rev. Sci. Instrum. 71, 2751–2758 (2000)

https://doi.org/10.1063/1.1150687

Published: July 2000

View article titled, Quantitative imaging of dielectric permittivity and tunability with a near-field scanning microwave microscope

Journal Articles

Focused-ion-beam writing of electrical connections into platinum oxide films

F. Machalett, K. Edinger, L. Ye, J. Melngailis, T. Venkatesan, M. Diegel, K. Steenbeck

Appl. Phys. Lett. 76, 3445–3447 (2000)

https://doi.org/10.1063/1.125945

Published: June 2000

View article titled, Focused-ion-beam writing of electrical connections into platinum oxide films

Journal Articles

Scaling of ferroelectric and piezoelectric properties in Pt/SrBi 2 Ta 2 O 9 /Pt thin films

C. S. Ganpule, A. Stanishevsky, S. Aggarwal, J. Melngailis, E. Williams, R. Ramesh, V. Joshi, Carlos Paz de Araujo

Appl. Phys. Lett. 75, 3874–3876 (1999)

https://doi.org/10.1063/1.125485

Published: December 1999

View article titled, Scaling of ferroelectric and piezoelectric properties in Pt/SrBi 2 Ta 2 O 9 /Pt thin films

Journal Articles

Imaging of microwave permittivity, tunability, and damage recovery in (Ba, Sr)TiO 3 thin films

D. E. Steinhauer, C. P. Vlahacos, F. C. Wellstood, Steven M. Anlage, C. Canedy, R. Ramesh, A. Stanishevsky, J. Melngailis

Appl. Phys. Lett. 75, 3180–3182 (1999)

https://doi.org/10.1063/1.125270

Published: November 1999

View article titled, Imaging of microwave permittivity, tunability, and damage recovery in (Ba, Sr)TiO 3 thin films

Journal Articles

Scaling of ferroelectric properties in thin films

C. S. Ganpule, A. Stanishevsky, Q. Su, S. Aggarwal, J. Melngailis, E. Williams, R. Ramesh

Appl. Phys. Lett. 75, 409–411 (1999)

https://doi.org/10.1063/1.124391

Published: July 1999

View article titled, Scaling of ferroelectric properties in thin films

Journal Articles

Study of precursor gases for focused ion beam insulator deposition

K. Edinger, J. Melngailis, J. Orloff

J. Vac. Sci. Technol. B 16, 3311–3314 (1998)

https://doi.org/10.1116/1.590497

Published: November 1998

View article titled, Study of precursor gases for focused ion beam insulator deposition

Journal Articles

Focused ion-beam patterning of nanoscale ferroelectric capacitors

A. Stanishevsky, S. Aggarwal, A. S. Prakash, J. Melngailis, R. Ramesh

J. Vac. Sci. Technol. B 16, 3899–3902 (1998)

https://doi.org/10.1116/1.590431

Published: November 1998

View article titled, Focused ion-beam patterning of nanoscale ferroelectric capacitors

Journal Articles

Fabrication and characterization of buried subchannel implant n-metal–oxide–semiconductor transistors

W. Wang, D. McCarthy, D. Park, D. Ma, C. Marrian, M. Peckerar, N. Goldsman, J. Melngailis, I. L. Berry

J. Vac. Sci. Technol. B 16, 3812–3816 (1998)

https://doi.org/10.1116/1.590414

Published: November 1998

View article titled, Fabrication and characterization of buried subchannel implant <em>n</em>-metal–oxide–semiconductor transistors

Journal Articles

Fabrication of high-temperature superconducting Josephson junctions on substrates patterned by focused ion beam

C.-H. Chen, I. Jin, S. P. Pai, Z. W. Dong, C. J. Lobb, T. Venkatesan, K. Edinger, J. Orloff, J. Melngailis

Appl. Phys. Lett. 73, 1730–1732 (1998)

https://doi.org/10.1063/1.122259

Published: September 1998

View article titled, Fabrication of high-temperature superconducting Josephson junctions on substrates patterned by focused ion beam

Journal Articles

Combined method of focused ion beam milling and ion implantation techniques for the fabrication of high temperature superconductor Josephson junctions

C.-H. Chen, I. Jin, S. P. Pai, Z. W. Dong, R. P. Sharma, C. J. Lobb, T. Venkatesan, K. Edinger, J. Orloff, J. Melngailis, Z. Zhang, W. K. Chu

J. Vac. Sci. Technol. B 16, 2898–2901 (1998)

https://doi.org/10.1116/1.590291

Published: September 1998

View article titled, Combined method of focused ion beam milling and ion implantation techniques for the fabrication of high temperature superconductor Josephson junctions

Journal Articles

A review of ion projection lithography

J. Melngailis, A. A. Mondelli, Ivan L. Berry, III, R. Mohondro

J. Vac. Sci. Technol. B 16, 927–957 (1998)

https://doi.org/10.1116/1.590052

Published: May 1998

View article titled, A review of ion projection lithography

Journal Articles

Focused ion beam sputter yield change as a function of scan speed

D. Santamore, K. Edinger, J. Orloff, J. Melngailis

J. Vac. Sci. Technol. B 15, 2346–2349 (1997)

https://doi.org/10.1116/1.589643

Published: November 1997

View article titled, Focused ion beam sputter yield change as a function of scan speed

Journal Articles

Self-aligned subchannel implant complementary metal–oxide semiconductor devices fabrication

W. Wang, C. Chang, D. Ma, M. Peckerar, I. Berry, N. Goldsman, J. Melngailis

J. Vac. Sci. Technol. B 15, 2816–2820 (1997)

https://doi.org/10.1116/1.589734

Published: November 1997

View article titled, Self-aligned subchannel implant complementary metal–oxide semiconductor devices fabrication

Journal Articles

Programmable aperture plate for maskless high-throughput nanolithography

I. L. Berry, A. A. Mondelli, J. Nichols, J. Melngailis

J. Vac. Sci. Technol. B 15, 2382–2386 (1997)

https://doi.org/10.1116/1.589652

Published: November 1997

View article titled, Programmable aperture plate for maskless high-throughput nanolithography

Journal Articles

Fabrication of high-temperature superconductor Josephson junctions by focused ion beam milling

C.-H. Chen, Z. Trajanovic, Z. W. Dong, C. J. Lobb, T. Venkatesan, K. Edinger, J. Orloff, J. Melngailis

J. Vac. Sci. Technol. B 15, 2379–2381 (1997)

https://doi.org/10.1116/1.589651

Published: November 1997

View article titled, Fabrication of high-temperature superconductor Josephson junctions by focused ion beam milling

Journal Articles

Ion beams in silicon processing and characterization

E. Chason, S. T. Picraux, J. M. Poate, J. O. Borland, M. I. Current, T. Diaz de la Rubia, D. J. Eaglesham, O. W. Holland, M. E. Law, C. W. Magee, J. W. Mayer, J. Melngailis, A. F. Tasch

J. Appl. Phys. 81, 6513–6561 (1997)

https://doi.org/10.1063/1.365193

Published: May 1997

View article titled, Ion beams in silicon processing and characterization

NARROW

Topics

Electrodes for carbon nanotube devices by focused electron beam induced deposition of gold

Effect of 90° domain movement on the piezoelectric response of patterned PbZr 0.2 Ti 0.8 O 3 ∕ SrTiO 3 ∕ Si heterostructures

Realizing intrinsic piezoresponse in epitaxial submicron lead zirconate titanate capacitors on Si

Radiation damage and its recovery in focused ion beam fabricated ferroelectric capacitors

Quantitative imaging of dielectric permittivity and tunability with a near-field scanning microwave microscope

Focused-ion-beam writing of electrical connections into platinum oxide films

Scaling of ferroelectric and piezoelectric properties in Pt/SrBi 2 Ta 2 O 9 /Pt thin films

Imaging of microwave permittivity, tunability, and damage recovery in (Ba, Sr)TiO 3 thin films

Scaling of ferroelectric properties in thin films

Study of precursor gases for focused ion beam insulator deposition

Focused ion-beam patterning of nanoscale ferroelectric capacitors

Fabrication and characterization of buried subchannel implant n-metal–oxide–semiconductor transistors

Fabrication of high-temperature superconducting Josephson junctions on substrates patterned by focused ion beam

Combined method of focused ion beam milling and ion implantation techniques for the fabrication of high temperature superconductor Josephson junctions

A review of ion projection lithography

Focused ion beam sputter yield change as a function of scan speed

Self-aligned subchannel implant complementary metal–oxide semiconductor devices fabrication

Programmable aperture plate for maskless high-throughput nanolithography

Fabrication of high-temperature superconductor Josephson junctions by focused ion beam milling

Ion beams in silicon processing and characterization

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

This Feature Is Available To Subscribers Only