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Journal Articles

Electron Interactions With BCl 3

L. G. Christophorou, J. K. Olthoff

J. Phys. Chem. Ref. Data 31, 971–988 (2002)

https://doi.org/10.1063/1.1504440

Published: October 2002

View articletitled, Electron Interactions With BCl 3

Journal Articles

Measured cross sections and ion energies for a CHF 3 discharge

B. L. Peko, R. L. Champion, M. V. V. S. Rao, J. K. Olthoff

J. Appl. Phys. 92, 1657–1662 (2002)

https://doi.org/10.1063/1.1491276

Published: August 2002

View articletitled, Measured cross sections and ion energies for a CHF 3 discharge

Journal Articles

Ion compositions and energies in inductively coupled plasmas containing SF 6

A. N. Goyette, Yicheng Wang, J. K. Olthoff

J. Vac. Sci. Technol. A 19, 1294–1297 (2001)

https://doi.org/10.1116/1.1330261

Published: July 2001

View articletitled, Ion compositions and energies in inductively coupled plasmas containing SF 6

Journal Articles

Electron transport, ionization, and attachment coefficients in C 2 F 4 and C 2 F 4 / Ar mixtures

A. N. Goyette, J. de Urquijo, Yicheng Wang, L. G. Christophorou, J. K. Olthoff

J. Chem. Phys. 114, 8932–8937 (2001)

https://doi.org/10.1063/1.1368385

Published: May 2001

View articletitled, Electron transport, ionization, and attachment coefficients in C 2 F 4 and C 2 F 4 / Ar mixtures

Includes: Supplementary data

Journal Articles

Electron Interactions With c- C 4 F 8

L. G. Christophorou, J. K. Olthoff

J. Phys. Chem. Ref. Data 30, 449–473 (2001)

https://doi.org/10.1063/1.1372164

Published: March 2001

View articletitled, Electron Interactions With c- C 4 F 8

Journal Articles

Comparison of the identities, fluxes, and energies of ions formed in high density fluorocarbon discharges

A. N. Goyette, Yicheng Wang, J. K. Olthoff

AIP Conf. Proc. 550, 238–242 (2001)

https://doi.org/10.1063/1.1354404

Published: January 2001

View articletitled, Comparison of the identities, fluxes, and energies of ions formed in high density fluorocarbon discharges

Journal Articles

Ion fluxes and energies in inductively coupled radio-frequency discharges containing CHF 3

Yicheng Wang, M. Misakian, A. N. Goyette, J. K. Olthoff

J. Appl. Phys. 88, 5612–5617 (2000)

https://doi.org/10.1063/1.1319968

Published: November 2000

View articletitled, Ion fluxes and energies in inductively coupled radio-frequency discharges containing CHF 3

Journal Articles

Ion fluxes and energies in inductively coupled radio-frequency discharges containing C 2 F 6 and c - C 4 F 8

A. N. Goyette, Yicheng Wang, M. Misakian, J. K. Olthoff

J. Vac. Sci. Technol. A 18, 2785–2790 (2000)

https://doi.org/10.1116/1.1308590

Published: November 2000

View articletitled, Ion fluxes and energies in inductively coupled radio-frequency discharges containing C 2 F 6 and c - C 4 F 8

Journal Articles

Electron Interactions With CF 3 I

L. G. Christophorou, J. K. Olthoff

J. Phys. Chem. Ref. Data 29, 553–569 (2000)

https://doi.org/10.1063/1.1318910

Published: July 2000

View articletitled, Electron Interactions With CF 3 I

Journal Articles

Electron Interactions With SF 6

L. G. Christophorou, J. K. Olthoff

J. Phys. Chem. Ref. Data 29, 267–330 (2000)

https://doi.org/10.1063/1.1288407

Published: May 2000

View articletitled, Electron Interactions With SF 6

Journal Articles

Boltzmann analysis of electron swarm parameters in CF 4 using independently assessed electron-collision cross sections

M.-C. Bordage, P. Ségur, L. G. Christophorou, J. K. Olthoff

J. Appl. Phys. 86, 3558–3566 (1999)

https://doi.org/10.1063/1.371258

Published: October 1999

View articletitled, Boltzmann analysis of electron swarm parameters in CF 4 using independently assessed electron-collision cross sections

Journal Articles

Electron Interactions With Plasma Processing Gases: An Update for CF 4 , CHF 3 , C 2 F 6 , and C 3 F 8

L. G. Christophorou, J. K. Olthoff

J. Phys. Chem. Ref. Data 28, 967–982 (1999)

https://doi.org/10.1063/1.556042

Published: July 1999

View articletitled, Electron Interactions With Plasma Processing Gases: An Update for CF 4 , CHF 3 , C 2 F 6 , and C 3 F 8

Journal Articles

Studies of ion bombardment in high density plasmas containing CF 4

J. K. Olthoff, Yicheng Wang

J. Vac. Sci. Technol. A 17, 1552–1555 (1999)

https://doi.org/10.1116/1.581851

Published: July 1999

View articletitled, Studies of ion bombardment in high density plasmas containing CF 4

Journal Articles

Ion energy distributions in inductively coupled radio-frequency discharges in argon, nitrogen, oxygen, chlorine, and their mixtures

Yicheng Wang, J. K. Olthoff

J. Appl. Phys. 85, 6358–6365 (1999)

https://doi.org/10.1063/1.370138

Published: May 1999

View articletitled, Ion energy distributions in inductively coupled radio-frequency discharges in argon, nitrogen, oxygen, chlorine, and their mixtures

Journal Articles

Electron Interactions With Cl₂

L. G. Christophorou, J. K. Olthoff

J. Phys. Chem. Ref. Data 28, 131–169 (1999)

https://doi.org/10.1063/1.556036

Published: January 1999

View articletitled, Electron Interactions With Cl2

Journal Articles

Total electron scattering cross section for Cl 2

G. D. Cooper, J. E. Sanabia, J. H. Moore, J. K. Olthoff, L. G. Christophorou

J. Chem. Phys. 110, 682–683 (1999)

https://doi.org/10.1063/1.478124

Published: January 1999

View articletitled, Total electron scattering cross section for Cl 2

Journal Articles

Applications of electron-interaction reference data to the semiconductor industry

L. G. Christophorou, J. K. Olthoff

AIP Conf. Proc. 449, 437–441 (1998)

https://doi.org/10.1063/1.56829

Published: November 1998

View articletitled, Applications of electron-interaction reference data to the semiconductor industry

Journal Articles

Electron Interactions With C 3 F 8

L. G. Christophorou, J. K. Olthoff

J. Phys. Chem. Ref. Data 27, 889–913 (1998)

https://doi.org/10.1063/1.556024

Published: September 1998

View articletitled, Electron Interactions With C 3 F 8

Journal Articles

Mass spectrometric measurement of molecular dissociation in inductively coupled plasmas

Yicheng Wang, R. J. Van Brunt, J. K. Olthoff

J. Appl. Phys. 83, 703–708 (1998)

https://doi.org/10.1063/1.366741

Published: January 1998

View articletitled, Mass spectrometric measurement of molecular dissociation in inductively coupled plasmas

Journal Articles

Electron Interactions with C 2 F 6

L. G. Christophorou, J. K. Olthoff

J. Phys. Chem. Ref. Data 27, 1–29 (1998)

https://doi.org/10.1063/1.556016

Published: January 1998

View articletitled, Electron Interactions with C 2 F 6

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Electron Interactions With BCl 3

Measured cross sections and ion energies for a CHF 3 discharge

Ion compositions and energies in inductively coupled plasmas containing SF 6

Electron transport, ionization, and attachment coefficients in C 2 F 4 and C 2 F 4 / Ar mixtures

Electron Interactions With c- C 4 F 8

Comparison of the identities, fluxes, and energies of ions formed in high density fluorocarbon discharges

Ion fluxes and energies in inductively coupled radio-frequency discharges containing CHF 3

Ion fluxes and energies in inductively coupled radio-frequency discharges containing C 2 F 6 and c - C 4 F 8

Electron Interactions With CF 3 I

Electron Interactions With SF 6

Boltzmann analysis of electron swarm parameters in CF 4 using independently assessed electron-collision cross sections

Electron Interactions With Plasma Processing Gases: An Update for CF 4 , CHF 3 , C 2 F 6 , and C 3 F 8

Studies of ion bombardment in high density plasmas containing CF 4

Ion energy distributions in inductively coupled radio-frequency discharges in argon, nitrogen, oxygen, chlorine, and their mixtures

Electron Interactions With Cl₂

Total electron scattering cross section for Cl 2

Applications of electron-interaction reference data to the semiconductor industry

Electron Interactions With C 3 F 8

Mass spectrometric measurement of molecular dissociation in inductively coupled plasmas

Electron Interactions with C 2 F 6

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