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Ivo W. Rangelow
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Journal Articles

Multipurpose active scanning probe cantilevers for near-field spectroscopy, scanning tunnel imaging, and atomic-resolution lithography

Isaac Stricklin, Teodor Gotszalk, Mahmoud Behzadirad, Eberhard Manske, Thomas Kissinger, Ivo W. Rangelow, Tito L. Busani
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 042601 (2023)
https://doi.org/10.1116/6.0002486
Published: June 2023
View article titled, Multipurpose active scanning probe cantilevers for near-field spectroscopy, scanning tunnel imaging, and atomic-resolution lithography
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Journal Articles

Mask-less nano-structuring of hydrogen terminated diamond using localized field emission scanning probe lithography (FE-SPL)

Steve A. Yianni, Martin Hofmann, Alex K. Schenk, Christoph Reuter, Ivo W. Rangelow, Christopher I. Pakes
Journal: Applied Physics Letters
Appl. Phys. Lett. 120, 093503 (2022)
https://doi.org/10.1063/5.0081119
Published: March 2022
View article titled, Mask-less nano-structuring of hydrogen terminated diamond using localized field emission scanning probe lithography (FE-SPL)
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Includes: Supplementary data
Journal Articles

Field emission scanning probe lithography with GaN nanowires on active cantilevers

Mahmoud Behzadirad, Ashwin K. Rishinaramangalam, Daniel Feezell, Tito Busani, Christoph Reuter, Alexander Reum, Mathias Holz, Teodor Gotszalk, Stephan Mechold, Martin Hofmann, Ahmad Ahmad, Tzvetan Ivanov, Ivo W. Rangelow
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 032806 (2020)
https://doi.org/10.1116/1.5137901
Published: May 2020
View article titled, Field emission scanning probe lithography with GaN nanowires on active cantilevers
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Journal Articles

Line edge roughness metrology software

Sertac Guneri Yazgi, Tzvetan Ivanov, Mathias Holz, Ivo W. Rangelow, Burhanettin Erdem Alaca
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 012602 (2020)
https://doi.org/10.1116/1.5122675
Published: December 2019
View article titled, Line edge roughness metrology software
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Journal Articles

Tip-based electron beam induced deposition using active cantilevers

Mathias Holz, Frances I. Allen, Christoph Reuter, Ahmad Ahmad, Martin Hofmann, Alexander Reum, Tzvetan Ivanov, Ivo W. Rangelow
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 061812 (2019)
https://doi.org/10.1116/1.5123287
Published: November 2019
View article titled, Tip-based electron beam induced deposition using active cantilevers
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Journal Articles

Temperature and oxygen concentration effects on anisotropy in chromium hard mask etching for nanoscale fabrication

Daniel Staaks, Zhaoning Yu, Scott D. Dhuey, Simone Sassolini, Kim Y. Lee, Ivo W. Rangelow, Deirdre L. Olynick
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 061306 (2019)
https://doi.org/10.1116/1.5123397
Published: November 2019
View article titled, Temperature and oxygen concentration effects on anisotropy in chromium hard mask etching for nanoscale fabrication
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Includes: Supplementary data
Journal Articles

Nanoscale lift-off process using field emission scanning probe lithography

Martin Hofmann, Stephan Mecholdt, Markus Mohr, Mathias Holz, Stefano Dallorto, Eberhard Manske, Hans-Jörg Fecht, Ivo W. Rangelow
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 061803 (2019)
https://doi.org/10.1116/1.5122272
Published: October 2019
View article titled, Nanoscale lift-off process using field emission scanning probe lithography
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Journal Articles

Balancing ion parameters and fluorocarbon chemical reactants for SiO2 pattern transfer control using fluorocarbon-based atomic layer etching

Stefano Dallorto, Monica Lorenzon, Julia Szornel, Adam Schwartzberg, Andy Goodyear, Mike Cooke, Martin Hofmann, Ivo W. Rangelow, Stefano Cabrini
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 051805 (2019)
https://doi.org/10.1116/1.5120414
Published: September 2019
View article titled, Balancing ion parameters and fluorocarbon chemical reactants for SiO<sub>2</sub> pattern transfer control using fluorocarbon-based atomic layer etching
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Journal Articles

Tip-based nano-manufacturing and -metrology

Editor’s Pick
Teodor Gotszalk, Grzegorz Jóźwiak, Jacek Radojewski, Thomas Fröhlich, Roland Füssl, Eberhard Manske, Mathias Holz, Tzvetan Ivanov, Ahmad Ahmad, Ivo W. Rangelow
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 030803 (2019)
https://doi.org/10.1116/1.5083044
Published: May 2019
View article titled, Tip-based nano-manufacturing and -metrology
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Journal Articles

High-throughput process chain for single electron transistor devices based on field-emission scanning probe lithography and Smart Nanoimprint lithography technology

Claudia Lenk, Yana Krivoshapkina, Martin Hofmann, Steve Lenk, Tzvetan Ivanov, Ivo W. Rangelow, Ahmad Ahmad, Alexander Reum, Mathias Holz, Thomas Glinsner, Martin Eibelhuber, Dominik Treiblmayr, Barbara Schamberger, Mustapha Chouiki, Boon Teik Chan, Ziad el Otell, Jean-François de Marneffe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 021603 (2019)
https://doi.org/10.1116/1.5067269
Published: February 2019
View article titled, High-throughput process chain for single electron transistor devices based on field-emission scanning probe lithography and Smart Nanoimprint lithography technology
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Journal Articles

Field-emission scanning probe lithography tool for 150 mm wafer

Mathias Holz, Elshad Guliyev, Ahmad Ahmad, Tzvetan Ivanov, Alexander Reum, Martin Hofmann, Claudia Lenk, Marcus Kaestner, Christoph Reuter, Steve Lenk, Ivo W. Rangelow, Nikolay Nikolov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06JL06 (2018)
https://doi.org/10.1116/1.5048357
Published: October 2018
View article titled, Field-emission scanning probe lithography tool for 150 mm wafer
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Journal Articles

Sharp GaN nanowires used as field emitter on active cantilevers for scanning probe lithography

Claudia Lenk, Martin Hofmann, Tzvetan Ivanov, Ahmad Ahmad, Steve Lenk, Ivo W. Rangelow, Alexander Reum, Christoph Reuter, Mathias Holz, Mahmoud Behzadirad, Ashwin K. Rishinaramangalam, Daniel Feezell, Tito Busani
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06JL04 (2018)
https://doi.org/10.1116/1.5048190
Published: October 2018
View article titled, Sharp GaN nanowires used as field emitter on active cantilevers for scanning probe lithography
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Journal Articles

Experimental study of field emission from ultrasharp silicon, diamond, GaN, and tungsten tips in close proximity to the counter electrode

Claudia Lenk, Steve Lenk, Mathias Holz, Elshad Guliyev, Martin Hofmann, Tzvetan Ivanov, Ivo W. Rangelow, Mahmoud Behzadirad, Ashwin K. Rishinaramangalam, Daniel Feezell, Tito Busani
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06JL03 (2018)
https://doi.org/10.1116/1.5048518
Published: October 2018
View article titled, Experimental study of field emission from ultrasharp silicon, diamond, GaN, and tungsten tips in close proximity to the counter electrode
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Journal Articles

Atomic force microscope integrated with a scanning electron microscope for correlative nanofabrication and microscopy

Ivo W. Rangelow, Marcus Kaestner, Tzvetan Ivanov, Ahmad Ahmad, Steve Lenk, Claudia Lenk, Elshad Guliyev, Alexander Reum, Martin Hofmann, Christoph Reuter, Mathias Holz
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06J102 (2018)
https://doi.org/10.1116/1.5048524
Published: October 2018
View article titled, Atomic force microscope integrated with a scanning electron microscope for correlative nanofabrication and microscopy
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Journal Articles

Room-temperature single dopant atom quantum dot transistors in silicon, formed by field-emission scanning probe lithography

Zahid Durrani, Mervyn Jones, Faris Abualnaja, Chen Wang, Marcus Kaestner, Steve Lenk, Claudia Lenk, Ivo W. Rangelow, Aleksey Andreev
Journal: Journal of Applied Physics
J. Appl. Phys. 124, 144502 (2018)
https://doi.org/10.1063/1.5050773
Published: October 2018
View article titled, Room-temperature single dopant atom quantum dot transistors in silicon, formed by field-emission scanning probe lithography
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Journal Articles

Field emission from diamond nanotips for scanning probe lithography

Martin Hofmann, Claudia Lenk, Tzvetan Ivanov, Ivo W. Rangelow, Alexander Reum, Ahmad Ahmad, Mathias Holz, Eberhard Manske
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06JL02 (2018)
https://doi.org/10.1116/1.5048193
Published: October 2018
View article titled, Field emission from diamond nanotips for scanning probe lithography
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Journal Articles

Theoretical investigation of the enhancement factor for a single field emitter in close proximity to the counter electrode

Steve Lenk, Claudia Lenk, Ivo W. Rangelow
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06JL01 (2018)
https://doi.org/10.1116/1.5046940
Published: September 2018
View article titled, Theoretical investigation of the enhancement factor for a single field emitter in close proximity to the counter electrode
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Journal Articles

Review Article: Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication

Featured
Ivo W. Rangelow, Tzvetan Ivanov, Ahmad Ahmad, Marcus Kaestner, Claudia Lenk, Iman S. Bozchalooi, Fangzhou Xia, Kamal Youcef-Toumi, Mathias Holz, Alexander Reum
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 06G101 (2017)
https://doi.org/10.1116/1.4992073
Published: November 2017
View article titled, Review Article: Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication
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Journal Articles

Large area fast-AFM scanning with active “Quattro” cantilever arrays

Ahmad Ahmad, Nikolay Nikolov, Tihomir Angelov, Tzvetan Ivanov, Alexander Reum, Ivaylo Atanasov, Elshad Guliyev, Valentyn Ishchuk, Marcus Kaestner, Yana Krivoshapkina, Steve Lenk, Claudia Lenk, Ivo W. Rangelow, Mathias Holz
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06KM03 (2016)
https://doi.org/10.1116/1.4967159
Published: November 2016
View article titled, Large area fast-AFM scanning with active “Quattro” cantilever arrays
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Journal Articles

Pattern-generation and pattern-transfer for single-digit nano devices

Ivo W. Rangelow, Ahmad Ahmad, Tzvetan Ivanov, Marcus Kaestner, Yana Krivoshapkina, Tihomir Angelov, Steve Lenk, Claudia Lenk, Valentyn Ishchuk, Martin Hofmann, Diana Nechepurenko, Ivaylo Atanasov, Burkhard Volland, Elshad Guliyev, Zahid Durrani, Mervyn Jones, Chen Wang, Dixi Liu, Alexander Reum, Mathias Holz, Nikolay Nikolov, Wojciech Majstrzyk, Teodor Gotszalk, Daniel Staaks, Stefano Dallorto, Deirdre L. Olynick
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06K202 (2016)
https://doi.org/10.1116/1.4966556
Published: November 2016
View article titled, Pattern-generation and pattern-transfer for single-digit nano devices
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