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Journal Articles

Via resistance and reliability trends in copper interconnects with ultra-scaled barrier layers

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Nicholas A. Lanzillo, Koichi Motoyama, Huai Huang, Robert R. Robison, Terry Spooner
Journal: Applied Physics Letters
Appl. Phys. Lett. 116, 164103 (2020)
https://doi.org/10.1063/5.0005428
Published: April 2020
View article titled, Via resistance and reliability trends in copper interconnects with ultra-scaled barrier layers
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Journal Articles

SFG analysis of the molecular structures at the surfaces and buried interfaces of PECVD ultralow-dielectric constant pSiCOH: Reactive ion etching and dielectric recovery

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John N. Myers, Xiaoxian Zhang, Huai Huang, Hosadurga Shobha, Alfred Grill, Zhan Chen
Journal: Applied Physics Letters
Appl. Phys. Lett. 110, 182902 (2017)
https://doi.org/10.1063/1.4982654
Published: May 2017
View article titled, SFG analysis of the molecular structures at the surfaces and buried interfaces of PECVD ultralow-dielectric constant pSiCOH: Reactive ion etching and dielectric recovery
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Journal Articles

Advanced single precursor based pSiCOH k = 2.4 for ULSI interconnects

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Deepika Priyadarshini, Son V. Nguyen, Hosadurga Shobha, Eric Liniger, James H.-C. Chen, Huai Huang, Stephan A. Cohen, Alfred Grill
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 021201 (2017)
https://doi.org/10.1116/1.4974317
Published: January 2017
View article titled, Advanced single precursor based pSiCOH k = 2.4 for ULSI interconnects
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Journal Articles

SFG analysis of the molecular structures at the surfaces and buried interfaces of PECVD ultralow-dielectric constant pSiCOH

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Xiaoxian Zhang, John N. Myers, Huai Huang, Hosadurga Shobha, Zhan Chen, Alfred Grill
Journal: Journal of Applied Physics
J. Appl. Phys. 119, 084101 (2016)
https://doi.org/10.1063/1.4942442
Published: February 2016
View article titled, SFG analysis of the molecular structures at the surfaces and buried interfaces of PECVD ultralow-dielectric constant pSiCOH
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Journal Articles

Plasma processing of low-k dielectrics

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Mikhail R. Baklanov, Jean-Francois de Marneffe, Denis Shamiryan, Adam M. Urbanowicz, Hualiang Shi, Tatyana V. Rakhimova, Huai Huang, Paul S. Ho
Journal: Journal of Applied Physics
J. Appl. Phys. 113, 041101 (2013)
https://doi.org/10.1063/1.4765297
Published: January 2013
View article titled, Plasma processing of low-k dielectrics
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Journal Articles

Role of ions, photons, and radicals in inducing plasma damage to ultra low-k dielectrics

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Hualiang Shi, Huai Huang, Junjing Bao, Junjun Liu, Paul S. Ho, Yifeng Zhou, Jeremy T. Pender, Michael D. Armacost, David Kyser
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 011206 (2012)
https://doi.org/10.1116/1.3671008
Published: December 2011
View article titled, Role of ions, photons, and radicals in inducing plasma damage to ultra low-k dielectrics
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Journal Articles

Nanoindentation of Si Nanostructures: Buckling and Friction at Nanoscales

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Huai Huang, Bin Li, Qiu Zhao, Zhiquan Luo, Jay Im, Min K. Kang, Richard A. Allen, Michael W. Cresswell, Rui Huang, Paul S. Ho
Journal: AIP Conference Proceedings
AIP Conf. Proc. 1143, 204–212 (2009)
https://doi.org/10.1063/1.3169260
Published: June 2009
View article titled, Nanoindentation of Si Nanostructures: Buckling and Friction at Nanoscales
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Journal Articles

Indentation of single-crystal silicon nanolines: Buckling and contact friction at nanoscales

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Bin Li, Qiu Zhao, Huai Huang, Zhiquan Luo, Min K. Kang, Jang-Hi Im, Richard A. Allen, Michael W. Cresswell, Rui Huang, Paul S. Ho
Journal: Journal of Applied Physics
J. Appl. Phys. 105, 073510 (2009)
https://doi.org/10.1063/1.3103251
Published: April 2009
View article titled, Indentation of single-crystal silicon nanolines: Buckling and contact friction at nanoscales
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Journal Articles

Mechanistic Study of Plasma Damage of Low k Dielectric Surfaces

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Junjing Bao, Hualiang Shi, Junjun Liu, Huai Huang, P. S. Ho, M. D. Goodner, M. Moinpour, G. M. Kloster
Journal: AIP Conference Proceedings
AIP Conf. Proc. 945, 125–141 (2007)
https://doi.org/10.1063/1.2815773
Published: October 2007
View article titled, Mechanistic Study of Plasma Damage of Low k Dielectric Surfaces
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Journal Articles

Effect of Ammonia Thermal Treatment on the Structure and Activity of Titanium Oxide Photocatalysts

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Yu-chao Tang, Xian-huai Huang, Han-qing Yu, Chun Hu
Journal: Chinese Journal of Chemical Physics
Chin. J. Chem. Phys. 19, 355–361 (2006)
https://doi.org/10.1360/cjcp2006.19(4).355.7
Published: August 2006
View article titled, Effect of Ammonia Thermal Treatment on the Structure and Activity of Titanium Oxide Photocatalysts
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