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Hong-Young Chang
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Journal Articles

Effect of mixing CF4 with O2 on electron characteristics of capacitively coupled plasma

Youbin Seol (설유빈), Hong Young Chang (장홍영), Seung Kyu Ahn (안승규), Shin Jae You (유신재)
Journal: Physics of Plasmas
Phys. Plasmas 30, 013503 (2023)
https://doi.org/10.1063/5.0120850
Published: January 2023
View article titled, Effect of mixing CF<sub>4</sub> with O<sub>2</sub> on electron characteristics of capacitively coupled plasma
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Journal Articles

Study on characteristics of electron parameters on inert gas addition in a capacitively coupled SF6/O2 plasma

Youbin Seol (설유빈), Hong Young Chang (장홍영), Seung Kyu Ahn (안승규), Shin Jae You (유신재)
Journal: AIP Advances
AIP Advances 12, 125117 (2022)
https://doi.org/10.1063/5.0127857
Published: December 2022
View article titled, Study on characteristics of electron parameters on inert gas addition in a capacitively coupled SF<sub>6</sub>/O<sub>2</sub> plasma
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Journal Articles

On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes

Jin-Won Lee, Yun-Seong Lee, Hong-Young Chang, Sang-Hyuk An
Journal: Physics of Plasmas
Phys. Plasmas 21, 083502 (2014)
https://doi.org/10.1063/1.4892170
Published: August 2014
View article titled, On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes
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Journal Articles

Computational characterization of cutoff probe system for the measurement of electron density

Byung-Keun Na, Dae-Woong Kim, Jun-Hyuk Kwon, Hong-Young Chang, Jung-Hyung Kim, Shin-Jae You
Journal: Physics of Plasmas
Phys. Plasmas 19, 053504 (2012)
https://doi.org/10.1063/1.4719699
Published: May 2012
View article titled, Computational characterization of cutoff probe system for the measurement of electron density
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Journal Articles

Cutoff probe using Fourier analysis for electron density measurement

Byung-Keun Na, Kwang-Ho You, Dae-Woong Kim, Hong-Young Chang, Shin-Jae You, Jung-Hyung Kim
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 83, 013510 (2012)
https://doi.org/10.1063/1.3680103
Published: January 2012
View article titled, Cutoff probe using Fourier analysis for electron density measurement
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Journal Articles

Anomalous evolution of Ar metastable density with electron density in high density Ar discharge

Min Park, Hong-Young Chang, Shin-Jae You, Jung-Hyung Kim, Yong-Hyeon Shin
Journal: Physics of Plasmas
Phys. Plasmas 18, 103510 (2011)
https://doi.org/10.1063/1.3640518
Published: October 2011
View article titled, Anomalous evolution of Ar metastable density with electron density in high density Ar discharge
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Journal Articles

Pressure limitation of electron density measurement using a wave-cutoff method in weakly ionized plasmas

Hyun-Su Jun, Yun-Seong Lee, Byung-Keun Na, Hong-Young Chang
Journal: Physics of Plasmas
Phys. Plasmas 15, 124504 (2008)
https://doi.org/10.1063/1.3054542
Published: December 2008
View article titled, Pressure limitation of electron density measurement using a wave-cutoff method in weakly ionized plasmas
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Journal Articles

Development of 40 MHz inductively coupled plasma source and frequency effects on plasma parameters

Hyun-Su Jun, Hong-Young Chang
Journal: Applied Physics Letters
Appl. Phys. Lett. 92, 041501 (2008)
https://doi.org/10.1063/1.2838306
Published: January 2008
View article titled, Development of 40 MHz inductively coupled plasma source and frequency effects on plasma parameters
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Journal Articles

Wave transmission characteristics of a wave-cutoff probe in weakly ionized plasmas

Hyun-Su Jun, Byung-Keun Na, Hong-Young Chang, Jung-Hyung Kim
Journal: Physics of Plasmas
Phys. Plasmas 14, 093506 (2007)
https://doi.org/10.1063/1.2772602
Published: September 2007
View article titled, Wave transmission characteristics of a wave-cutoff probe in weakly ionized plasmas
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Includes: Supplementary data
Journal Articles

Efficient electron heating in short-pulsed magnetron discharges

Sang-Hun Seo, Jung-Hwan In, Hong-Young Chang
Journal: Journal of Applied Physics
J. Appl. Phys. 98, 083302 (2005)
https://doi.org/10.1063/1.2102072
Published: October 2005
View article titled, Efficient electron heating in short-pulsed magnetron discharges
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Journal Articles

Time evolution of electron energy distribution function and plasma parameters in pulsed and unbalanced magnetron argon discharge

Sang-Hun Seo, Jung-Hwan In, Hong-Young Chang, Jeon-Geon Han
Journal: Journal of Applied Physics
J. Appl. Phys. 98, 043301 (2005)
https://doi.org/10.1063/1.1990264
Published: August 2005
View article titled, Time evolution of electron energy distribution function and plasma parameters in pulsed and unbalanced magnetron argon discharge
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Journal Articles

Effect of duty cycle on plasma parameters in the pulsed dc magnetron argon discharge

Sang-Hun Seo, Jung-Hwan In, Hong-Young Chang, Jeon-Geon Han
Journal: Applied Physics Letters
Appl. Phys. Lett. 86, 262103 (2005)
https://doi.org/10.1063/1.1946900
Published: June 2005
View article titled, Effect of duty cycle on plasma parameters in the pulsed dc magnetron argon discharge
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Journal Articles

Characterization of pulsed plasma in unbalanced magnetron argon discharge

Sang-Won Lee, Sang-Hun Seo, Jung-Hwan In, Chin-Wook Chung, Hong-Young Chang
Journal: Physics of Plasmas
Phys. Plasmas 12, 063502 (2005)
https://doi.org/10.1063/1.1924709
Published: June 2005
View article titled, Characterization of pulsed plasma in unbalanced magnetron argon discharge
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Journal Articles

Electron drift and the loss balance of charged particles in planar-unbalanced dc magnetron discharge

Sang-Hun Seo, Jung-Hwan In, Hong-Young Chang
Journal: Journal of Applied Physics
J. Appl. Phys. 97, 023305 (2005)
https://doi.org/10.1063/1.1834709
Published: December 2004
View article titled, Electron drift and the loss balance of charged particles in planar-unbalanced dc magnetron discharge
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Journal Articles

Effects of substrate bias on electron energy distribution in magnetron sputtering system

Sang-Hun Seo, Jung-Hwan In, Hong-Young Chang, Jeon-Geon Han
Journal: Physics of Plasmas
Phys. Plasmas 11, 4796–4800 (2004)
https://doi.org/10.1063/1.1786592
Published: October 2004
View article titled, Effects of substrate bias on electron energy distribution in magnetron sputtering system
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Journal Articles

On a dual inductively coupled plasma for direct and remote plasma in a reactor

Saehoon Uhm, Kyong-Ho Lee, Hong Young Chang, Chin Wook Chung
Journal: Physics of Plasmas
Phys. Plasmas 11, 4830–4836 (2004)
https://doi.org/10.1063/1.1789997
Published: October 2004
View article titled, On a dual inductively coupled plasma for direct and remote plasma in a reactor
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Journal Articles

Electron transport in the downstream region of planar unbalanced magnetron discharge

Sang-Hun Seo, Hong-Young Chang
Journal: Journal of Applied Physics
J. Appl. Phys. 96, 1310–1317 (2004)
https://doi.org/10.1063/1.1767620
Published: August 2004
View article titled, Electron transport in the downstream region of planar unbalanced magnetron discharge
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Journal Articles

Effects of a sheath boundary on electron energy distribution in Ar/He dc magnetron discharges

Sang-Hun Seo, Jung-Hwan In, Hong-Young Chang
Journal: Journal of Applied Physics
J. Appl. Phys. 96, 57–64 (2004)
https://doi.org/10.1063/1.1755850
Published: July 2004
View article titled, Effects of a sheath boundary on electron energy distribution in Ar/He dc magnetron discharges
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Journal Articles

Anomalous behaviors of plasma parameters in unbalanced direct-current magnetron discharge

Sang-Hun Seo, Hong-Young Chang
Journal: Physics of Plasmas
Phys. Plasmas 11, 3595–3601 (2004)
https://doi.org/10.1063/1.1759629
Published: July 2004
View article titled, Anomalous behaviors of plasma parameters in unbalanced direct-current magnetron discharge
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Journal Articles

Rotating plasma discharges of high-pressure molecular vapor using circularly polarized microwaves

Jin Joong Kim, Jung Tae Ko, Dong Ho Won, Jeong Won Kim, S. S. Kim, Hong-Young Chang
Journal: Applied Physics Letters
Appl. Phys. Lett. 84, 2769–2771 (2004)
https://doi.org/10.1063/1.1690871
Published: April 2004
View article titled, Rotating plasma discharges of high-pressure molecular vapor using circularly polarized microwaves
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