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Hiroki Kondo
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Journal Articles

In situ atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching

Editor’s Pick
Takayoshi Tsutsumi, Atsuki Asano, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032603 (2024)
https://doi.org/10.1116/6.0003432
Published: April 2024
View article titled, <em>In situ</em> atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching
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Journal Articles

In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicals

Editor’s Pick
Masaki Hasegawa, Takayoshi Tsutsumi, Atsushi Tanide, Shohei Nakamura, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 042602 (2020)
https://doi.org/10.1116/6.0000124
Published: June 2020
View article titled, <em>In situ</em> surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar<sup>+</sup> ions and Cl radicals
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Journal Articles

Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study

Yusuke Fukunaga, Roberto C. Longo, Peter L. G. Ventzek, Barton Lane, Alok Ranjan, Gyeong S. Hwang, Gregory Hartmann, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori
Journal: Journal of Applied Physics
J. Appl. Phys. 127, 023303 (2020)
https://doi.org/10.1063/1.5127863
Published: January 2020
View article titled, Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study
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Journal Articles

Simulation-aided design of very-high-frequency excited nitrogen plasma confinement using a shield plate

Yasuhiro Isobe, Takayuki Sakai, Kyoichi Suguro, Naoto Miyashita, Hiroki Kondo, Kenji Ishikawa, Amalraj Frank Wilson, Naohiro Shimizu, Osamu Oda, Makoto Sekine, Masaru Hori
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 061215 (2019)
https://doi.org/10.1116/1.5114831
Published: December 2019
View article titled, Simulation-aided design of very-high-frequency excited nitrogen plasma confinement using a shield plate
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Journal Articles

Effects of plasma shield plate design on epitaxial GaN films grown for large-sized wafers in radical-enhanced metalorganic chemical vapor deposition

Yasuhiro Isobe, Takayuki Sakai, Naoharu Sugiyama, Ichiro Mizushima, Kyoichi Suguro, Naoto Miyashita, Yi Lu, Amalraj Frank Wilson, Dhasiyan Arun Kumar, Nobuyuki Ikarashi, Hiroki Kondo, Kenji Ishikawa, Naohiro Shimizu, Osamu Oda, Makoto Sekine, Masaru Hori
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 031201 (2019)
https://doi.org/10.1116/1.5083970
Published: April 2019
View article titled, Effects of plasma shield plate design on epitaxial GaN films grown for large-sized wafers in radical-enhanced metalorganic chemical vapor deposition
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Journal Articles

Effect of N2/H2 plasma on GaN substrate cleaning for homoepitaxial GaN growth by radical-enhanced metalorganic chemical vapor deposition (REMOCVD)

Frank Wilson Amalraj, Arun Kumar Dhasiyan, Yi Lu, Naohiro Shimizu, Osamu Oda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Nobuyuki Ikarashi, Masaru Hori
Journal: AIP Advances
AIP Advances 8, 115116 (2018)
https://doi.org/10.1063/1.5050819
Published: November 2018
View article titled, Effect of N<sub>2</sub>/H<sub>2</sub> plasma on GaN substrate cleaning for homoepitaxial GaN growth by radical-enhanced metalorganic chemical vapor deposition (REMOCVD)
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Journal Articles

Dynamic analysis of reactive oxygen nitrogen species in plasma-activated culture medium by UV absorption spectroscopy

Timothy R. Brubaker, Kenji Ishikawa, Keigo Takeda, Jun-Seok Oh, Hiroki Kondo, Hiroshi Hashizume, Hiromasa Tanaka, Sean D. Knecht, Sven G. Bilén, Masaru Hori
Journal: Journal of Applied Physics
J. Appl. Phys. 122, 213301 (2017)
https://doi.org/10.1063/1.4999256
Published: December 2017
View article titled, Dynamic analysis of reactive oxygen nitrogen species in plasma-activated culture medium by UV absorption spectroscopy
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Journal Articles

Surface roughening of photoresist after change of the photon/radical and ion treatment sequence

Yan Zhang, Takuya Takeuchi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 060606 (2017)
https://doi.org/10.1116/1.4994218
Published: September 2017
View article titled, Surface roughening of photoresist after change of the photon/radical and ion treatment sequence
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Journal Articles

Lipid droplets exhaustion with caspases activation in HeLa cells cultured in plasma-activated medium observed by multiplex coherent anti-Stokes Raman scattering microscopy

Ryo Furuta, Naoyuki Kurake, Keigo Takeda, Kenji Ishikawa, Takayuki Ohta, Masafumi Ito, Hiroshi Hashizume, Hiromasa Tanaka, Hiroki Kondo, Makoto Sekine, Masaru Hori
Journal: Biointerphases
Biointerphases 12, 031006 (2017)
https://doi.org/10.1116/1.4997170
Published: August 2017
View article titled, Lipid droplets exhaustion with caspases activation in HeLa cells cultured in plasma-activated medium observed by multiplex coherent anti-Stokes Raman scattering microscopy
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Journal Articles

Absolute density of precursor SiH3 radicals and H atoms in H2-diluted SiH4 gas plasma for deposition of microcrystalline silicon films

Yusuke Abe, Kenji Ishikawa, Keigo Takeda, Takayoshi Tsutsumi, Atsushi Fukushima, Hiroki Kondo, Makoto Sekine, Masaru Hori
Journal: Applied Physics Letters
Appl. Phys. Lett. 110, 043902 (2017)
https://doi.org/10.1063/1.4974821
Published: January 2017
View article titled, Absolute density of precursor SiH<sub>3</sub> radicals and H atoms in H<sub>2</sub>-diluted SiH<sub>4</sub> gas plasma for deposition of microcrystalline silicon films
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Journal Articles

Atomic layer etching of SiO2 by alternating an O2 plasma with fluorocarbon film deposition

Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Masaru Zaitsu, Akiko Kobayashi, Toshihisa Nozawa, Nobuyoshi Kobayashi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01A103 (2017)
https://doi.org/10.1116/1.4971171
Published: November 2016
View article titled, Atomic layer etching of SiO<sub>2</sub> by alternating an O<sub>2</sub> plasma with fluorocarbon film deposition
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Journal Articles

Carbon nanowall scaffold to control culturing of cervical cancer cells

Hitoshi Watanabe, Hiroki Kondo, Yukihiro Okamoto, Mineo Hiramatsu, Makoto Sekine, Yoshinobu Baba, Masaru Hori
Journal: Applied Physics Letters
Appl. Phys. Lett. 105, 244105 (2014)
https://doi.org/10.1063/1.4902054
Published: December 2014
View article titled, Carbon nanowall scaffold to control culturing of cervical cancer cells
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Journal Articles

Rapid measurement of substrate temperatures by frequency-domain low-coherence interferometry

Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, Masafumi Ito
Journal: Applied Physics Letters
Appl. Phys. Lett. 103, 182102 (2013)
https://doi.org/10.1063/1.4827426
Published: October 2013
View article titled, Rapid measurement of substrate temperatures by frequency-domain low-coherence interferometry
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Journal Articles

Impact of hydrogen radical-injection plasma on fabrication of microcrystalline silicon thin film for solar cells

Yusuke Abe, Sho Kawashima, Atsushi Fukushima, Ya Lu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori
Journal: Journal of Applied Physics
J. Appl. Phys. 113, 033304 (2013)
https://doi.org/10.1063/1.4778608
Published: January 2013
View article titled, Impact of hydrogen radical-injection plasma on fabrication of microcrystalline silicon thin film for solar cells
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Journal Articles

Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment

Takuya Takeuchi, Carles Corbella, Simon Grosse-Kreul, Achim von Keudell, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Masaru Hori
Journal: Journal of Applied Physics
J. Appl. Phys. 113, 014306 (2013)
https://doi.org/10.1063/1.4772996
Published: January 2013
View article titled, Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment
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Journal Articles

Surface loss probability of H radicals on silicon thin films in SiH4/H2 plasma

Yusuke Abe (阿部祐介), Atsushi Fukushima (福島敦史), Keigo Takeda (竹田圭吾), Hiroki Kondo (近藤博基), Kenji Ishikawa (石川健治), Makoto Sekine (関根誠), Masaru Hori (堀勝)
Journal: Journal of Applied Physics
J. Appl. Phys. 113, 013303 (2013)
https://doi.org/10.1063/1.4773104
Published: January 2013
View article titled, Surface loss probability of H radicals on silicon thin films in SiH<sub>4</sub>/H<sub>2</sub> plasma
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Journal Articles

Critical flux ratio of hydrogen radical to film precursor in microcrystalline silicon deposition for solar cells

Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori
Journal: Applied Physics Letters
Appl. Phys. Lett. 101, 172109 (2012)
https://doi.org/10.1063/1.4764065
Published: October 2012
View article titled, Critical flux ratio of hydrogen radical to film precursor in microcrystalline silicon deposition for solar cells
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Journal Articles

Real-time in situ electron spin resonance measurements on fungal spores of Penicillium digitatum during exposure of oxygen plasmas

Kenji Ishikawa, Hiroko Mizuno, Hiromasa Tanaka, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori
Journal: Applied Physics Letters
Appl. Phys. Lett. 101, 013704 (2012)
https://doi.org/10.1063/1.4733387
Published: July 2012
View article titled, Real-time <em>in situ</em> electron spin resonance measurements on fungal spores of <em>Penicillium digitatum</em> during exposure of oxygen plasmas
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Journal Articles

Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature

Shang Chen, Yi Lu, Ryosuke Kometani, Kenji Ishikawa, Hiroki Kondo, Yutaka Tokuda, Makoto Sekine, Masaru Hori
Journal: AIP Advances
AIP Advances 2, 022149 (2012)
https://doi.org/10.1063/1.4729448
Published: June 2012
View article titled, Photoluminescence recovery by <em>in-situ</em> exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature
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Journal Articles

Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma

Sachiko Iseki, Kae Nakamura, Moemi Hayashi, Hiromasa Tanaka, Hiroki Kondo, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, Masaru Hori
Journal: Applied Physics Letters
Appl. Phys. Lett. 100, 113702 (2012)
https://doi.org/10.1063/1.3694928
Published: March 2012
View article titled, Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma
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Includes: Supplementary data