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Hideo Yoshihara
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Journal Articles

Highly accurate x-ray masks with 100-nm-class high-density device patterns

Shingo Uchiyama, Masaru Shimada, Tai Tsuchizawa, Takashi Ohkubo, Masatoshi Oda, Hideo Yoshihara
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 18, 2990–2994 (2000)
https://doi.org/10.1116/1.1321763
Published: November 2000
View article titled, Highly accurate x-ray masks with 100-nm-class high-density device patterns
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Journal Articles

Progress in x-ray mask technology at NTT

Masatoshi Oda, Masaru Shimada, Tai Tsuchizawa, Shingo Uchiyama, Ikuo Okada, Hideo Yoshihara
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 3402–3406 (1999)
https://doi.org/10.1116/1.591019
Published: November 1999
View article titled, Progress in x-ray mask technology at NTT
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Journal Articles

Extendibility of synchrotron radiation lithography to the sub‐100 nm region

Kimiyoshi Deguchi, Kazunori Miyoshi, Masatoshi Oda, Tadahito Matsuda, Akira Ozawa, Hideo Yoshihara
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 14, 4294–4297 (1996)
https://doi.org/10.1116/1.588593
Published: November 1996
View article titled, Extendibility of synchrotron radiation lithography to the sub‐100 nm region
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Journal Articles

Electron cyclotron resonance ion stream etching of tantalum for x‐ray mask absorber

Masatoshi Oda, Akira Ozawa, Hideo Yoshihara
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 11, 37–43 (1993)
https://doi.org/10.1116/1.586723
Published: January 1993
View article titled, Electron cyclotron resonance ion stream etching of tantalum for x‐ray mask absorber
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Journal Articles

Highly reflective x‐ray mirror

Sei‐ichi Itabashi, Ikuo Okada, Takashi Kaneko, Seitaro Matsuo, Hideo Yoshihara
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 10, 3312–3317 (1992)
https://doi.org/10.1116/1.577817
Published: September 1992
View article titled, Highly reflective x‐ray mirror
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Journal Articles

High efficiency beamline for synchrotron radiation lithography

Takashi Kaneko, Yasunao Saitoh, Seiichi Itabashi, Hideo Yoshihara
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 9, 3214–3217 (1991)
https://doi.org/10.1116/1.585289
Published: November 1991
View article titled, High efficiency beamline for synchrotron radiation lithography
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Journal Articles

X‐ray mask distortion analysis using the boundary element method

Shigehisa Ohki, Hideo Yoshihara
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 8, 446–451 (1990)
https://doi.org/10.1116/1.585042
Published: May 1990
View article titled, X‐ray mask distortion analysis using the boundary element method
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Journal Articles

X‐ray spectra in a gas puff plasma x‐ray source for x‐ray lithography

Seiichi Itabashi, Ikuo Okada, Yasunao Saitoh, Hideo Yoshihara
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 633–639 (1989)
https://doi.org/10.1116/1.584620
Published: July 1989
View article titled, X‐ray spectra in a gas puff plasma x‐ray source for x‐ray lithography
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Journal Articles

Submicron pattern replication using a high contrast mask and two‐layer resist in x‐ray lithography

Yasunao Saitoh, Hideo Yoshihara, Iwao Watanabe, Satoshi Nakayama
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 2, 63–67 (1984)
https://doi.org/10.1116/1.582917
Published: January 1984
View article titled, Submicron pattern replication using a high contrast mask and two‐layer resist in x‐ray lithography
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Journal Articles

Silicon nitride single‐layer x‐ray mask

Misao Sekimoto, Hideo Yoshihara, Takashi Ohkubo
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 1017–1021 (1982)
https://doi.org/10.1116/1.571854
Published: November 1982
View article titled, Silicon nitride single‐layer x‐ray mask
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Journal Articles

Enhanced ARE apparatus and TiN synthesis

Hideo Yoshihara, Hidefumi Mori
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 16, 1007–1012 (1979)
https://doi.org/10.1116/1.570130
Published: July 1979
View article titled, Enhanced ARE apparatus and TiN synthesis
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Journal Articles

Collisionless Plasma Shock Waves

Hideo Yoshihara
Journal: The Physics of Fluids
Phys. Fluids 4, 1361–1365 (1961)
https://doi.org/10.1063/1.1706225
Published: November 1961
View article titled, Collisionless Plasma Shock Waves
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Journal Articles

Motion of Thin Bodies in a Highly Rarefied Plasma

Hideo Yoshihara
Journal: The Physics of Fluids
Phys. Fluids 4, 100–104 (1961)
https://doi.org/10.1063/1.1706168
Published: January 1961
View article titled, Motion of Thin Bodies in a Highly Rarefied Plasma
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