1-20 of 33
Henrik Pedersen
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Plasma electron characterization in electron chemical vapor deposition

Pentti Niiranen, Anna Kapran, Hama Nadhom, Martin Čada, Zdeněk Hubička, Henrik Pedersen, Daniel Lundin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023006 (2024)
https://doi.org/10.1116/6.0003408
Published: February 2024
View article titled, Plasma electron characterization in electron chemical vapor deposition
Open the PDF for Plasma electron characterization in electron chemical vapor deposition in another window
Journal Articles

Chemical vapor deposition of amorphous boron carbide coatings from mixtures of trimethylboron and triethylboron

Editor’s Pick
Laurent Souqui, Hans Högberg, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063412 (2023)
https://doi.org/10.1116/6.0003001
Published: November 2023
View article titled, Chemical vapor deposition of amorphous boron carbide coatings from mixtures of trimethylboron and triethylboron
Open the PDF for Chemical vapor deposition of amorphous boron carbide coatings from mixtures of trimethylboron and triethylboron in another window
Includes: Supplementary data
Journal Articles

Engineering inorganic interfaces using molecular nanolayers

Featured
Ganpati Ramanath, Collin Rowe, Geetu Sharma, Venkat Venkataramani, Johan G. Alauzun, Ravishankar Sundararaman, Pawel Keblinski, Davide G. Sangiovanni, Per Eklund, Henrik Pedersen
Journal: Applied Physics Letters
Appl. Phys. Lett. 122, 260502 (2023)
https://doi.org/10.1063/5.0146122
Published: June 2023
View article titled, Engineering inorganic interfaces using molecular nanolayers
Open the PDF for Engineering inorganic interfaces using molecular nanolayers in another window
Journal Articles

Thermal decomposition of trimethylindium and indium trisguanidinate precursors for InN growth: An ab initio and kinetic modeling study

Giane B. Damas, Karl Rönnby, Henrik Pedersen, Lars Ojamäe
Journal: The Journal of Chemical Physics
J. Chem. Phys. 158, 174313 (2023)
https://doi.org/10.1063/5.0148070
Published: May 2023
View article titled, Thermal decomposition of trimethylindium and indium trisguanidinate precursors for InN growth: An <em>ab initio</em> and kinetic modeling study
Open the PDF for Thermal decomposition of trimethylindium and indium trisguanidinate precursors for InN growth: An <em>ab initio</em> and kinetic modeling study in another window
Includes: Supplementary data
Journal Articles

Superconformal silicon carbide coatings via precursor pulsed chemical vapor deposition

Jing-Jia Huang, Christian Militzer, Charles A. Wijayawardhana, Urban Forsberg, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 030403 (2023)
https://doi.org/10.1116/6.0002461
Published: April 2023
View article titled, Superconformal silicon carbide coatings via precursor pulsed chemical vapor deposition
Open the PDF for Superconformal silicon carbide coatings via precursor pulsed chemical vapor deposition in another window
Journal Articles

On the limitations of thermal atomic layer deposition of InN using ammonia

Editor’s Pick
Karl Rönnby, Henrik Pedersen, Lars Ojamäe
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 020401 (2023)
https://doi.org/10.1116/6.0002355
Published: February 2023
View article titled, On the limitations of thermal atomic layer deposition of InN using ammonia
Open the PDF for On the limitations of thermal atomic layer deposition of InN using ammonia in another window
Includes: Supplementary data
Journal Articles

Biased quartz crystal microbalance method for studies of chemical vapor deposition surface chemistry induced by plasma electrons

Pentti Niiranen, Hama Nadhom, Michal Zanáška, Robert Boyd, Mauricio Sortica, Daniel Primetzhofer, Daniel Lundin, Henrik Pedersen
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 94, 023902 (2023)
https://doi.org/10.1063/5.0122143
Published: February 2023
View article titled, Biased quartz crystal microbalance method for studies of chemical vapor deposition surface chemistry induced by plasma electrons
Open the PDF for Biased quartz crystal microbalance method for studies of chemical vapor deposition surface chemistry induced by plasma electrons in another window
Journal Articles

Conformal chemical vapor deposition of boron-rich boron carbide thin films from triethylboron

Arun Haridas Choolakkal, Hans Högberg, Jens Birch, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013401 (2023)
https://doi.org/10.1116/6.0002203
Published: December 2022
View article titled, Conformal chemical vapor deposition of boron-rich boron carbide thin films from triethylboron
Open the PDF for Conformal chemical vapor deposition of boron-rich boron carbide thin films from triethylboron in another window
Journal Articles

Homogeneous high In content InxGa1−x N films by supercycle atomic layer deposition

Chih-Wei Hsu, Ivan Martinovic, Roger Magnusson, Babak Bakhit, Justinas Palisaitis, Per. O. Å. Persson, Polla Rouf, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 060402 (2022)
https://doi.org/10.1116/6.0002079
Published: November 2022
View article titled, Homogeneous high In content In<sub>x</sub>Ga<sub>1−x</sub> N films by supercycle atomic layer deposition
Open the PDF for Homogeneous high In content In<sub>x</sub>Ga<sub>1−x</sub> N films by supercycle atomic layer deposition in another window
Includes: Supplementary data
Journal Articles

Conformal and superconformal chemical vapor deposition of silicon carbide coatings

Jing-Jia Huang, Christian Militzer, Charles Wijayawardhana, Urban Forsberg, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053402 (2022)
https://doi.org/10.1116/6.0001909
Published: August 2022
View article titled, Conformal and superconformal chemical vapor deposition of silicon carbide coatings
Open the PDF for Conformal and superconformal chemical vapor deposition of silicon carbide coatings in another window
Journal Articles

Chemical vapor deposition of sp2-boron nitride films on Al2O3 (0001), ( 11 2 ¯ ) , ( 1 1 ¯ 02 ) , and ( 10 1 ¯ ) substrates

Editor’s Pick
Sachin Sharma, Laurent Souqui, Henrik Pedersen, Hans Högberg
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 033404 (2022)
https://doi.org/10.1116/6.0001672
Published: April 2022
View article titled, Chemical vapor deposition of sp<sup>2</sup>-boron nitride films on Al<sub>2</sub>O<sub>3</sub> (0001), ( 11 2 ¯ ) , ( 1 1 ¯ 02 ) , and ( 10 1 ¯ ) substrates
Open the PDF for Chemical vapor deposition of sp<sup>2</sup>-boron nitride films on Al<sub>2</sub>O<sub>3</sub> (0001), ( 11 2 ¯ ) , ( 1 1 ¯ 02 ) , and ( 10 1 ¯ ) substrates in another window
Journal Articles

Rhombohedral and turbostratic boron nitride: X-ray diffraction and photoluminescence signatures

Matthieu Moret, Adrien Rousseau, Pierre Valvin, Sachin Sharma, Laurent Souqui, Henrik Pedersen, Hans Högberg, Guillaume Cassabois, Jianhan Li, J. H. Edgar, Bernard Gil
Journal: Applied Physics Letters
Appl. Phys. Lett. 119, 262102 (2021)
https://doi.org/10.1063/5.0076424
Published: December 2021
View article titled, Rhombohedral and turbostratic boron nitride: X-ray diffraction and photoluminescence signatures
Open the PDF for Rhombohedral and turbostratic boron nitride: X-ray diffraction and photoluminescence signatures in another window
Journal Articles

On the dynamics in chemical vapor deposition of InN

Chih-Wei Hsu, Petro Deminskyi, Anton Persson, Matts Karlsson, Henrik Pedersen
Journal: Journal of Applied Physics
J. Appl. Phys. 130, 135302 (2021)
https://doi.org/10.1063/5.0061926
Published: October 2021
View article titled, On the dynamics in chemical vapor deposition of InN
Open the PDF for On the dynamics in chemical vapor deposition of InN in another window
Includes: Supplementary data
Journal Articles

Green CVD—Toward a sustainable philosophy for thin film deposition by chemical vapor deposition

FeaturedScilight
Henrik Pedersen, Seán T. Barry, Jonas Sundqvist
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 051001 (2021)
https://doi.org/10.1116/6.0001125
Published: July 2021
View article titled, Green CVD—Toward a sustainable philosophy for thin film deposition by chemical vapor deposition
Open the PDF for Green CVD—Toward a sustainable philosophy for thin film deposition by chemical vapor deposition in another window
Journal Articles

Area selective deposition of iron films using temperature sensitive masking materials and plasma electrons as reducing agents

Hama Nadhom, Yusheng Yuan, Polla Rouf, Niclas Solin, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043411 (2021)
https://doi.org/10.1116/6.0001076
Published: May 2021
View article titled, Area selective deposition of iron films using temperature sensitive masking materials and plasma electrons as reducing agents
Open the PDF for Area selective deposition of iron films using temperature sensitive masking materials and plasma electrons as reducing agents in another window
Journal Articles

Surface ligand removal in atomic layer deposition of GaN using triethylgallium

Petro Deminskyi, Chih-Wei Hsu, Babak Bakhit, Polla Rouf, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 012411 (2021)
https://doi.org/10.1116/6.0000752
Published: January 2021
View article titled, Surface ligand removal in atomic layer deposition of GaN using triethylgallium
Open the PDF for Surface ligand removal in atomic layer deposition of GaN using triethylgallium in another window
Journal Articles

Rhombohedral boron nitride epitaxy on ZrB2

Laurent Souqui, Justinas Palisaitis, Naureen Ghafoor, Henrik Pedersen, Hans Högberg
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 013405 (2021)
https://doi.org/10.1116/6.0000571
Published: December 2020
View article titled, Rhombohedral boron nitride epitaxy on ZrB<sub>2</sub>
Open the PDF for Rhombohedral boron nitride epitaxy on ZrB<sub>2</sub> in another window
Includes: Supplementary data
Journal Articles

Direct epitaxial nanometer-thin InN of high structural quality on 4H–SiC by atomic layer deposition

Editor’s Pick
Chih-Wei Hsu, Petro Deminskyi, Ivan Martinovic, Ivan G. Ivanov, Justinas Palisaitis, Henrik Pedersen
Journal: Applied Physics Letters
Appl. Phys. Lett. 117, 093101 (2020)
https://doi.org/10.1063/5.0014900
Published: September 2020
View article titled, Direct epitaxial nanometer-thin InN of high structural quality on 4H–SiC by atomic layer deposition
Open the PDF for Direct epitaxial nanometer-thin InN of high structural quality on 4H–SiC by atomic layer deposition in another window
Includes: Supplementary data
Journal Articles

Kinetic modeling of ammonia decomposition at chemical vapor deposition conditions

Karl Rönnby, Henrik Pedersen, Lars Ojamäe
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 050402 (2020)
https://doi.org/10.1116/6.0000369
Published: August 2020
View article titled, Kinetic modeling of ammonia decomposition at chemical vapor deposition conditions
Open the PDF for Kinetic modeling of ammonia decomposition at chemical vapor deposition conditions in another window
Includes: Supplementary data
Journal Articles

Chemical vapor deposition of sp2-boron nitride on Si(111) substrates from triethylboron and ammonia: Effect of surface treatments

Laurent Souqui, Henrik Pedersen, Hans Högberg
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 043402 (2020)
https://doi.org/10.1116/1.5145287
Published: May 2020
View article titled, Chemical vapor deposition of sp<sup>2</sup>-boron nitride on Si(111) substrates from triethylboron and ammonia: Effect of surface treatments
Open the PDF for Chemical vapor deposition of sp<sup>2</sup>-boron nitride on Si(111) substrates from triethylboron and ammonia: Effect of surface treatments in another window
Includes: Supplementary data