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Journal Articles

Research Update: Reactively sputtered nanometer-thin ZrN film as a diffusion barrier between Al and boron layers for radiation detector applications

Open Access
Negin Golshani, V. Mohammadi, H. Schellevis, C. I. M. Beenakker, R. Ishihara
Journal: APL Materials
APL Mater. 2, 100702 (2014)
https://doi.org/10.1063/1.4897959
Published: October 2014
View articletitled, Research Update: Reactively sputtered nanometer-thin ZrN film as a diffusion barrier between Al and boron layers for radiation detector applications
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Journal Articles

The extraordinary role of the AlN interlayer in growth of AlN sputtered on Ti electrodes

Available to Purchase
A. T. Tran, G. Pandraud, F. D. Tichelaar, M. D. Nguyen, H. Schellevis, P. M. Sarro
Journal: Applied Physics Letters
Appl. Phys. Lett. 103, 221909 (2013)
https://doi.org/10.1063/1.4835035
Published: November 2013
View articletitled, The extraordinary role of the AlN interlayer in growth of AlN sputtered on Ti electrodes
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Journal Articles

Homogeneous superconducting phase in TiN film: A complex impedance study

Available to Purchase
P. Diener, H. Schellevis, J. J. A. Baselmans
Journal: Applied Physics Letters
Appl. Phys. Lett. 101, 252601 (2012)
https://doi.org/10.1063/1.4771995
Published: December 2012
View articletitled, Homogeneous superconducting phase in TiN film: A complex impedance study
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