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Journal Articles

Central Japan Synchrotron Radiation Research Facility Project‐(II)

N. Yamamoto, Y. Takashima, M. Katoh, M. Hosaka, K. Takami, H. Morimoto, Y. Hori, S. Sasaki, S. Koda, T. Ito, I. Sakurai, H. Hara, W. Okamoto, N. Watanabe, Y. Takeda
Journal: AIP Conference Proceedings
AIP Conf. Proc. 1234, 591–594 (2010)
https://doi.org/10.1063/1.3463276
Published: June 2010
View article titled, Central Japan Synchrotron Radiation Research Facility Project‐(II)
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Journal Articles

Study of bilayer silylation process for 193 nm lithography using chemically amplified resist

I. Satou, K. Kuhara, M. Endo, H. Morimoto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 3326–3329 (1999)
https://doi.org/10.1116/1.591005
Published: November 1999
View article titled, Study of bilayer silylation process for 193 nm lithography using chemically amplified resist
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Journal Articles

Electron emission from gated silicide field emitter arrays

M. Takai, T. Iriguchi, H. Morimoto, A. Hosono, S. Kawabuchi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 16, 790–792 (1998)
https://doi.org/10.1116/1.589906
Published: March 1998
View article titled, Electron emission from gated silicide field emitter arrays
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Journal Articles

Effect of laser irradiation on electron emission from Si field emitter arrays

M. Takai, N. Suzuki, H. Morimoto, A. Hosono, S. Kawabuchi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 16, 780–782 (1998)
https://doi.org/10.1116/1.589904
Published: March 1998
View article titled, Effect of laser irradiation on electron emission from Si field emitter arrays
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Journal Articles

Modification of field emitter array tip shape by focused ion‐beam irradiation

M. Takai, T. Kishimoto, M. Yamashita, H. Morimoto, S. Yura, A. Hosono, S. Okuda, S. Lipp, L. Frey, H. Ryssel
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 14, 1973–1976 (1996)
https://doi.org/10.1116/1.588967
Published: May 1996
View article titled, Modification of field emitter array tip shape by focused ion‐beam irradiation
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Journal Articles

Effect of the duty ratio of line and space in phase‐shifting lithography

J. Miyazaki, A. Yamaguchi, K. Fujiwara, N. Yoshioka, H. Morimoto, K. Tsukamoto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 13, 137–141 (1995)
https://doi.org/10.1116/1.587971
Published: January 1995
View article titled, Effect of the duty ratio of line and space in phase‐shifting lithography
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Journal Articles

The surface silylating process using chemical amplification resist for electron beam lithography

T. Fujino, S. Takeuchi, H. Morimoto, Y. Watakabe, H. Abe, M. Koshiba, M. Murata, S. Kawamura
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 8, 1808–1813 (1990)
https://doi.org/10.1116/1.585164
Published: November 1990
View article titled, The surface silylating process using chemical amplification resist for electron beam lithography
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Journal Articles

Sub‐0.2‐μm lithography by using a variable‐shaped electron beam assisted by a focused ion beam process

K. Hosono, H. Minami, H. Kusunose, T. Fujino, K. Nagahama, H. Morimoto, Y. Watakabe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 2044–2047 (1989)
https://doi.org/10.1116/1.584645
Published: November 1989
View article titled, Sub‐0.2‐μm lithography by using a variable‐shaped electron beam assisted by a focused ion beam process
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Journal Articles

Hybrid lithography of a focused ion beam and an electron beam for the fabrication of a GaAs field effect transistor with a mushroom gate

K. Hosono, T. Fujino, S. Matsuda, K. Nagahama, Y. Sasaki, H. Morimoto, Y. Watakabe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 6, 1828–1831 (1988)
https://doi.org/10.1116/1.584162
Published: November 1988
View article titled, Hybrid lithography of a focused ion beam and an electron beam for the fabrication of a GaAs field effect transistor with a mushroom gate
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Journal Articles

Practical results of photomask repair using focused ion beam technology

K. Saitoh, H. Onoda, H. Morimoto, T. Katayama, Y. Watakabe, T. Kato
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 6, 1032–1034 (1988)
https://doi.org/10.1116/1.584343
Published: May 1988
View article titled, Practical results of photomask repair using focused ion beam technology
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Journal Articles

Performance of a 20–200 kV focused‐ion‐beam system with a new optical design concept

R. Aihara, H. Sawaragi, H. Morimoto, K. Hosono, Y. Sasaki, T. Kato, M. Hassel Shearer
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 6, 245–248 (1988)
https://doi.org/10.1116/1.584015
Published: January 1988
View article titled, Performance of a 20–200 kV focused‐ion‐beam system with a new optical design concept
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Journal Articles

A GaAs metal‐semiconductor field‐effect transistor with a mushroom gate fabricated by mixed exposure of focused ion beams

H. Morimoto, H. Onoda, Y. Sasaki, Y. Mitsui, O. Ishihara, T. Kato
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 5, 211–214 (1987)
https://doi.org/10.1116/1.583867
Published: January 1987
View article titled, A GaAs metal‐semiconductor field‐effect transistor with a mushroom gate fabricated by mixed exposure of focused ion beams
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Journal Articles

Detection of alignment signals for focused ion beam lithography

H. Morimoto, Y. Sasaki, H. Onoda, T. Kato
Journal: Applied Physics Letters
Appl. Phys. Lett. 46, 898–900 (1985)
https://doi.org/10.1063/1.95880
Published: May 1985
View article titled, Detection of alignment signals for focused ion beam lithography
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Journal Articles

Submicron pattern fabrication by focused ion beams

T. Kato, H. Morimoto, K. Saitoh, H. Nakata
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 3, 50–53 (1985)
https://doi.org/10.1116/1.583289
Published: January 1985
View article titled, Submicron pattern fabrication by focused ion beams
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Journal Articles

Characteristics of submicron patterns fabricated by gallium focused‐ion‐beam sputtering

H. Morimoto, Y. Sasaki, Y. Watakabe, T. Kato
Journal: Journal of Applied Physics
J. Appl. Phys. 57, 159–160 (1985)
https://doi.org/10.1063/1.335387
Published: January 1985
View article titled, Characteristics of submicron patterns fabricated by gallium focused‐ion‐beam sputtering
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Journal Articles

Mask fabrication for VLSI using an electron beam exposure system

Y. Watakabe, T. Kato, A. Shigetomi, H. Morimoto
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 1005–1011 (1982)
https://doi.org/10.1116/1.571852
Published: November 1982
View article titled, Mask fabrication for VLSI using an electron beam exposure system
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