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H. Kinoshita
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Journal Articles

Evaluation of extreme-ultraviolet lithography mask absorber pattern on multilayer phase defect using extreme-ultraviolet microscope

K. Hamamoto, N. Sakaya, M. Hosoya, M. Kureishi, R. Ohkubo, T. Shoki, O. Nagarekawa, J. Kishimoto, T. Watanabe, H. Kinoshita
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1938–1942 (2009)
https://doi.org/10.1116/1.3179185
Published: July 2009
View article titled, Evaluation of extreme-ultraviolet lithography mask absorber pattern on multilayer phase defect using extreme-ultraviolet microscope
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Journal Articles

FT‐IR image of TiO2/Pp‐IX particles in tumor tissue

N. Miyoshi, H. Kinoshita, T. Moriwaki
Journal: AIP Conference Proceedings
AIP Conf. Proc. 902, 77–78 (2007)
https://doi.org/10.1063/1.2723627
Published: March 2007
View article titled, FT‐IR image of TiO<sub>2</sub>/Pp‐IX particles in tumor tissue
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Journal Articles

Swing effects in alternating phase shift mask lithography: Implications of low σ illumination

Navab Singh, H. Q. Sun, W. H. Foo, S. S. Mehta, R. Kumar, A. O. Adeyeye, H. Suda, T. Kubota, Y. Kimura, H. Kinoshita
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2326–2330 (2006)
https://doi.org/10.1116/1.2353840
Published: September 2006
View article titled, Swing effects in alternating phase shift mask lithography: Implications of low σ illumination
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Journal Articles

Investigation of the initial stage of GaN epitaxial growth on 6 H - Si C (0001) at room temperature

M. H. Kim, M. Oshima, H. Kinoshita, Y. Shirakura, K. Miyamura, J. Ohta, A. Kobayashi, H. Fujioka
Journal: Applied Physics Letters
Appl. Phys. Lett. 89, 031916 (2006)
https://doi.org/10.1063/1.2227616
Published: July 2006
View article titled, Investigation of the initial stage of GaN epitaxial growth on 6 H - Si C (0001) at room temperature
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Journal Articles

Extremely high quantum efficiency of donor-acceptor-pair emission in N-and-B-doped 6 H - Si C

S. Kamiyama, T. Maeda, Y. Nakamura, M. Iwaya, H. Amano, I. Akasaki, H. Kinoshita, T. Furusho, M. Yoshimoto, T. Kimoto, J. Suda, A. Henry, I. G. Ivanov, J. P. Bergman, B. Monemar, T. Onuma, S. F. Chichibu
Journal: Journal of Applied Physics
J. Appl. Phys. 99, 093108 (2006)
https://doi.org/10.1063/1.2195883
Published: May 2006
View article titled, Extremely high quantum efficiency of donor-acceptor-pair emission in N-and-B-doped 6 H - Si C
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Journal Articles

Mask defect inspection using an extreme ultraviolet microscope

K. Hamamoto, Y. Tanaka, S. Y. Lee, N. Hosokawa, N. Sakaya, M. Hosoya, T. Shoki, T. Watanabe, H. Kinoshita
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2852–2855 (2005)
https://doi.org/10.1116/1.2127943
Published: December 2005
View article titled, Mask defect inspection using an extreme ultraviolet microscope
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Journal Articles

Transformation of diamond nanoparticles into onion-like carbon by electron irradiation studied directly inside an ultrahigh-vacuum transmission electron microscope

J. Hiraki, H. Mori, E. Taguchi, H. Yasuda, H. Kinoshita, N. Ohmae
Journal: Applied Physics Letters
Appl. Phys. Lett. 86, 223101 (2005)
https://doi.org/10.1063/1.1935047
Published: May 2005
View article titled, Transformation of diamond nanoparticles into onion-like carbon by electron irradiation studied directly inside an ultrahigh-vacuum transmission electron microscope
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Journal Articles

Nondestructive characterization of dislocations and micropipes in high-resistivity 6H–SiC wafers by deep-level photoluminescence mapping

M. Tajima, E. Higashi, T. Hayashi, H. Kinoshita, H. Shiomi
Journal: Applied Physics Letters
Appl. Phys. Lett. 86, 061914 (2005)
https://doi.org/10.1063/1.1862330
Published: February 2005
View article titled, Nondestructive characterization of dislocations and micropipes in high-resistivity 6H–SiC wafers by deep-level photoluminescence mapping
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Journal Articles

Cleaning of extreme ultraviolet lithography optics and masks using 13.5 nm and 172 nm radiation

K. Hamamoto, Y. Tanaka, T. Watanabe, N. Sakaya, M. Hosoya, T. Shoki, H. Hada, N. Hishinuma, H. Sugahara, H. Kinoshita
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 247–251 (2005)
https://doi.org/10.1116/1.1849220
Published: January 2005
View article titled, Cleaning of extreme ultraviolet lithography optics and masks using 13.5 nm and 172 nm radiation
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Journal Articles

Actinic mask metrology for extreme ultraviolet lithography

H. Kinoshita, T. Haga, K. Hamamoto, S. Takada, N. Kazui, S. Kakunai, H. Tsubakino, T. Shoki, M. Endo, T. Watanabe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 264–267 (2004)
https://doi.org/10.1116/1.1643057
Published: January 2004
View article titled, Actinic mask metrology for extreme ultraviolet lithography
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Journal Articles

Development of the large field extreme ultraviolet lithography camera

T. Watanabe, H. Kinoshita, H. Nii, Y. Li, K. Hamamoto, T. Oshino, K. Sugisaki, K. Murakami, S. Irie, S. Shirayone, Y. Gomei, S. Okazaki
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 18, 2905–2910 (2000)
https://doi.org/10.1116/1.1319712
Published: November 2000
View article titled, Development of the large field extreme ultraviolet lithography camera
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Journal Articles

A fast atomic oxygen beam facility with in situ testing/analysis capabilities

H. Kinoshita, J. Ikeda, M. Tagawa, M. Umeno, N. Ohmae
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 69, 2273–2277 (1998)
https://doi.org/10.1063/1.1148931
Published: June 1998
View article titled, A fast atomic oxygen beam facility with <em>in situ</em> testing/analysis capabilities
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Journal Articles

Imaging of extreme ultraviolet lithographic masks with programmed substrate defects

K. B. Nguyen, T. Mizota, T. Haga, H. Kinoshita, D. T. Attwood
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 12, 3833–3840 (1994)
https://doi.org/10.1116/1.587450
Published: November 1994
View article titled, Imaging of extreme ultraviolet lithographic masks with programmed substrate defects
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Journal Articles

Influence of fluorine preamorphization on the diffusion and activation of low‐energy implanted boron during rapid thermal annealing

T. H. Huang, H. Kinoshita, D. L. Kwong
Journal: Applied Physics Letters
Appl. Phys. Lett. 65, 1829–1831 (1994)
https://doi.org/10.1063/1.112857
Published: October 1994
View article titled, Influence of fluorine preamorphization on the diffusion and activation of low‐energy implanted boron during rapid thermal annealing
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Journal Articles

Modeling of suppressed dopant activation in boron‐ and BF2‐implanted silicon

H. Kinoshita, T. H. Huang, D. L. Kwong
Journal: Journal of Applied Physics
J. Appl. Phys. 75, 8213–8215 (1994)
https://doi.org/10.1063/1.356525
Published: June 1994
View article titled, Modeling of suppressed dopant activation in boron‐ and BF<sub>2</sub>‐implanted silicon
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Journal Articles

Physical model for defect mediated boron diffusion during rapid thermal annealing of ion implanted BF2

H. Kinoshita, D. L. Kwong
Journal: Applied Physics Letters
Appl. Phys. Lett. 61, 25–27 (1992)
https://doi.org/10.1063/1.107650
Published: July 1992
View article titled, Physical model for defect mediated boron diffusion during rapid thermal annealing of ion implanted BF<sub>2</sub>
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Journal Articles

Kinetic diffusion model of ion‐implanted boron during rapid thermal annealing

H. Kinoshita, D. L. Kwong
Journal: Applied Physics Letters
Appl. Phys. Lett. 60, 1202–1204 (1992)
https://doi.org/10.1063/1.107405
Published: March 1992
View article titled, Kinetic diffusion model of ion‐implanted boron during rapid thermal annealing
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Journal Articles

Collimated magnetron sputter deposition

S. M. Rossnagel, D. Mikalsen, H. Kinoshita, J. J. Cuomo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 9, 261–265 (1991)
https://doi.org/10.1116/1.577531
Published: March 1991
View article titled, Collimated magnetron sputter deposition
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Journal Articles

Soft x‐ray reduction lithography using multilayer mirrors

H. Kinoshita, K. Kurihara, Y. Ishii, Y. Torii
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 1648–1651 (1989)
https://doi.org/10.1116/1.584507
Published: November 1989
View article titled, Soft x‐ray reduction lithography using multilayer mirrors
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Journal Articles

Zn doping characteristics for InGaAlP grown by low‐pressure metalorganic chemical vapor deposition

Y. Nishikawa, Y. Tsuburai, C. Nozaki, Y. Ohba, Y. Kokubun, H. Kinoshita
Journal: Applied Physics Letters
Appl. Phys. Lett. 53, 2182–2184 (1988)
https://doi.org/10.1063/1.100276
Published: November 1988
View article titled, Zn doping characteristics for InGaAlP grown by low‐pressure metalorganic chemical vapor deposition
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