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Journal Articles

Residual-free reactive ion etching of gold layers

Gerhard Franz, Wolfhard Oberhausen, Ralf Meyer, Markus-Christian Amann
Journal: AIP Advances
AIP Advances 8, 075026 (2018)
https://doi.org/10.1063/1.5037886
Published: July 2018
View article titled, Residual-free reactive ion etching of gold layers
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Journal Articles

Chemical vapor deposition of poly-p-xylylene in narrow tubes

Sara Felicitas Bröskamp, David Redka, Alexander Möhlmann, Gerhard Franz, Dieter Jocham
Journal: AIP Advances
AIP Advances 7, 075005 (2017)
https://doi.org/10.1063/1.4994678
Published: July 2017
View article titled, Chemical vapor deposition of poly-<em>p</em>-xylylene in narrow tubes
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Journal Articles

Efficacy of silver/hydrophilic poly(p-xylylene) on preventing bacterial growth and biofilm formation in urinary catheters

Hamideh Heidari Zare, Viktorija Juhart, Attila Vass, Gerhard Franz, Dieter Jocham
Journal: Biointerphases
Biointerphases 12, 011001 (2017)
https://doi.org/10.1116/1.4974197
Published: January 2017
View article titled, Efficacy of silver/hydrophilic poly(<em>p</em>-xylylene) on preventing bacterial growth and biofilm formation in urinary catheters
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Journal Articles

Silver ions eluted from partially protected silver nanoparticles

Hamideh Heidari Zare, Oliver Düttmann, Attila Vass, Gerhard Franz, Dieter Jocham
Journal: Biointerphases
Biointerphases 11, 031002 (2016)
https://doi.org/10.1116/1.4955467
Published: July 2016
View article titled, Silver ions eluted from partially protected silver nanoparticles
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Journal Articles

Microbiological investigation of an antibacterial sandwich layer system

Hamideh Heidari Zare, Stefanie Sudhop, Florian Schamberger, Gerhard Franz
Journal: Biointerphases
Biointerphases 9, 031002 (2014)
https://doi.org/10.1116/1.4876736
Published: May 2014
View article titled, Microbiological investigation of an antibacterial sandwich layer system
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Journal Articles

Evaporation and thermal cracking of dimeric parylenes

Gerhard Franz, Florian Schamberger
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 061602 (2013)
https://doi.org/10.1116/1.4816942
Published: August 2013
View article titled, Evaporation and thermal cracking of dimeric parylenes
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Journal Articles

Influence of film thickness and deposition rate on surface quality of polyparylene coatings

Florian Schamberger, Astrid Ziegler, Gerhard Franz
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 051801 (2012)
https://doi.org/10.1116/1.4740049
Published: August 2012
View article titled, Influence of film thickness and deposition rate on surface quality of polyparylene coatings
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Journal Articles

Characterization of microwave plasmas for deposition of polyparylene

Gerhard Franz, Florian Rauter, Stanislav F. Dribinskiy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 27, 1035–1041 (2009)
https://doi.org/10.1116/1.3148825
Published: June 2009
View article titled, Characterization of microwave plasmas for deposition of polyparylene
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Journal Articles

Some aspects of dissipation mechanisms in chlorine containing capacitively coupled discharges

Gerhard Franz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 1360–1365 (2006)
https://doi.org/10.1116/1.2198861
Published: June 2006
View article titled, Some aspects of dissipation mechanisms in chlorine containing capacitively coupled discharges
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Journal Articles

Electron heating in capacitively coupled discharges and reactive gases

Gerhard Franz, Michael Klick
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 23, 917–921 (2005)
https://doi.org/10.1116/1.1947201
Published: June 2005
View article titled, Electron heating in capacitively coupled discharges and reactive gases
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Journal Articles

Comprehensive analysis of chlorine-containing capacitively coupled plasmas

Gerhard Franz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 23, 369–387 (2005)
https://doi.org/10.1116/1.1894725
Published: April 2005
View article titled, Comprehensive analysis of chlorine-containing capacitively coupled plasmas
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Journal Articles

Fabrication of dry etched and subsequently passivated laser facets in Ga As ∕ Al Ga As

Eckard Deichsel, Gerhard Franz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 22, 2201–2205 (2004)
https://doi.org/10.1116/1.1786307
Published: September 2004
View article titled, Fabrication of dry etched and subsequently passivated laser facets in Ga As ∕ Al Ga As
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Journal Articles

Characterization of sputtered indium tin oxide layers as transparent contact material

Gerhard Franz, Benjamin Lange, Stefan Sotier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 19, 2514–2521 (2001)
https://doi.org/10.1116/1.1389901
Published: September 2001
View article titled, Characterization of sputtered indium tin oxide layers as transparent contact material
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Journal Articles

Damage in III/V semiconductors caused by hard- and soft-etching plasmas

Gerhard Franz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 19, 762–772 (2001)
https://doi.org/10.1116/1.1355760
Published: May 2001
View article titled, Damage in III/V semiconductors caused by hard- and soft-etching plasmas
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Journal Articles

Sidewall passivation of GaAs in BCl 3 -containing atmospheres

Gerhard Franz, Wolfgang Hösler, Rolf Treichler
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 19, 415–419 (2001)
https://doi.org/10.1116/1.1347045
Published: March 2001
View article titled, Sidewall passivation of GaAs in BCl 3 -containing atmospheres
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Journal Articles

Analysis of chlorine-containing plasmas applied in III/V semiconductor processing

Gerhard Franz, Agnes Kelp, Peter Messerer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 18, 2053–2061 (2000)
https://doi.org/10.1116/1.1286072
Published: September 2000
View article titled, Analysis of chlorine-containing plasmas applied in III/V semiconductor processing
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Journal Articles

Reactive ion etching of GaN and GaAs: Radially uniform processes for rectangular, smooth sidewalls

Gerhard Franz, Franz Rinner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 17, 56–61 (1999)
https://doi.org/10.1116/1.581550
Published: January 1999
View article titled, Reactive ion etching of GaN and GaAs: Radially uniform processes for rectangular, smooth sidewalls
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Journal Articles

High-rate etching of GaAs using chlorine atmospheres doped with a Lewis acid

Gerhard Franz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 16, 1542–1546 (1998)
https://doi.org/10.1116/1.581184
Published: May 1998
View article titled, High-rate etching of GaAs using chlorine atmospheres doped with a Lewis acid
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Journal Articles

Reactive ion etching GaAs and AlAs: Kinetics and process monitoring

Gerhard Franz, Charlotte Hoyler, Josef Kaindl
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 14, 126–131 (1996)
https://doi.org/10.1116/1.589039
Published: January 1996
View article titled, Reactive ion etching GaAs and AlAs: Kinetics and process monitoring
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Journal Articles

Anodic oxidation of InP using a citric‐acid‐based solution

Gerhard Franz
Journal: Journal of Applied Physics
J. Appl. Phys. 63, 500–505 (1988)
https://doi.org/10.1063/1.340270
Published: January 1988
View article titled, Anodic oxidation of InP using a citric‐acid‐based solution
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