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G. S. Oehrlein
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Journal Articles

Electron beam-induced etching of SiO2, Si3N4, and poly-Si assisted by CF4/O2 remote plasma

Kang-Yi Lin, Christian Preischl, Christian Felix Hermanns, Daniel Rhinow, Hans-Michael Solowan, Michael Budach, Hubertus Marbach, Klaus Edinger, G. S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013004 (2023)
https://doi.org/10.1116/6.0002234
Published: December 2022
View article titled, Electron beam-induced etching of SiO<sub>2</sub>, Si<sub>3</sub>N<sub>4</sub>, and poly-Si assisted by CF<sub>4</sub>/O<sub>2</sub> remote plasma
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Journal Articles

SiO2 etching and surface evolution using combined exposure to CF4/O2 remote plasma and electron beam

Editor’s Pick
Kang-Yi Lin, Christian Preischl, Christian Felix Hermanns, Daniel Rhinow, Hans-Michael Solowan, Michael Budach, Klaus Edinger, G. S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063004 (2022)
https://doi.org/10.1116/6.0002038
Published: October 2022
View article titled, SiO<sub>2</sub> etching and surface evolution using combined exposure to CF<sub>4</sub>/O<sub>2</sub> remote plasma and electron beam
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Journal Articles

Real time characterization of polymer surface modifications by an atmospheric-pressure plasma jet: Electrically coupled versus remote mode

A. J. Knoll, P. Luan, E. A. J. Bartis, C. Hart, Y. Raitses, G. S. Oehrlein
Journal: Applied Physics Letters
Appl. Phys. Lett. 105, 171601 (2014)
https://doi.org/10.1063/1.4900551
Published: October 2014
View article titled, Real time characterization of polymer surface modifications by an atmospheric-pressure plasma jet: Electrically coupled versus remote mode
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Journal Articles

Direct and quantitative evidence for buckling instability as a mechanism for roughening of polymer during plasma etching

T.-C. Lin, R. L. Bruce, G. S. Oehrlein, R. J. Phaneuf, H.-C. Kan
Journal: Applied Physics Letters
Appl. Phys. Lett. 100, 233113 (2012)
https://doi.org/10.1063/1.4718940
Published: June 2012
View article titled, Direct and quantitative evidence for buckling instability as a mechanism for roughening of polymer during plasma etching
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Journal Articles

Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions

F. Weilnboeck, N. Kumar, G. S. Oehrlein, T.-Y. Chung, D. Graves, M. Li, E. A. Hudson, E. C. Benck
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 031807 (2012)
https://doi.org/10.1116/1.3697752
Published: May 2012
View article titled, Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions
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Journal Articles

Study of Ti etching and selectivity mechanism in fluorocarbon plasmas for dielectric etch

F. Weilnboeck, E. Bartis, S. Shachar, G. S. Oehrlein, D. Farber, T. Lii, C. Lenox
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 021804 (2012)
https://doi.org/10.1116/1.3690643
Published: March 2012
View article titled, Study of Ti etching and selectivity mechanism in fluorocarbon plasmas for dielectric etch
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Journal Articles

Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity

F. Weilnboeck, D. Metzler, N. Kumar, G. S. Oehrlein, R. L. Bruce, S. Engelmann, N. Fuller
Journal: Applied Physics Letters
Appl. Phys. Lett. 99, 261501 (2011)
https://doi.org/10.1063/1.3671995
Published: December 2011
View article titled, Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity
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Journal Articles

Hydrogenation and surface density changes in hydrocarbon films during erosion using Ar/H2 plasmas

N. Fox-Lyon, G. S. Oehrlein, N. Ning, D. B. Graves
Journal: Journal of Applied Physics
J. Appl. Phys. 110, 104314 (2011)
https://doi.org/10.1063/1.3662953
Published: November 2011
View article titled, Hydrogenation and surface density changes in hydrocarbon films during erosion using Ar/H<sub>2</sub> plasmas
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Journal Articles

On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists

R. L. Bruce, F. Weilnboeck, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, A. Alizadeh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 041604 (2011)
https://doi.org/10.1116/1.3607604
Published: July 2011
View article titled, On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists
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Journal Articles

Surface and near-surface modifications of ultralow dielectric constant materials exposed to plasmas under sidewall-like conditions

Ming-Shu Kuo, G. S. Oehrlein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 1104–1110 (2010)
https://doi.org/10.1116/1.3499271
Published: October 2010
View article titled, Surface and near-surface modifications of ultralow dielectric constant materials exposed to plasmas under sidewall-like conditions
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Journal Articles

Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry

F. Weilnboeck, R. L. Bruce, S. Engelmann, G. S. Oehrlein, D. Nest, T.-Y. Chung, D. Graves, M. Li, D. Wang, C. Andes, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 993–1004 (2010)
https://doi.org/10.1116/1.3484249
Published: September 2010
View article titled, Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry
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Journal Articles

Mechanistic study of ultralow k -compatible carbon dioxide in situ photoresist ashing processes. I. Process performance and influence on ULK material modification

Ming-Shu Kuo, A. R. Pal, G. S. Oehrlein, P. Lazzeri, M. Anderle
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 952–960 (2010)
https://doi.org/10.1116/1.3482343
Published: September 2010
View article titled, Mechanistic study of ultralow k -compatible carbon dioxide <em>in situ</em> photoresist ashing processes. I. Process performance and influence on ULK material modification
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Journal Articles

Mechanistic study of ultralow k -compatible carbon dioxide in situ photoresist ashing processes. II. Interaction with preceding fluorocarbon plasma ultralow k etching processes

Ming-Shu Kuo, A. R. Pal, G. S. Oehrlein, Xuefeng Hua
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 961–967 (2010)
https://doi.org/10.1116/1.3482353
Published: September 2010
View article titled, Mechanistic study of ultralow k -compatible carbon dioxide <em>in situ</em> photoresist ashing processes. II. Interaction with preceding fluorocarbon plasma ultralow k etching processes
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Journal Articles

Stages in the interaction of deuterium atoms with amorphous hydrogenated carbon films: Isotope exchange, soft-layer formation, and steady-state erosion

G. S. Oehrlein, T. Schwarz-Selinger, K. Schmid, M. Schlüter, W. Jacob
Journal: Journal of Applied Physics
J. Appl. Phys. 108, 043307 (2010)
https://doi.org/10.1063/1.3474988
Published: August 2010
View article titled, Stages in the interaction of deuterium atoms with amorphous hydrogenated carbon films: Isotope exchange, soft-layer formation, and steady-state erosion
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Journal Articles

Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma

R. L. Bruce, T. Lin, R. J. Phaneuf, G. S. Oehrlein, W. Bell, B. Long, C. G. Willson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 751–757 (2010)
https://doi.org/10.1116/1.3455496
Published: July 2010
View article titled, Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
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Journal Articles

Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films

R. L. Bruce, F. Weilnboeck, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, J. J. Vegh, D. Nest, D. B. Graves
Journal: Journal of Applied Physics
J. Appl. Phys. 107, 084310 (2010)
https://doi.org/10.1063/1.3373587
Published: April 2010
View article titled, Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films
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Journal Articles

Influence of C 4 F 8 / Ar -based etching and H 2 -based remote plasma ashing processes on ultralow k materials modifications

Ming-Shu Kuo, Xuefeng Hua, G. S. Oehrlein, A. Ali, P. Jiang, P. Lazzeri, M. Anderle
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 284–294 (2010)
https://doi.org/10.1116/1.3308623
Published: March 2010
View article titled, Influence of C 4 F 8 / Ar -based etching and H 2 -based remote plasma ashing processes on ultralow k materials modifications
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Journal Articles

Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C 4 F 8 - and C F 4 -based discharges

S. Engelmann, R. L. Bruce, F. Weilnboeck, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1165–1179 (2009)
https://doi.org/10.1116/1.3137012
Published: May 2009
View article titled, Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C 4 F 8 - and C F 4 -based discharges
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Journal Articles

Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma

R. L. Bruce, S. Engelmann, T. Lin, T. Kwon, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, J. J. Végh, D. Nest, D. B. Graves, A. Alizadeh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1142–1155 (2009)
https://doi.org/10.1116/1.3136864
Published: May 2009
View article titled, Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma
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Journal Articles

Plasma-surface interactions of advanced photoresists with C 4 F 8 ∕ Ar discharges: Plasma parameter dependencies

S. Engelmann, R. L. Bruce, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 92–106 (2009)
https://doi.org/10.1116/1.3054342
Published: January 2009
View article titled, Plasma-surface interactions of advanced photoresists with C 4 F 8 ∕ Ar discharges: Plasma parameter dependencies
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