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Journal Articles

Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions

F. Weilnboeck, N. Kumar, G. S. Oehrlein, T.-Y. Chung, D. Graves, M. Li, E. A. Hudson, E. C. Benck
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 031807 (2012)
https://doi.org/10.1116/1.3697752
Published: May 2012
View article titled, Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions
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Journal Articles

Study of Ti etching and selectivity mechanism in fluorocarbon plasmas for dielectric etch

F. Weilnboeck, E. Bartis, S. Shachar, G. S. Oehrlein, D. Farber, T. Lii, C. Lenox
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 021804 (2012)
https://doi.org/10.1116/1.3690643
Published: March 2012
View article titled, Study of Ti etching and selectivity mechanism in fluorocarbon plasmas for dielectric etch
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Journal Articles

Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity

F. Weilnboeck, D. Metzler, N. Kumar, G. S. Oehrlein, R. L. Bruce, S. Engelmann, N. Fuller
Journal: Applied Physics Letters
Appl. Phys. Lett. 99, 261501 (2011)
https://doi.org/10.1063/1.3671995
Published: December 2011
View article titled, Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity
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Journal Articles

On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists

R. L. Bruce, F. Weilnboeck, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, A. Alizadeh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 041604 (2011)
https://doi.org/10.1116/1.3607604
Published: July 2011
View article titled, On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists
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Journal Articles

Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry

F. Weilnboeck, R. L. Bruce, S. Engelmann, G. S. Oehrlein, D. Nest, T.-Y. Chung, D. Graves, M. Li, D. Wang, C. Andes, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 993–1004 (2010)
https://doi.org/10.1116/1.3484249
Published: September 2010
View article titled, Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry
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Journal Articles

Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films

R. L. Bruce, F. Weilnboeck, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, J. J. Vegh, D. Nest, D. B. Graves
Journal: Journal of Applied Physics
J. Appl. Phys. 107, 084310 (2010)
https://doi.org/10.1063/1.3373587
Published: April 2010
View article titled, Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films
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Journal Articles

Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C 4 F 8 - and C F 4 -based discharges

S. Engelmann, R. L. Bruce, F. Weilnboeck, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1165–1179 (2009)
https://doi.org/10.1116/1.3137012
Published: May 2009
View article titled, Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C 4 F 8 - and C F 4 -based discharges
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Journal Articles

Real-time studies of surface roughness development and reticulation mechanism of advanced photoresist materials during plasma processing

A. R. Pal, R. L. Bruce, F. Weilnboeck, S. Engelmann, T. Lin, M.-S. Kuo, R. Phaneuf, G. S. Oehrlein
Journal: Journal of Applied Physics
J. Appl. Phys. 105, 013311 (2009)
https://doi.org/10.1063/1.3055268
Published: January 2009
View article titled, Real-time studies of surface roughness development and reticulation mechanism of advanced photoresist materials during plasma processing
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Journal Articles

Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure III. Effect of fluorocarbon film and initial surface condition on photoresist degradation

M. Sumiya, R. Bruce, S. Engelmann, F. Weilnboeck, G. S. Oehrlein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 1978–1986 (2008)
https://doi.org/10.1116/1.3021037
Published: November 2008
View article titled, Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure III. Effect of fluorocarbon film and initial surface condition on photoresist degradation
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Journal Articles

Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposures. II. Plasma parameter trends for photoresist degradation

M. Sumiya, R. Bruce, S. Engelmann, F. Weilnboeck, G. S. Oehrlein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 1647–1653 (2008)
https://doi.org/10.1116/1.2960563
Published: September 2008
View article titled, Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposures. II. Plasma parameter trends for photoresist degradation
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Journal Articles

Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation

M. Sumiya, R. Bruce, S. Engelmann, F. Weilnboeck, G. S. Oehrlein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 1637–1646 (2008)
https://doi.org/10.1116/1.2960561
Published: September 2008
View article titled, Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation
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Journal Articles

Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation

D. Nest, D. B. Graves, S. Engelmann, R. L. Bruce, F. Weilnboeck, G. S. Oehrlein, C. Andes, E. A. Hudson
Journal: Applied Physics Letters
Appl. Phys. Lett. 92, 153113 (2008)
https://doi.org/10.1063/1.2912028
Published: April 2008
View article titled, Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation
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