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Journal Articles

Highly spatially resolved structural and optical investigation of Bi nanoparticles in Y-Er disilicate thin films

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A. Scarangella, G. Amiard, R. Reitano, F. Priolo, S. Boninelli, M. Miritello
Journal: Applied Physics Letters
Appl. Phys. Lett. 109, 061902 (2016)
https://doi.org/10.1063/1.4960644
Published: August 2016
View articletitled, Highly spatially resolved structural and optical investigation of Bi nanoparticles in Y-Er disilicate thin films
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Journal Articles

Photonic crystal light emitting diode based on Er and Si nanoclusters co-doped slot waveguide

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R. Lo Savio, M. Galli, M. Liscidini, L. C. Andreani, G. Franzò, F. Iacona, M. Miritello, A. Irrera, D. Sanfilippo, A. Piana, F. Priolo
Journal: Applied Physics Letters
Appl. Phys. Lett. 104, 121107 (2014)
https://doi.org/10.1063/1.4869751
Published: March 2014
View articletitled, Photonic crystal light emitting diode based on Er and Si nanoclusters co-doped slot waveguide
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Includes: Supplementary data
Journal Articles

N-type doping of Ge by As implantation and excimer laser annealing

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R. Milazzo, E. Napolitani, G. Impellizzeri, G. Fisicaro, S. Boninelli, M. Cuscunà, D. De Salvador, M. Mastromatteo, M. Italia, A. La Magna, G. Fortunato, F. Priolo, V. Privitera, A. Carnera
Journal: Journal of Applied Physics
J. Appl. Phys. 115, 053501 (2014)
https://doi.org/10.1063/1.4863779
Published: February 2014
View articletitled, N-type doping of Ge by As implantation and excimer laser annealing
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Journal Articles

B-doping in Ge by excimer laser annealing

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G. Impellizzeri, E. Napolitani, S. Boninelli, G. Fisicaro, M. Cuscunà, R. Milazzo, A. La Magna, G. Fortunato, F. Priolo, V. Privitera
Journal: Journal of Applied Physics
J. Appl. Phys. 113, 113505 (2013)
https://doi.org/10.1063/1.4795268
Published: March 2013
View articletitled, B-doping in Ge by excimer laser annealing
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Journal Articles

Mechanisms of boron diffusion in silicon and germanium

Open Access
S. Mirabella, D. De Salvador, E. Napolitani, E. Bruno, F. Priolo
Journal: Journal of Applied Physics
J. Appl. Phys. 113, 031101 (2013)
https://doi.org/10.1063/1.4763353
Published: January 2013
View articletitled, Mechanisms of boron diffusion in silicon and germanium
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Journal Articles

Anomalous transport of Sb in laser irradiated Ge

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E. Bruno, G. G. Scapellato, A. La Magna, M. Cuscunà, E. Napolitani, S. Boninelli, F. Priolo, G. Fortunato, V. Privitera
Journal: Applied Physics Letters
Appl. Phys. Lett. 101, 172110 (2012)
https://doi.org/10.1063/1.4764069
Published: October 2012
View articletitled, Anomalous transport of Sb in laser irradiated Ge
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Journal Articles

Role of the Ge surface during the end of range dissolution

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S. Boninelli, G. Impellizzeri, A. Alberti, F. Priolo, F. Cristiano, C. Spinella
Journal: Applied Physics Letters
Appl. Phys. Lett. 101, 162103 (2012)
https://doi.org/10.1063/1.4759031
Published: October 2012
View articletitled, Role of the Ge surface during the end of range dissolution
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Journal Articles

Investigation of fluorine three-dimensional redistribution during solid-phase-epitaxial–regrowth of amorphous Si

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F. Panciera, K. Hoummada, M. Mastromatteo, D. De Salvador, E. Napolitani, S. Boninelli, G. Impellizzeri, F. Priolo, A. Carnera, D. Mangelinck
Journal: Applied Physics Letters
Appl. Phys. Lett. 101, 103113 (2012)
https://doi.org/10.1063/1.4751254
Published: September 2012
View articletitled, Investigation of fluorine three-dimensional redistribution during solid-phase-epitaxial–regrowth of amorphous Si
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Journal Articles

Energy transfer mechanisms in Er-Yb-Y disilicate thin films

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P. Cardile, M. Miritello, F. Priolo
Journal: Applied Physics Letters
Appl. Phys. Lett. 100, 251913 (2012)
https://doi.org/10.1063/1.4730434
Published: June 2012
View articletitled, Energy transfer mechanisms in Er-Yb-Y disilicate thin films
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Journal Articles

Fluorine effect on As diffusion in Ge

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G. Impellizzeri, S. Boninelli, F. Priolo, E. Napolitani, C. Spinella, A. Chroneos, H. Bracht
Journal: Journal of Applied Physics
J. Appl. Phys. 109, 113527 (2011)
https://doi.org/10.1063/1.3592962
Published: June 2011
View articletitled, Fluorine effect on As diffusion in Ge
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Journal Articles

High-level incorporation of antimony in germanium by laser annealing

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E. Bruno, G. G. Scapellato, G. Bisognin, E. Carria, L. Romano, A. Carnera, F. Priolo
Journal: Journal of Applied Physics
J. Appl. Phys. 108, 124902 (2010)
https://doi.org/10.1063/1.3520671
Published: December 2010
View articletitled, High-level incorporation of antimony in germanium by laser annealing
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Journal Articles

Light absorption and electrical transport in Si:O alloys for photovoltaics

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S. Mirabella, G. Di Martino, I. Crupi, S. Gibilisco, M. Miritello, R. Lo Savio, M. A. Di Stefano, S. Di Marco, F. Simone, F. Priolo
Journal: Journal of Applied Physics
J. Appl. Phys. 108, 093507 (2010)
https://doi.org/10.1063/1.3503852
Published: November 2010
View articletitled, Light absorption and electrical transport in Si:O alloys for photovoltaics
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Journal Articles

Transient enhanced diffusion of B mediated by self-interstitials in preamorphized Ge

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E. Napolitani, G. Bisognin, E. Bruno, M. Mastromatteo, G. G. Scapellato, S. Boninelli, D. De Salvador, S. Mirabella, C. Spinella, A. Carnera, F. Priolo
Journal: Applied Physics Letters
Appl. Phys. Lett. 96, 201906 (2010)
https://doi.org/10.1063/1.3429084
Published: May 2010
View articletitled, Transient enhanced diffusion of B mediated by self-interstitials in preamorphized Ge
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Journal Articles

Formation and incorporation of SiF 4 molecules in F-implanted preamorphized Si

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D. De Salvador, G. Bisognin, E. Napolitani, M. Mastromatteo, N. Baggio, A. Carnera, F. Boscherini, G. Impellizzeri, S. Mirabella, S. Boninelli, F. Priolo, F. Cristiano
Journal: Applied Physics Letters
Appl. Phys. Lett. 95, 101908 (2009)
https://doi.org/10.1063/1.3216806
Published: September 2009
View articletitled, Formation and incorporation of SiF 4 molecules in F-implanted preamorphized Si
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Journal Articles

Concentration dependence of the Er 3 + visible and infrared luminescence in Y 2 − x Er x O 3 thin films on Si

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R. Lo Savio, M. Miritello, P. Cardile, F. Priolo
Journal: Journal of Applied Physics
J. Appl. Phys. 106, 043512 (2009)
https://doi.org/10.1063/1.3195077
Published: August 2009
View articletitled, Concentration dependence of the Er 3 + visible and infrared luminescence in Y 2 − x Er x O 3 thin films on Si
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Journal Articles

Microstructural evolution of SiO x films and its effect on the luminescence of Si nanoclusters

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G. Franzò, M. Miritello, S. Boninelli, R. Lo Savio, M. G. Grimaldi, F. Priolo, F. Iacona, G. Nicotra, C. Spinella, S. Coffa
Journal: Journal of Applied Physics
J. Appl. Phys. 104, 094306 (2008)
https://doi.org/10.1063/1.3006735
Published: November 2008
View articletitled, Microstructural evolution of SiO x films and its effect on the luminescence of Si nanoclusters
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Journal Articles

Formation and evolution of F nanobubbles in amorphous and crystalline Si

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S. Boninelli, G. Impellizzeri, S. Mirabella, F. Priolo, E. Napolitani, N. Cherkashin, F. Cristiano
Journal: Applied Physics Letters
Appl. Phys. Lett. 93, 061906 (2008)
https://doi.org/10.1063/1.2969055
Published: August 2008
View articletitled, Formation and evolution of F nanobubbles in amorphous and crystalline Si
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Journal Articles

The influence of stoichiometry on the structural stability and on the optical emission of erbium silicate thin films

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R. Lo Savio, M. Miritello, A. M. Piro, F. Priolo, F. Iacona
Journal: Applied Physics Letters
Appl. Phys. Lett. 93, 021919 (2008)
https://doi.org/10.1063/1.2957034
Published: July 2008
View articletitled, The influence of stoichiometry on the structural stability and on the optical emission of erbium silicate thin films
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Journal Articles

B clustering in amorphous Si

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D. De Salvador, G. Bisognin, M. Di Marino, E. Napolitani, A. Carnera, S. Mirabella, E. Pecora, E. Bruno, F. Priolo, H. Graoui, M. A. Foad, F. Boscherini
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 382–385 (2008)
https://doi.org/10.1116/1.2781760
Published: January 2008
View articletitled, B clustering in amorphous Si
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Journal Articles

He implantation to control B diffusion in crystalline and preamorphized Si

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E. Bruno, S. Mirabella, F. Priolo, K. Kuitunen, F. Tuomisto, J. Slotte, F. Giannazzo, C. Bongiorno, V. Raineri, E. Napolitani
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 386–390 (2008)
https://doi.org/10.1116/1.2816927
Published: January 2008
View articletitled, He implantation to control B diffusion in crystalline and preamorphized Si
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