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Journal Articles

Low-temperature formation of CoSi 2 in the presence of Au

C. Detavernier, C. Lavoie, F. M. d’Heurle, H. Bender, R. L. Van Meirhaeghe
Journal: Journal of Applied Physics
J. Appl. Phys. 95, 5340–5346 (2004)
https://doi.org/10.1063/1.1691180
Published: May 2004
View article titled, Low-temperature formation of CoSi 2 in the presence of Au
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Journal Articles

Formation of embedded Co nanoparticles by reaction in Al/Co multilayers and impact on phase sequence

P. Gas, C. Bergman, J. L. Lábár, P. B. Barna, F. M. d’Heurle
Journal: Applied Physics Letters
Appl. Phys. Lett. 84, 2421–2423 (2004)
https://doi.org/10.1063/1.1690466
Published: March 2004
View article titled, Formation of embedded Co nanoparticles by reaction in Al/Co multilayers and impact on phase sequence
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Journal Articles

Thermal expansion of the isostructural PtSi and NiSi: Negative expansion coefficient in NiSi and stress effects in thin films

C. Detavernier, C. Lavoie, F. M. d’Heurle
Journal: Journal of Applied Physics
J. Appl. Phys. 93, 2510–2515 (2003)
https://doi.org/10.1063/1.1545156
Published: March 2003
View article titled, Thermal expansion of the isostructural PtSi and NiSi: Negative expansion coefficient in NiSi and stress effects in thin films
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Journal Articles

Formation of C54 TiSi 2 : Effects of niobium additions on the apparent activation energy

F. M. d’Heurle, S.-L. Zhang, C. Lavoie, P. Gas, C. Cabral, Jr., J. M. E. Harper
Journal: Journal of Applied Physics
J. Appl. Phys. 90, 6409–6415 (2001)
https://doi.org/10.1063/1.1413952
Published: December 2001
View article titled, Formation of C54 TiSi 2 : Effects of niobium additions on the apparent activation energy
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Journal Articles

Comment on “Dominant diffusing species during cobalt silicide formation” [J. Appl. Phys. 79 , 153 (1996)]

F. M. d’Heurle, S.-L. Zhang
Journal: Journal of Applied Physics
J. Appl. Phys. 87, 8216–8217 (2000)
https://doi.org/10.1063/1.373526
Published: June 2000
View article titled, Comment on “Dominant diffusing species during cobalt silicide formation” [J. Appl. Phys. 79 , 153 (1996)]
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Journal Articles

Influence of molybdenum on the formation of C54 TiSi 2 : Template phenomenon versus grain-size effect

S.-L. Zhang, F. M. d’Heurle
Journal: Applied Physics Letters
Appl. Phys. Lett. 76, 1831–1833 (2000)
https://doi.org/10.1063/1.126180
Published: April 2000
View article titled, Influence of molybdenum on the formation of C54 TiSi 2 : Template phenomenon versus grain-size effect
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Journal Articles

Solid solubility of As in CoSi 2 and redistribution at the CoSi 2 /Si interface

D. Mangelinck, J. Cardenas, F. M. d’Heurle, B. G. Svensson, P. Gas
Journal: Journal of Applied Physics
J. Appl. Phys. 86, 4908–4915 (1999)
https://doi.org/10.1063/1.371459
Published: November 1999
View article titled, Solid solubility of As in CoSi 2 and redistribution at the CoSi 2 /Si interface
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Journal Articles

In situ characterization of titanium silicide formation: The effect of Mo interlayer, temperature ramp-rate, and annealing atmosphere

S.-L. Zhang, C. Lavoie, C. Cabral, Jr., J. M. E. Harper, F. M. d’Heurle, J. Jordan-Sweet
Journal: Journal of Applied Physics
J. Appl. Phys. 85, 2617–2626 (1999)
https://doi.org/10.1063/1.369626
Published: March 1999
View article titled, <em>In situ</em> characterization of titanium silicide formation: The effect of Mo interlayer, temperature ramp-rate, and annealing atmosphere
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Journal Articles

Enhanced thermal stability of C49 TiSi 2 in the presence of aluminum

S.-L. Zhang, F. M. d’Heurle, C. Lavoie, C. Cabral, Jr., J. M. E. Harper
Journal: Applied Physics Letters
Appl. Phys. Lett. 73, 312–314 (1998)
https://doi.org/10.1063/1.121853
Published: July 1998
View article titled, Enhanced thermal stability of C49 TiSi 2 in the presence of aluminum
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Journal Articles

Interdiffusion and phase formation in Cu(Sn) alloy films

L. A. Clevenger, B. Arcot, W. Ziegler, E. G. Colgan, Q. Z. Hong, F. M. d’Heurle, C. Cabral, Jr., T. A. Gallo, J. M. E. Harper
Journal: Journal of Applied Physics
J. Appl. Phys. 83, 90–99 (1998)
https://doi.org/10.1063/1.366728
Published: January 1998
View article titled, Interdiffusion and phase formation in Cu(Sn) alloy films
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Journal Articles

Low temperature formation of C54–TiSi 2 using titanium alloys

C. Cabral, Jr., L. A. Clevenger, J. M. E. Harper, F. M. d’Heurle, R. A. Roy, C. Lavoie, K. L. Saenger, G. L. Miles, R. W. Mann, J. S. Nakos
Journal: Applied Physics Letters
Appl. Phys. Lett. 71, 3531–3533 (1997)
https://doi.org/10.1063/1.120401
Published: December 1997
View article titled, Low temperature formation of C54–TiSi 2 using titanium alloys
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Journal Articles

Oxidation of silicon–germanium alloys. II. A mathematical model

P.-E. Hellberg, S.-L. Zhang, F. M. d’Heurle, C. S. Petersson
Journal: Journal of Applied Physics
J. Appl. Phys. 82, 5779–5787 (1997)
https://doi.org/10.1063/1.366444
Published: December 1997
View article titled, Oxidation of silicon–germanium alloys. II. A mathematical model
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Journal Articles

Oxidation of silicon–germanium alloys. I. An experimental study

P.-E. Hellberg, S.-L. Zhang, F. M. d’Heurle, C. S. Petersson
Journal: Journal of Applied Physics
J. Appl. Phys. 82, 5773–5778 (1997)
https://doi.org/10.1063/1.366443
Published: December 1997
View article titled, Oxidation of silicon–germanium alloys. I. An experimental study
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Journal Articles

Kinetics of silicide formation measured by in situ ramped resistance measurements

E. G. Colgan, F. M. d’Heurle
Journal: Journal of Applied Physics
J. Appl. Phys. 79, 4087–4095 (1996)
https://doi.org/10.1063/1.361771
Published: April 1996
View article titled, Kinetics of silicide formation measured by <em>in</em> <em>situ</em> ramped resistance measurements
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Journal Articles

Reduction of the C54–TiSi2 phase transformation temperature using refractory metal ion implantation

R. W. Mann, G. L. Miles, T. A. Knotts, D. W. Rakowski, L. A. Clevenger, J. M. E. Harper, F. M. D’Heurle, C. Cabral, Jr.
Journal: Applied Physics Letters
Appl. Phys. Lett. 67, 3729–3731 (1995)
https://doi.org/10.1063/1.115364
Published: December 1995
View article titled, Reduction of the C54–TiSi<sub>2</sub> phase transformation temperature using refractory metal ion implantation
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Journal Articles

On the formation of epitaxial CoSi2 from the reaction of Si with a Co/Ti bilayer

S.‐L. Zhang, J. Cardenas, F. M. d’Heurle, B. G. Svensson, C. S. Petersson
Journal: Applied Physics Letters
Appl. Phys. Lett. 66, 58–60 (1995)
https://doi.org/10.1063/1.114182
Published: January 1995
View article titled, On the formation of epitaxial CoSi<sub>2</sub> from the reaction of Si with a Co/Ti bilayer
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Journal Articles

Formation of a C49 TiGe2 phase during annealing a coevaporated Ti0.33Ge0.67 alloy

Q. Z. Hong, K. Barmak, F. M. d’Heurle
Journal: Applied Physics Letters
Appl. Phys. Lett. 62, 3435–3437 (1993)
https://doi.org/10.1063/1.109040
Published: June 1993
View article titled, Formation of a <em>C</em>49 TiGe<sub>2</sub> phase during annealing a coevaporated Ti<sub>0.33</sub>Ge<sub>0.67</sub> alloy
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Journal Articles

Stresses and morphological instabilities in silicide/polycrystalline Si layered structures

Q. Z. Hong, F. M. d’Heurle, J. M. E. Harper, Stella Q. Hong
Journal: Applied Physics Letters
Appl. Phys. Lett. 62, 2637–2639 (1993)
https://doi.org/10.1063/1.109270
Published: May 1993
View article titled, Stresses and morphological instabilities in silicide/polycrystalline Si layered structures
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Journal Articles

In situ strain measurements during the formation of palladium silicide films

P. P. Buaud, F. M. d’Heurle, S. Chevacharoenkul, E. A. Irene
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 11, 304–310 (1993)
https://doi.org/10.1116/1.586675
Published: March 1993
View article titled, <em>In situ</em> strain measurements during the formation of palladium silicide films
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Journal Articles

The dominant diffusing species and initial phase formation in Al‐Cu, Mg‐Cu, and Mg‐Ni systems

Q. Z. Hong, F. M. d’Heurle
Journal: Journal of Applied Physics
J. Appl. Phys. 72, 4036–4040 (1992)
https://doi.org/10.1063/1.352258
Published: November 1992
View article titled, The dominant diffusing species and initial phase formation in Al‐Cu, Mg‐Cu, and Mg‐Ni systems
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