1-20 of 124
F. Cerrina
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Talbot lithography: Self-imaging of complex structures

Available to Purchase
A. Isoyan, F. Jiang, Y. C. Cheng, F. Cerrina, P. Wachulak, L. Urbanski, J. Rocca, C. Menoni, M. Marconi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 2931–2937 (2009)
https://doi.org/10.1116/1.3258144
Published: December 2009
View article titled, Talbot lithography: Self-imaging of complex structures
Open the PDF for Talbot lithography: Self-imaging of complex structures in another window
Journal Articles

Progress in extreme ultraviolet interferometric and holographic lithography

Available to Purchase
A. Isoyan, Y.-C. Cheng, F. Jiang, J. Wallace, F. Cerrina, S. Bollepalli
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2145–2150 (2007)
https://doi.org/10.1116/1.2794069
Published: December 2007
View article titled, Progress in extreme ultraviolet interferometric and holographic lithography
Open the PDF for Progress in extreme ultraviolet interferometric and holographic lithography in another window
Journal Articles

Development, installation, and performance of the x-ray stepper JSAL 5C

Available to Purchase
Q. Leonard, D. Malueg, J. Wallace, J. W. Taylor, S. Dhuey, F. Cerrina, B. Boerger, R. Selzer, M. Yu, Y. Ma, K. Myers, M. Trybendis, E. Moon, H. I. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2896–2902 (2005)
https://doi.org/10.1116/1.2121711
Published: December 2005
View article titled, Development, installation, and performance of the x-ray stepper JSAL 5C
Open the PDF for Development, installation, and performance of the x-ray stepper JSAL 5C in another window
Journal Articles

Minimal zone plates for x-ray lithography

Available to Purchase
D. Amy, L. Jiang, R. Zheng, M. Feldman, F. Cerrina, S. Dhuey, Q. Leonard, D. Thielman
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3570–3574 (2004)
https://doi.org/10.1116/1.1809625
Published: December 2004
View article titled, Minimal zone plates for x-ray lithography
Open the PDF for Minimal zone plates for x-ray lithography in another window
Journal Articles

Biological lithography: Improvements in DNA synthesis methods

Available to Purchase
C. Kim, M. Li, M. Rodesch, A. Lowe, K. Richmond, F. Cerrina
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3163–3167 (2004)
https://doi.org/10.1116/1.1824066
Published: December 2004
View article titled, Biological lithography: Improvements in DNA synthesis methods
Open the PDF for Biological lithography: Improvements in DNA synthesis methods in another window
Journal Articles

Dense arrays of nanopores as x-ray lithography masks

Available to Purchase
S. A. Knaack, J. Eddington, Q. Leonard, F. Cerrina, M. Onellion
Journal: Applied Physics Letters
Appl. Phys. Lett. 84, 3388–3390 (2004)
https://doi.org/10.1063/1.1705724
Published: April 2004
View article titled, Dense arrays of nanopores as x-ray lithography masks
Open the PDF for Dense arrays of nanopores as x-ray lithography masks in another window
Journal Articles

Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography

Available to Purchase
V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, J. Gobrecht
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 99–103 (2004)
https://doi.org/10.1116/1.1640402
Published: January 2004
View article titled, Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography
Open the PDF for Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography in another window
Journal Articles

DNA microarrays: An imaging study

Available to Purchase
C. Kim, M. Li, A. Lowe, N. Venkataramaiah, K. Richmond, J. Kaysen, F. Cerrina
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 21, 2946–2950 (2003)
https://doi.org/10.1116/1.1627802
Published: December 2003
View article titled, DNA microarrays: An imaging study
Open the PDF for DNA microarrays: An imaging study in another window
Journal Articles

Depth dependence of resist line-edge roughness: Relation to photoacid diffusion length

Available to Purchase
J. Shin, Y. Ma, F. Cerrina
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 20, 2927–2931 (2002)
https://doi.org/10.1116/1.1526638
Published: December 2002
View article titled, Depth dependence of resist line-edge roughness: Relation to photoacid diffusion length
Open the PDF for Depth dependence of resist line-edge roughness: Relation to photoacid diffusion length in another window
Journal Articles

Multiple-beam interference lithography with electron beam written gratings

Available to Purchase
H. H. Solak, C. David, J. Gobrecht, L. Wang, F. Cerrina
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 20, 2844–2848 (2002)
https://doi.org/10.1116/1.1518015
Published: December 2002
View article titled, Multiple-beam interference lithography with electron beam written gratings
Open the PDF for Multiple-beam interference lithography with electron beam written gratings in another window
Journal Articles

Observation of speckle patterns in extreme ultraviolet imaging

Available to Purchase
H. H. Solak, Y. Yang, F. Cerrina
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 19, 2406–2411 (2001)
https://doi.org/10.1116/1.1421550
Published: November 2001
View article titled, Observation of speckle patterns in extreme ultraviolet imaging
Open the PDF for Observation of speckle patterns in extreme ultraviolet imaging in another window
Journal Articles

Focusing x-ray masks for printing very narrow features

Available to Purchase
M. Feldman, M. Khan, F. Cerrina
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 19, 2434–2438 (2001)
https://doi.org/10.1116/1.1410093
Published: November 2001
View article titled, Focusing x-ray masks for printing very narrow features
Open the PDF for Focusing x-ray masks for printing very narrow features in another window
Journal Articles

Oriented crystallization of GaSb on a patterned, amorphous Si substrate

Available to Purchase
S. S. Yi, P. D. Moran, X. Zhang, F. Cerrina, J. Carter, H. I. Smith, T. F. Kuech
Journal: Applied Physics Letters
Appl. Phys. Lett. 78, 1358–1360 (2001)
https://doi.org/10.1063/1.1352657
Published: March 2001
View article titled, Oriented crystallization of GaSb on a patterned, amorphous Si substrate
Open the PDF for Oriented crystallization of GaSb on a patterned, amorphous Si substrate in another window
Journal Articles

A new beamline for EUV lithography research

Available to Purchase
H. H. Solak, W. Li, D. He, J. Wallace, F. Cerrina
Journal: AIP Conference Proceedings
AIP Conf. Proc. 521, 99–103 (2000)
https://doi.org/10.1063/1.1291766
Published: June 2000
View article titled, A new beamline for EUV lithography research
Open the PDF for A new beamline for EUV lithography research in another window
Journal Articles

Performance of hard x-ray zone plates at the advanced photon source

Available to Purchase
J. Maser, B. Lai, Z. Cai, W. Rodrigues, D. Legnini, P. Ilinski, W. Yun, Z. Chen, A. A. Krasnoperova, Y. Vladimirsky, F. Cerrina, E. Di Fabrizio, M. Gentili
Journal: AIP Conference Proceedings
AIP Conf. Proc. 507, 708–713 (2000)
https://doi.org/10.1063/1.1291237
Published: May 2000
View article titled, Performance of hard x-ray zone plates at the advanced photon source
Open the PDF for Performance of hard x-ray zone plates at the advanced photon source in another window
Journal Articles

X-ray microdiffraction study of Cu interconnects

Available to Purchase
X. Zhang, H. Solak, F. Cerrina, B. Lai, Z. Cai, P. Ilinski, D. Legnini, W. Rodrigues
Journal: Applied Physics Letters
Appl. Phys. Lett. 76, 315–317 (2000)
https://doi.org/10.1063/1.125731
Published: January 2000
View article titled, X-ray microdiffraction study of Cu interconnects
Open the PDF for X-ray microdiffraction study of Cu interconnects in another window
Journal Articles

Nanolithography using extreme ultraviolet lithography interferometry: 19 nm lines and spaces

Available to Purchase
H. H. Solak, D. He, W. Li, F. Cerrina
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 3052–3057 (1999)
https://doi.org/10.1116/1.590953
Published: November 1999
View article titled, Nanolithography using extreme ultraviolet lithography interferometry: 19 nm lines and spaces
Open the PDF for Nanolithography using extreme ultraviolet lithography interferometry: 19 nm lines and spaces in another window
Journal Articles

Mechanical characterization of electron-beam resist using micromachined structures

Available to Purchase
L. Que, Y. B. Gianchandani, F. Cerrina
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 2719–2722 (1999)
https://doi.org/10.1116/1.591052
Published: November 1999
View article titled, Mechanical characterization of electron-beam resist using micromachined structures
Open the PDF for Mechanical characterization of electron-beam resist using micromachined structures in another window
Journal Articles

Extreme ultraviolet and x-ray resist: Comparison study

Available to Purchase
D. He, H. Solak, W. Li, F. Cerrina
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 3379–3383 (1999)
https://doi.org/10.1116/1.591014
Published: November 1999
View article titled, Extreme ultraviolet and x-ray resist: Comparison study
Open the PDF for Extreme ultraviolet and x-ray resist: Comparison study in another window
Journal Articles

Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography

Available to Purchase
H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, P. Nealey
Journal: Applied Physics Letters
Appl. Phys. Lett. 75, 2328–2330 (1999)
https://doi.org/10.1063/1.125005
Published: October 1999
View article titled, Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography
Open the PDF for Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography in another window