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1-19 of 19
Eddy Simoen
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Journal Articles
Analysis of semi-insulating carbon-doped GaN layers using deep-level transient spectroscopy
Available to PurchaseHongyue Wang, Po-Chun (Brent) Hsu, Ming Zhao, Eddy Simoen, Stefan De Gendt, Arturo Sibaja-Hernandez, Jinyan Wang
Journal:
Journal of Applied Physics
J. Appl. Phys. 130, 205701 (2021)
Published: November 2021
Journal Articles
Bandlike and localized states of extended defects in n-type In0.53Ga0.47As
Available to PurchasePo-Chun (Brent) Hsu, Eddy Simoen, Clement Merckling, Geert Eneman, Yves Mols, AliReza Alian, Robert Langer, Nadine Collaert, Marc Heyns
Journal:
Journal of Applied Physics
J. Appl. Phys. 124, 165707 (2018)
Published: October 2018
Journal Articles
Somya Gupta, Eddy Simoen, Roger Loo, Yosuke Shimura, Clement Porret, Federica Gencarelli, Kristof Paredis, Hugo Bender, Johan Lauwaert, Henk Vrielinck, Marc Heyns
Journal:
Applied Physics Letters
Appl. Phys. Lett. 113, 022102 (2018)
Published: July 2018
Journal Articles
Dry etch damage in n-type crystalline silicon wafers assessed by deep-level transient spectroscopy and minority carrier lifetime
Available to PurchaseEddy Simoen, Hariharsudan Sivaramakrishnan Radhakrishnan, Md. Gius Uddin, Ivan Gordon, Jef Poortmans, Chong Wang, Wei Li
J. Vac. Sci. Technol. B 36, 041201 (2018)
Published: June 2018
Journal Articles
Electric-field induced quantum broadening of the characteristic energy level of traps in semiconductors and oxides
Available to PurchaseMazharuddin Mohammed, Anne S. Verhulst, Devin Verreck, Maarten Van de Put, Eddy Simoen, Bart Sorée, Ben Kaczer, Robin Degraeve, Anda Mocuta, Nadine Collaert, Aaron Thean, Guido Groeseneken
Journal:
Journal of Applied Physics
J. Appl. Phys. 120, 245704 (2016)
Published: December 2016
Journal Articles
Probing the effect of point defects on the leakage blocking capability of Al0.1Ga0.9N/Si structures using a monoenergetic positron beam
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 120, 215702 (2016)
Published: December 2016
Journal Articles
On the manifestation of phosphorus-vacancy complexes in epitaxial Si:P films
Available to PurchaseSathish Kumar Dhayalan, Jiri Kujala, Jonatan Slotte, Geoffrey Pourtois, Eddy Simoen, Erik Rosseel, Andriy Hikavyy, Yosuke Shimura, Serena Iacovo, Andre Stesmans, Roger Loo, Wilfried Vandervorst
Journal:
Applied Physics Letters
Appl. Phys. Lett. 108, 082106 (2016)
Published: February 2016
Journal Articles
Channel-hot-carrier degradation of strained MOSFETs: A device level and nanoscale combined approach
Available to PurchaseQian Wu, Marc Porti, Albin Bayerl, Javier Martin-Martínez, Rosana Rodriguez, Montserrat Nafria, Xavier Aymerich, Eddy Simoen
J. Vac. Sci. Technol. B 33, 022202 (2015)
Published: March 2015
Journal Articles
Compressively strained SiGe band-to-band tunneling model calibration based on p-i-n diodes and prospect of strained SiGe tunneling field-effect transistors
Available to PurchaseKuo-Hsing Kao, Anne S. Verhulst, Rita Rooyackers, Bastien Douhard, Joris Delmotte, Hugo Bender, Olivier Richard, Wilfried Vandervorst, Eddy Simoen, Andriy Hikavyy, Roger Loo, Kai Arstila, Nadine Collaert, Aaron Thean, Marc M. Heyns, Kristin De Meyer
Journal:
Journal of Applied Physics
J. Appl. Phys. 116, 214506 (2014)
Published: December 2014
Journal Articles
Impact of field-induced quantum confinement on the onset of tunneling field-effect transistors: Experimental verification
Available to PurchaseQuentin Smets, Anne S. Verhulst, Koen Martens, Han Chung Lin, Salim El Kazzi, Devin Verreck, Eddy Simoen, Nadine Collaert, Aaron Thean, Jean-Pierre Raskin, Marc M. Heyns
Journal:
Applied Physics Letters
Appl. Phys. Lett. 105, 203507 (2014)
Published: November 2014
Journal Articles
InGaAs tunnel diodes for the calibration of semi-classical and quantum mechanical band-to-band tunneling models
Available to PurchaseQuentin Smets, Devin Verreck, Anne S. Verhulst, Rita Rooyackers, Clément Merckling, Maarten Van De Put, Eddy Simoen, Wilfried Vandervorst, Nadine Collaert, Voon Y. Thean, Bart Sorée, Guido Groeseneken, Marc M. Heyns
Journal:
Journal of Applied Physics
J. Appl. Phys. 115, 184503 (2014)
Published: May 2014
Journal Articles
Deep-level transient spectroscopy on an amorphous InGaZnO4 Schottky diode
Available to Purchase
Journal:
Applied Physics Letters
Appl. Phys. Lett. 104, 082112 (2014)
Published: February 2014
Journal Articles
1/f noise analysis of replacement metal gate bulk p-type fin field effect transistor
Available to PurchaseJae Woo Lee, Moon ju Cho, Eddy Simoen, Romain Ritzenthaler, Mitsuhiro Togo, Guillaume Boccardi, Jerome Mitard, Lars-Åke Ragnarsson, Thomas Chiarella, Anabela Veloso, Naoto Horiguchi, Aaron Thean, Guido Groeseneken
Journal:
Applied Physics Letters
Appl. Phys. Lett. 102, 073503 (2013)
Published: February 2013
Journal Articles
Spectroscopic study of polysilicon traps by means of fast capacitance transients
Available to PurchaseMaria Toledano-Luque, Baojun Tang, Robin Degraeve, Ben Kaczer, Eddy Simoen, Jan Van Houdt, Guido Groeseneken
J. Vac. Sci. Technol. B 31, 01A110 (2013)
Published: December 2012
Journal Articles
A deep-level transient spectroscopy study of silicon interface states using different silicon nitride surface passivation schemes
Available to Purchase
Journal:
Applied Physics Letters
Appl. Phys. Lett. 96, 103507 (2010)
Published: March 2010
Journal Articles
On the diffusion and activation of ion-implanted n-type dopants in germanium
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 106, 103516 (2009)
Published: November 2009
Journal Articles
Effect of mechanical strain on 1 / f noise in metal-oxide semiconductor field-effect transistors
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 105, 054504 (2009)
Published: March 2009
Journal Articles
On the dc and noise properties of the gate current in epitaxial Ge p -channel metal oxide semiconductor field effect transistors with Ti N ∕ Ta N ∕ Hf O 2 ∕ Si O 2 gate stack
Available to Purchase
Journal:
Applied Physics Letters
Appl. Phys. Lett. 92, 163508 (2008)
Published: April 2008
Journal Articles
Influence of dislocations in strained Si ∕ relaxed SiGe layers on n + ∕ p -junctions in a metal-oxide-semiconductor field-effect transistor technology
Available to Purchase
Journal:
Applied Physics Letters
Appl. Phys. Lett. 87, 192112 (2005)
Published: November 2005