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E. A. Hudson
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Journal Articles

Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions

F. Weilnboeck, N. Kumar, G. S. Oehrlein, T.-Y. Chung, D. Graves, M. Li, E. A. Hudson, E. C. Benck
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 031807 (2012)
https://doi.org/10.1116/1.3697752
Published: May 2012
View article titled, Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions
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Journal Articles

Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry

F. Weilnboeck, R. L. Bruce, S. Engelmann, G. S. Oehrlein, D. Nest, T.-Y. Chung, D. Graves, M. Li, D. Wang, C. Andes, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 993–1004 (2010)
https://doi.org/10.1116/1.3484249
Published: September 2010
View article titled, Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry
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Journal Articles

Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C 4 F 8 - and C F 4 -based discharges

S. Engelmann, R. L. Bruce, F. Weilnboeck, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1165–1179 (2009)
https://doi.org/10.1116/1.3137012
Published: May 2009
View article titled, Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C 4 F 8 - and C F 4 -based discharges
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Journal Articles

Plasma-surface interactions of advanced photoresists with C 4 F 8 ∕ Ar discharges: Plasma parameter dependencies

S. Engelmann, R. L. Bruce, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 92–106 (2009)
https://doi.org/10.1116/1.3054342
Published: January 2009
View article titled, Plasma-surface interactions of advanced photoresists with C 4 F 8 ∕ Ar discharges: Plasma parameter dependencies
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Journal Articles

Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation

D. Nest, D. B. Graves, S. Engelmann, R. L. Bruce, F. Weilnboeck, G. S. Oehrlein, C. Andes, E. A. Hudson
Journal: Applied Physics Letters
Appl. Phys. Lett. 92, 153113 (2008)
https://doi.org/10.1063/1.2912028
Published: April 2008
View article titled, Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation
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Journal Articles

Studies of fluorocarbon film deposition and its correlation with etched trench sidewall angle by employing a gap structure using C 4 F 8 ∕ Ar and C F 4 ∕ H 2 based capacitively coupled plasmas

Li Ling, X. Hua, L. Zheng, G. S. Oehrlein, E. A. Hudson, P. Jiang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 11–22 (2008)
https://doi.org/10.1116/1.2817627
Published: January 2008
View article titled, Studies of fluorocarbon film deposition and its correlation with etched trench sidewall angle by employing a gap structure using C 4 F 8 ∕ Ar and C F 4 ∕ H 2 based capacitively coupled plasmas
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Journal Articles

Capacitive discharges driven by combined dc/rf sources

E. Kawamura, M. A. Lieberman, A. J. Lichtenberg, E. A. Hudson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 1456–1474 (2007)
https://doi.org/10.1116/1.2771561
Published: August 2007
View article titled, Capacitive discharges driven by combined dc/rf sources
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Journal Articles

Plasma-surface interactions of model polymers for advanced photoresists using C 4 F 8 ∕ Ar discharges and energetic ion beams

S. Engelmann, R. L. Bruce, T. Kwon, R. Phaneuf, G. S. Oehrlein, Y. C. Bae, C. Andes, D. Graves, D. Nest, E. A. Hudson, P. Lazzeri, E. Iacob, M. Anderle
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 1353–1364 (2007)
https://doi.org/10.1116/1.2759935
Published: July 2007
View article titled, Plasma-surface interactions of model polymers for advanced photoresists using C 4 F 8 ∕ Ar discharges and energetic ion beams
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Journal Articles

Oxygen ion energy distribution: Role of ionization, resonant, and nonresonant charge-exchange collisions

N. Yu. Babaeva, J. K. Lee, J. W. Shon, E. A. Hudson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 23, 699–704 (2005)
https://doi.org/10.1116/1.1943451
Published: June 2005
View article titled, Oxygen ion energy distribution: Role of ionization, resonant, and nonresonant charge-exchange collisions
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Journal Articles

Studies of film deposition in fluorocarbon plasmas employing a small gap structure

Ling Zheng, Li Ling, Xuefeng Hua, Gottlieb S. Oehrlein, E. A. Hudson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 23, 634–642 (2005)
https://doi.org/10.1116/1.1931680
Published: June 2005
View article titled, Studies of film deposition in fluorocarbon plasmas employing a small gap structure
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Journal Articles

Investigation of surface modifications of 193 and 248 nm photoresist materials during low-pressure plasma etching

L. Ling, X. Hua, X. Li, G. S. Oehrlein, E. A. Hudson, P. Lazzeri, M. Anderle
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 2594–2603 (2004)
https://doi.org/10.1116/1.1805545
Published: November 2004
View article titled, Investigation of surface modifications of 193 and 248 nm photoresist materials during low-pressure plasma etching
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Journal Articles

XAS of uranium(VI) sorbed onto silica, alumina, and montmorillonite

E. R. Sylwester, P. G. Allen, E. A. Hudson
Journal: AIP Conference Proceedings
AIP Conf. Proc. 532, 279–281 (2000)
https://doi.org/10.1063/1.1292295
Published: July 2000
View article titled, XAS of uranium(VI) sorbed onto silica, alumina, and montmorillonite
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Journal Articles

Characterization of buried thin films with resonant soft x‐ray fluorescence

J. A. Carlisle, L. J. Terminello, E. A. Hudson, R. C. C. Perera, J. H. Underwood, T. A. Callcott, J. J. Jia, D. L. Ederer, F. J. Himpsel, M. G. Samant
Journal: Applied Physics Letters
Appl. Phys. Lett. 67, 34–36 (1995)
https://doi.org/10.1063/1.115483
Published: July 1995
View article titled, Characterization of buried thin films with resonant soft x‐ray fluorescence
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Journal Articles

First experimental results from IBM/TENN/TULANE/LLNL/LBL undulator beamline at the advanced light source

J. J. Jia, T. A. Callcott, J. Yurkas, A. W. Ellis, F. J. Himpsel, M. G. Samant, J. Stöhr, D. L. Ederer, J. A. Carlisle, E. A. Hudson, L. J. Terminello, D. K. Shuh, R. C. C. Perera
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 66, 1394–1397 (1995)
https://doi.org/10.1063/1.1145985
Published: February 1995
View article titled, First experimental results from IBM/TENN/TULANE/LLNL/LBL undulator beamline at the advanced light source
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