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David R. Boris
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Journal Articles

Phase-shifted counterpropagating atmospheric pressure plasma jets: Characterization and interaction with materials

Editor’s Pick
Michael J. Johnson, Gabriel H. Brown, David R. Boris, Tzvetelina B. Petrova, Scott G. Walton
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 034004 (2024)
https://doi.org/10.1116/6.0003485
Published: April 2024
View article titled, Phase-shifted counterpropagating atmospheric pressure plasma jets: Characterization and interaction with materials
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Journal Articles

Remote inductively coupled plasmas in Ar/N2 mixtures and implications for plasma enhanced ALD

Editor’s Pick
David R. Boris, Michael J. Johnson, Jeffrey M. Woodward, Virginia D. Wheeler, Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033008 (2024)
https://doi.org/10.1116/6.0003538
Published: April 2024
View article titled, Remote inductively coupled plasmas in Ar/N<sub>2</sub> mixtures and implications for plasma enhanced ALD
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Journal Articles

Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition

Editor’s Pick
Jeffrey M. Woodward, Samantha G. Rosenberg, David R. Boris, Michael J. Johnson, Scott G. Walton, Scooter D. Johnson, Zachary R. Robinson, Neeraj Nepal, Karl F. Ludwig, Jr., Jennifer K. Hite, Charles R. Eddy, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062405 (2022)
https://doi.org/10.1116/6.0002021
Published: October 2022
View article titled, Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
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Includes: Supplementary data
Journal Articles

Erratum: ‘‘Hollow cathode enhanced capacitively coupled plasmas in Ar/N2/H2 mixtures and implications for plasma enhanced ALD” [J. Vac. Sci. Technol. B 40, 044002 (2022)]

David R. Boris, Michael J. Johnson, Charles R. Eddy, Jr., Scott G. Walton
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 057001 (2022)
https://doi.org/10.1116/6.0002172
Published: September 2022
View article titled, Erratum: ‘‘Hollow cathode enhanced capacitively coupled plasmas in Ar/N<sub>2</sub>/H<sub>2</sub> mixtures and implications for plasma enhanced ALD” [J. Vac. Sci. Technol. B 40, 044002 (2022)]
Open the PDF for Erratum: ‘‘Hollow cathode enhanced capacitively coupled plasmas in Ar/N<sub>2</sub>/H<sub>2</sub> mixtures and implications for plasma enhanced ALD” [J. Vac. Sci. Technol. B 40, 044002 (2022)] in another window
Journal Articles

Hollow cathode enhanced capacitively coupled plasmas in Ar/N2/H2 mixtures and implications for plasma enhanced ALD

Editor’s Pick
David R. Boris, Michael J. Johnson, Charles R. Eddy, Jr., Scott G. Walton
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 044002 (2022)
https://doi.org/10.1116/6.0001840
Published: July 2022
View article titled, Hollow cathode enhanced capacitively coupled plasmas in Ar/N<sub>2</sub>/H<sub>2</sub> mixtures and implications for plasma enhanced ALD
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Journal Articles

Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition

Zachary C. Sobell, Andrew S. Cavanagh, David R. Boris, Scott G. Walton, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 042403 (2021)
https://doi.org/10.1116/6.0001033
Published: June 2021
View article titled, Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition
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Journal Articles

The role of plasma in plasma-enhanced atomic layer deposition of crystalline films

David R. Boris, Virginia D. Wheeler, Neeraj Nepal, Syed B. Qadri, Scott G. Walton, Charles (Chip) R. Eddy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 040801 (2020)
https://doi.org/10.1116/6.0000145
Published: May 2020
View article titled, The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
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Journal Articles

Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy

Editor’s Pick
David R. Boris, Virginia D. Wheeler, Jason R. Avila, Syed B. Qadri, Charles R. Eddy, Jr., Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 060909 (2019)
https://doi.org/10.1116/1.5128208
Published: November 2019
View article titled, Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
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Journal Articles

Thermal conductance of aluminum oxy-fluoride passivation layers

John A. Tomko, David R. Boris, Samantha G. Rosenberg, Scott G. Walton, Patrick E. Hopkins
Journal: Applied Physics Letters
Appl. Phys. Lett. 115, 191901 (2019)
https://doi.org/10.1063/1.5120028
Published: November 2019
View article titled, Thermal conductance of aluminum oxy-fluoride passivation layers
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Journal Articles

Precise control of ion and radical production using electron beam generated plasmas

David R. Boris, Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 060601 (2018)
https://doi.org/10.1116/1.5053615
Published: October 2018
View article titled, Precise control of ion and radical production using electron beam generated plasmas
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Journal Articles

Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy

David R. Boris, Virginia R. Anderson, Neeraj Nepal, Scooter D. Johnson, Zachary R. Robinson, Alexander C. Kozen, Charles R. Eddy, Jr., Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 051503 (2018)
https://doi.org/10.1116/1.5034247
Published: July 2018
View article titled, Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
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Journal Articles

Atomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision

David R. Boris, Tzvetelina B. Petrova, George M. Petrov, Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01A104 (2017)
https://doi.org/10.1116/1.4971416
Published: December 2016
View article titled, Atomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision
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Journal Articles

One-dimensional Ar-SF6 hydromodel at low-pressure in e-beam generated plasmas

George M. Petrov, David R. Boris, Tzvetelina B. Petrova, Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 021302 (2016)
https://doi.org/10.1116/1.4940885
Published: February 2016
View article titled, One-dimensional Ar-SF<sub>6</sub> hydromodel at low-pressure in e-beam generated plasmas
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Journal Articles

Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources

Ashish V. Jagtiani, Hiroyuki Miyazoe, Josephine Chang, Damon B. Farmer, Michael Engel, Deborah Neumayer, Shu-Jen Han, Sebastian U. Engelmann, David R. Boris, Sandra C. Hernández, Evgeniya H. Lock, Scott G. Walton, Eric A. Joseph
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 01B103 (2016)
https://doi.org/10.1116/1.4936622
Published: December 2015
View article titled, Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low <em>T<sub>e</sub></em> plasma sources
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