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Journal Articles

High power impulse magnetron sputtering of a zirconium target

Featured
Swetha Suresh Babu, Joel Fischer, Kateryna Barynova, Martin Rudolph, Daniel Lundin, Jon Tomas Gudmundsson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043007 (2024)
https://doi.org/10.1116/6.0003647
Published: June 2024
View article titled, High power impulse magnetron sputtering of a zirconium target
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Journal Articles

Plasma electron characterization in electron chemical vapor deposition

Pentti Niiranen, Anna Kapran, Hama Nadhom, Martin Čada, Zdeněk Hubička, Henrik Pedersen, Daniel Lundin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023006 (2024)
https://doi.org/10.1116/6.0003408
Published: February 2024
View article titled, Plasma electron characterization in electron chemical vapor deposition
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Journal Articles

Effect of tilted closed-field magnetron design on the microstructure and mechanical properties of TiZrNbTaN coatings

Editor’s Pick
Sanath Kumar Honnali, Charlotte Poterie, Arnaud le Febvrier, Daniel Lundin, Grzegorz Greczynski, Per Eklund
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043402 (2023)
https://doi.org/10.1116/6.0002752
Published: May 2023
View article titled, Effect of tilted closed-field magnetron design on the microstructure and mechanical properties of TiZrNbTaN coatings
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Includes: Supplementary data
Journal Articles

Biased quartz crystal microbalance method for studies of chemical vapor deposition surface chemistry induced by plasma electrons

Pentti Niiranen, Hama Nadhom, Michal Zanáška, Robert Boyd, Mauricio Sortica, Daniel Primetzhofer, Daniel Lundin, Henrik Pedersen
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 94, 023902 (2023)
https://doi.org/10.1063/5.0122143
Published: February 2023
View article titled, Biased quartz crystal microbalance method for studies of chemical vapor deposition surface chemistry induced by plasma electrons
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Journal Articles

Low temperature growth of stress-free single phase α-W films using HiPIMS with synchronized pulsed substrate bias

Tetsuhide Shimizu, Kazuki Takahashi, Robert Boyd, Rommel Paulo Viloan, Julien Keraudy, Daniel Lundin, Ming Yang, Ulf Helmersson
Journal: Journal of Applied Physics
J. Appl. Phys. 129, 155305 (2021)
https://doi.org/10.1063/5.0042608
Published: April 2021
View article titled, Low temperature growth of stress-free single phase <em>α</em>-W films using HiPIMS with synchronized pulsed substrate bias
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Journal Articles

On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputtering

Martin Rudolph, Hamidreza Hajihoseini, Michael A. Raadu, Jon Tomas Gudmundsson, Nils Brenning, Tiberiu M. Minea, André Anders, Daniel Lundin
Journal: Journal of Applied Physics
J. Appl. Phys. 129, 033303 (2021)
https://doi.org/10.1063/5.0036902
Published: January 2021
View article titled, On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputtering
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Journal Articles

Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength

Nils Brenning, Alexandre Butler, Hamidreza Hajihoseini, Martin Rudolph, Michael A. Raadu, Jon Tomas Gudmundsson, Tiberiu Minea, Daniel Lundin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033008 (2020)
https://doi.org/10.1116/6.0000079
Published: April 2020
View article titled, Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength
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Journal Articles

Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering

Hamidreza Hajihoseini, Martin Čada, Zdenek Hubička, Selen Ünaldi, Michael A. Raadu, Nils Brenning, Jon Tomas Gudmundsson, Daniel Lundin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033009 (2020)
https://doi.org/10.1116/1.5145292
Published: April 2020
View article titled, Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering
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Journal Articles

Chemical vapor deposition of metallic films using plasma electrons as reducing agents

Hama Nadhom, Daniel Lundin, Polla Rouf, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033402 (2020)
https://doi.org/10.1116/1.5142850
Published: March 2020
View article titled, Chemical vapor deposition of metallic films using plasma electrons as reducing agents
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Includes: Supplementary data
Journal Articles

Tuning the stress in TiN films by regulating the doubly charged ion fraction in a reactive HiPIMS discharge

Rommel Paulo B. Viloan, Daniel Lundin, Julien Keraudy, Ulf Helmersson
Journal: Journal of Applied Physics
J. Appl. Phys. 127, 103302 (2020)
https://doi.org/10.1063/1.5134003
Published: March 2020
View article titled, Tuning the stress in TiN films by regulating the doubly charged ion fraction in a reactive HiPIMS discharge
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Journal Articles

Low temperature (Ts/Tm < 0.1) epitaxial growth of HfN/MgO(001) via reactive HiPIMS with metal-ion synchronized substrate bias

Michelle Marie S. Villamayor, Julien Keraudy, Tetsuhide Shimizu, Rommel Paulo B. Viloan, Robert Boyd, Daniel Lundin, Joseph E. Greene, Ivan Petrov, Ulf Helmersson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 061511 (2018)
https://doi.org/10.1116/1.5052702
Published: November 2018
View article titled, Low temperature (<em>T</em><sub>s</sub>/<em>T</em><sub>m</sub> &lt; 0.1) epitaxial growth of HfN/MgO(001) via reactive HiPIMS with metal-ion synchronized substrate bias
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Journal Articles

Synthesis of hydrogenated diamondlike carbon thin films using neon–acetylene based high power impulse magnetron sputtering discharges

Asim Aijaz, Sascha Louring, Daniel Lundin, Tomáš Kubart, Jens Jensen, Kostas Sarakinos, Ulf Helmersson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061504 (2016)
https://doi.org/10.1116/1.4964749
Published: October 2016
View article titled, Synthesis of hydrogenated diamondlike carbon thin films using neon–acetylene based high power impulse magnetron sputtering discharges
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Journal Articles

Low electrical resistivity in thin and ultrathin copper layers grown by high power impulse magnetron sputtering

Felipe Cemin, Daniel Lundin, Davide Cammilleri, Thomas Maroutian, Philippe Lecoeur, Tiberiu Minea
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 051506 (2016)
https://doi.org/10.1116/1.4959555
Published: July 2016
View article titled, Low electrical resistivity in thin and ultrathin copper layers grown by high power impulse magnetron sputtering
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Journal Articles

Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering

Daniel Lundin, Martin Čada, Zdenĕk Hubička
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 041305 (2016)
https://doi.org/10.1116/1.4953033
Published: June 2016
View article titled, Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering
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Journal Articles

Influence of pulse power amplitude on plasma properties and film deposition in high power pulsed plasma enhanced chemical vapor deposition

Daniel Lundin, Jens Jensen, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 030602 (2014)
https://doi.org/10.1116/1.4867442
Published: March 2014
View article titled, Influence of pulse power amplitude on plasma properties and film deposition in high power pulsed plasma enhanced chemical vapor deposition
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Journal Articles

Plasma reactivity in high-power impulse magnetron sputtering through oxygen kinetics

Catalin Vitelaru, Daniel Lundin, Nils Brenning, Tiberiu Minea
Journal: Applied Physics Letters
Appl. Phys. Lett. 103, 104105 (2013)
https://doi.org/10.1063/1.4819835
Published: September 2013
View article titled, Plasma reactivity in high-power impulse magnetron sputtering through oxygen kinetics
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Journal Articles

Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides

Montri Aiempanakit, Asim Aijaz, Daniel Lundin, Ulf Helmersson, Tomáš Kubart
Journal: Journal of Applied Physics
J. Appl. Phys. 113, 133302 (2013)
https://doi.org/10.1063/1.4799199
Published: April 2013
View article titled, Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides
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Journal Articles

Influence of ionization degree on film properties when using high power impulse magnetron sputtering

Mattias Samuelsson, Daniel Lundin, Kostas Sarakinos, Fredrik Björefors, Bengt Wälivaara, Henrik Ljungcrantz, U. Helmersson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 031507 (2012)
https://doi.org/10.1116/1.3700227
Published: April 2012
View article titled, Influence of ionization degree on film properties when using high power impulse magnetron sputtering
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