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D. R. McKenzie
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Journal Articles

The structure and electronic properties of tetrahedrally bonded hydrogenated amorphous carbon

A. G. Salek, P. Y. Le, J. G. Partridge, T. J. Raeber, B. Haberl, R. Boehler, B. J. Murdoch, J. E. Bradby, T. Ratcliff, R. G. Elliman, D. R. McKenzie, D. G. McCulloch
Journal: Applied Physics Letters
Appl. Phys. Lett. 122, 181904 (2023)
https://doi.org/10.1063/5.0147494
Published: May 2023
View article titled, The structure and electronic properties of tetrahedrally bonded hydrogenated amorphous carbon
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Journal Articles

The mechanical response of glassy carbon recovered from high pressure

X. Huang, T. B. Shiell, C. de Tomas, I. Suarez-Martinez, S. Wong, S. Mann, D. R. McKenzie, N. A. Marks, D. G. McCulloch, J. E. Bradby
Journal: Journal of Applied Physics
J. Appl. Phys. 127, 145105 (2020)
https://doi.org/10.1063/1.5142309
Published: April 2020
View article titled, The mechanical response of glassy carbon recovered from high pressure
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Journal Articles

Temperature sensitivity and short-term memory in electroforming-free low power carbon memristors

B. J. Murdoch, T. J. Raeber, Z. C. Zhao, D. R. McKenzie, D. G. McCulloch, J. G. Partridge
Journal: Applied Physics Letters
Appl. Phys. Lett. 114, 163504 (2019)
https://doi.org/10.1063/1.5094652
Published: April 2019
View article titled, Temperature sensitivity and short-term memory in electroforming-free low power carbon memristors
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Journal Articles

Pulsed external magnetic fields increase the deposition rate in reactive HiPIMS while preserving stoichiometry: An application to amorphous HfO2

R. Ganesan, B. Treverrow, P. Denniss, D. G. McCulloch, D. R. McKenzie, M. M. M. Bilek
Journal: Journal of Applied Physics
J. Appl. Phys. 120, 103301 (2016)
https://doi.org/10.1063/1.4961730
Published: September 2016
View article titled, Pulsed external magnetic fields increase the deposition rate in reactive HiPIMS while preserving stoichiometry: An application to amorphous HfO<sub>2</sub>
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Journal Articles

Mixed-mode high-power impulse magnetron sputter deposition of tetrahedral amorphous carbon with pulse-length control of ionization

M. D. Tucker, R. Ganesan, D. G. McCulloch, J. G. Partridge, M. Stueber, S. Ulrich, M. M. M. Bilek, D. R. McKenzie, N. A. Marks
Journal: Journal of Applied Physics
J. Appl. Phys. 119, 155303 (2016)
https://doi.org/10.1063/1.4946841
Published: April 2016
View article titled, Mixed-mode high-power impulse magnetron sputter deposition of tetrahedral amorphous carbon with pulse-length control of ionization
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Journal Articles

Memristor and selector devices fabricated from HfO2−xNx

B. J. Murdoch, D. G. McCulloch, R. Ganesan, D. R. McKenzie, M. M. M. Bilek, J. G. Partridge
Journal: Applied Physics Letters
Appl. Phys. Lett. 108, 143504 (2016)
https://doi.org/10.1063/1.4945727
Published: April 2016
View article titled, Memristor and selector devices fabricated from HfO<sub>2−x</sub>N<sub>x</sub>
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Journal Articles

Reaction paths of phosphine dissociation on silicon (001)

O. Warschkow, N. J. Curson, S. R. Schofield, N. A. Marks, H. F. Wilson, M. W. Radny, P. V. Smith, T. C. G. Reusch, D. R. McKenzie, M. Y. Simmons
Journal: The Journal of Chemical Physics
J. Chem. Phys. 144, 014705 (2016)
https://doi.org/10.1063/1.4939124
Published: January 2016
View article titled, Reaction paths of phosphine dissociation on silicon (001)
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Journal Articles

Influence of nitrogen-related defects on optical and electrical behaviour in HfO2−xNx deposited by high-power impulse magnetron sputtering

B. J. Murdoch, R. Ganesan, D. R. McKenzie, M. M. M. Bilek, D. G. McCulloch, J. G. Partridge
Journal: Applied Physics Letters
Appl. Phys. Lett. 107, 112903 (2015)
https://doi.org/10.1063/1.4931099
Published: September 2015
View article titled, Influence of nitrogen-related defects on optical and electrical behaviour in HfO<sub>2−x</sub>N<sub>x</sub> deposited by high-power impulse magnetron sputtering
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Journal Articles

Molecular adsorption on silicon (001): A systematic evaluation of size effects in slab and cluster models

D. F. Tracey, B. Delley, D. R. McKenzie, O. Warschkow
Journal: AIP Advances
AIP Advances 3, 042117 (2013)
https://doi.org/10.1063/1.4802837
Published: April 2013
View article titled, Molecular adsorption on silicon (001): A systematic evaluation of size effects in slab and cluster models
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Journal Articles

Energetic deposition of carbon in a cathodic vacuum arc with a biased mesh

A. Moafi, D. W. M. Lau, A. Z. Sadek, J. G. Partridge, D. R. McKenzie, D. G. McCulloch
Journal: Journal of Applied Physics
J. Appl. Phys. 109, 073309 (2011)
https://doi.org/10.1063/1.3562165
Published: April 2011
View article titled, Energetic deposition of carbon in a cathodic vacuum arc with a biased mesh
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Journal Articles

Fizeau interferometer system for fast high resolution studies of spectral line shapes

O. Novák, I. S. Falconer, R. Sanginés, M. Lattemann, R. N. Tarrant, D. R. McKenzie, M. M. M. Bilek
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 82, 023105 (2011)
https://doi.org/10.1063/1.3525102
Published: February 2011
View article titled, Fizeau interferometer system for fast high resolution studies of spectral line shapes
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Includes: Supplementary data
Journal Articles

Oxygen incorporation in Ti 2 AlC : Tuning of anisotropic conductivity

J. Rosen, M. Dahlqvist, S. I. Simak, D. R. McKenzie, M. M. M. Bilek
Journal: Applied Physics Letters
Appl. Phys. Lett. 97, 073103 (2010)
https://doi.org/10.1063/1.3472280
Published: August 2010
View article titled, Oxygen incorporation in Ti 2 AlC : Tuning of anisotropic conductivity
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Journal Articles

Production of highly ionized species in high-current pulsed cathodic arcs

R. Sanginés, A. M. Israel, I. S. Falconer, D. R. McKenzie, M. M. M. Bilek
Journal: Applied Physics Letters
Appl. Phys. Lett. 96, 221501 (2010)
https://doi.org/10.1063/1.3442509
Published: June 2010
View article titled, Production of highly ionized species in high-current pulsed cathodic arcs
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Journal Articles

van der Pauw method for measuring resistivity of a plane sample with distant boundaries

S. H. N. Lim, D. R. McKenzie, M. M. M. Bilek
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 80, 075109 (2009)
https://doi.org/10.1063/1.3183503
Published: July 2009
View article titled, van der Pauw method for measuring resistivity of a plane sample with distant boundaries
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Journal Articles

Microstructural investigation supporting an abrupt stress induced transformation in amorphous carbon films

D. W. M. Lau, J. G. Partridge, M. B. Taylor, D. G. McCulloch, J. Wasyluk, T. S. Perova, D. R. McKenzie
Journal: Journal of Applied Physics
J. Appl. Phys. 105, 084302 (2009)
https://doi.org/10.1063/1.3075867
Published: April 2009
View article titled, Microstructural investigation supporting an abrupt stress induced transformation in amorphous carbon films
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Journal Articles

Erratum: “Time-dependent electrical double layer with blocking electrode” [Appl. Phys. Lett. 94, 043118 (2009)]

Z. J. Han, R. Morrow, B. K. Tay, D. R. McKenzie
Journal: Applied Physics Letters
Appl. Phys. Lett. 94, 079901 (2009)
https://doi.org/10.1063/1.3086874
Published: February 2009
View article titled, Erratum: “Time-dependent electrical double layer with blocking electrode” [Appl. Phys. Lett. 94, 043118 (2009)]
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Journal Articles

Oriented graphite layer formation in Ti/C and TiC/C multilayers deposited by high current pulsed cathodic arc

P. O. Å. Persson, L. Ryves, M. D. Tucker, D. R. McKenzie, M. M. M. Bilek
Journal: Journal of Applied Physics
J. Appl. Phys. 104, 074317 (2008)
https://doi.org/10.1063/1.2959835
Published: October 2008
View article titled, Oriented graphite layer formation in Ti/C and TiC/C multilayers deposited by high current pulsed cathodic arc
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Journal Articles

Characterization of a Filtered High Current Pulsed Cathodic Vacuum Arc Plasma Source: Plasma Transport Analysis.

R. Sanginés, D. Andruczyk, R. N. Tarrant, M. M. M. Bilek, D. R. McKenzie
Journal: AIP Conference Proceedings
AIP Conf. Proc. 993, 337–340 (2008)
https://doi.org/10.1063/1.2909142
Published: March 2008
View article titled, Characterization of a Filtered High Current Pulsed Cathodic Vacuum Arc Plasma Source: Plasma Transport Analysis.
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Journal Articles

A solid phase reaction between Ti C x thin films and Al 2 O 3 substrates

P. O. Å. Persson, J. Rosen, D. R. McKenzie, M. M. M. Bilek, C. Höglund
Journal: Journal of Applied Physics
J. Appl. Phys. 103, 066102 (2008)
https://doi.org/10.1063/1.2896637
Published: March 2008
View article titled, A solid phase reaction between Ti C x thin films and Al 2 O 3 substrates
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Journal Articles

Oxygen incorporation in Ti 2 Al C thin films

J. Rosen, P. O. Å. Persson, M. Ionescu, A. Kondyurin, D. R. McKenzie, M. M. M. Bilek
Journal: Applied Physics Letters
Appl. Phys. Lett. 92, 064102 (2008)
https://doi.org/10.1063/1.2838456
Published: February 2008
View article titled, Oxygen incorporation in Ti 2 Al C thin films
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