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Journal Articles

Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry

F. Weilnboeck, R. L. Bruce, S. Engelmann, G. S. Oehrlein, D. Nest, T.-Y. Chung, D. Graves, M. Li, D. Wang, C. Andes, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 993–1004 (2010)
https://doi.org/10.1116/1.3484249
Published: September 2010
View article titled, Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry
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Journal Articles

Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films

R. L. Bruce, F. Weilnboeck, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, J. J. Vegh, D. Nest, D. B. Graves
Journal: Journal of Applied Physics
J. Appl. Phys. 107, 084310 (2010)
https://doi.org/10.1063/1.3373587
Published: April 2010
View article titled, Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films
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Journal Articles

Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C 4 F 8 - and C F 4 -based discharges

S. Engelmann, R. L. Bruce, F. Weilnboeck, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1165–1179 (2009)
https://doi.org/10.1116/1.3137012
Published: May 2009
View article titled, Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C 4 F 8 - and C F 4 -based discharges
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Journal Articles

Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma

R. L. Bruce, S. Engelmann, T. Lin, T. Kwon, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, J. J. Végh, D. Nest, D. B. Graves, A. Alizadeh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1142–1155 (2009)
https://doi.org/10.1116/1.3136864
Published: May 2009
View article titled, Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma
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Journal Articles

Absolute vacuum ultraviolet flux in inductively coupled plasmas and chemical modifications of 193 nm photoresist

M. J. Titus, D. Nest, D. B. Graves
Journal: Applied Physics Letters
Appl. Phys. Lett. 94, 171501 (2009)
https://doi.org/10.1063/1.3125260
Published: April 2009
View article titled, Absolute vacuum ultraviolet flux in inductively coupled plasmas and chemical modifications of 193 nm photoresist
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Journal Articles

Plasma-surface interactions of advanced photoresists with C 4 F 8 ∕ Ar discharges: Plasma parameter dependencies

S. Engelmann, R. L. Bruce, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 92–106 (2009)
https://doi.org/10.1116/1.3054342
Published: January 2009
View article titled, Plasma-surface interactions of advanced photoresists with C 4 F 8 ∕ Ar discharges: Plasma parameter dependencies
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Journal Articles

Molecular dynamics simulations of near-surface modification of polystyrene: Bombardment with Ar + and Ar + / radical chemistries

J. J. Végh, D. Nest, D. B. Graves, R. Bruce, S. Engelmann, T. Kwon, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson
Journal: Journal of Applied Physics
J. Appl. Phys. 104, 034308 (2008)
https://doi.org/10.1063/1.2963708
Published: August 2008
View article titled, Molecular dynamics simulations of near-surface modification of polystyrene: Bombardment with Ar + and Ar + / radical chemistries
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Journal Articles

Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation

D. Nest, D. B. Graves, S. Engelmann, R. L. Bruce, F. Weilnboeck, G. S. Oehrlein, C. Andes, E. A. Hudson
Journal: Applied Physics Letters
Appl. Phys. Lett. 92, 153113 (2008)
https://doi.org/10.1063/1.2912028
Published: April 2008
View article titled, Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation
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Journal Articles

Near-surface modification of polystyrene by Ar + : Molecular dynamics simulations and experimental validation

J. J. Végh, D. Nest, D. B. Graves, R. Bruce, S. Engelmann, T. Kwon, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson
Journal: Applied Physics Letters
Appl. Phys. Lett. 91, 233113 (2007)
https://doi.org/10.1063/1.2821226
Published: December 2007
View article titled, Near-surface modification of polystyrene by Ar + : Molecular dynamics simulations and experimental validation
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Journal Articles

Plasma-surface interactions of model polymers for advanced photoresists using C 4 F 8 ∕ Ar discharges and energetic ion beams

S. Engelmann, R. L. Bruce, T. Kwon, R. Phaneuf, G. S. Oehrlein, Y. C. Bae, C. Andes, D. Graves, D. Nest, E. A. Hudson, P. Lazzeri, E. Iacob, M. Anderle
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 1353–1364 (2007)
https://doi.org/10.1116/1.2759935
Published: July 2007
View article titled, Plasma-surface interactions of model polymers for advanced photoresists using C 4 F 8 ∕ Ar discharges and energetic ion beams
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Journal Articles

Ar + bombardment of 193 nm photoresist: Morphological effects

E. Pargon, D. Nest, D. B. Graves
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 1236–1243 (2007)
https://doi.org/10.1116/1.2747630
Published: June 2007
View article titled, Ar + bombardment of 193 nm photoresist: Morphological effects
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